Abstract:
The disclosure relates to a process that includes blending a polyimide resin and a primary alky amine organic compound to produce an aryl amine functionalized polyimide, having aryl amine functionality in excess of any anhydride functionality. The polyimide resin can have a weight average molecular weight (Mw) from 5,000 to 100,000 daltons. The organic compound can include at least one primary aliphatic amine without a direct linkage of a nitrogen to an aryl group and without a functionality selected from a halogen functionality, a hydroxyl functionality, a sulfonic acid functionality, a sulfonic acid salt functionality, and combinations thereof. The disclosure also relates to alkyl imide functionalized polyimides also with aryl amine functionalized polyimides, having aryl amine functionality in excess of any anhydride functionality and articles produced therefrom.
Abstract:
A thermoplastic composition includes a polyetherimide, a thermoplastic polyester elastomer comprising a hard segment comprising a polyester block, and a soft segment comprising a polyether block or a polyester block, and optionally, a polyester, one or more flame retardants, and one or more additives. Articles including the composition can include an extruded part, an injection molded part, or a hot-compressed part. Also described herein is an electrical wire including a conductor wire and a covering disposed over the conductor wire, wherein the covering includes the thermoplastic composition. Articles including the electrical wire are also discussed.
Abstract:
The present invention provides a process for the preparation of a transistor on a substrate, which transistor comprises a layer, which layer comprises polyimide B, which process comprises the steps of i) forming a layer comprising photocurable polyimide A by applying photocur- able polyimide A on a layer of the transistor or on the substrate ii) irradiating the layer comprising photocurable polyimide A with light of a wavelength of > = 360 nm in order to form the layer comprising polyimide B, and a transistor obtainable by that process.
Abstract:
The present invention provides a tetracarboxylic acid diester compound represented by the following general formula (1),
wherein, X 1 represents a tetravalent organic group, and R 1 represents a group represented by the following general formula (2),
wherein, the dotted line represents a bonding, Y 1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, "k" represents 1, 2 or 3, and "n" represents 0 or 1. There can be provided a tetracarboxylic acid diester compound which can lead a polymer of a polyimide precursor capable of using a base resin of a negative photosensitive resin composition which is capable of forming a fine pattern and giving high resolution, a polymer of a polyimide precursor obtained by using the tetracarboxylic acid diester compound and a method for producing the same.
Abstract:
A system comprises an extrusion head to selectively extrude a bead of a precursor solution onto a target road on a substrate within a build area, the precursor solution comprising a polyimide precursor compound in a solvent, an actuator coupled to the extrusion head to move the extrusion head, a control system coupled to the actuator to control the extrusion head along the target road and selectively dispense the precursor solution to the extrusion head, and an environmental system configured to accommodate the target road during fabrication, the environmental system configured to expose the dispensed precursor solution to a temperature selected to evaporate solvent from the solution to initiate polymerization of the polyimide precursor compound to form at least a portion of a polyimide part.
Abstract:
A poly(siloxane-etherimide) composition comprising, based on the total weight of the composition, 70 to 90 wt % of a poly(siloxane-etherimide); and an additive comprising a polyester, a filler, or a combination thereof; wherein the filler comprises talc, calcium carbonate, or a combination comprising at least one of the foregoing; and wherein the composition has a number of drops to tracking at 250 volts of greater than or equal to 50 drops determined according to ASTM D-3638-85.
Abstract:
A polyetherimide-siloxane composition including 70 to 99.9 weight percent of a polyetherimide-siloxane copolymer having a weight average molecular weight of 5,000 to 80,000 Daltons and having a polysiloxane content of 10 to 50 weight percent, preferably 15 to 40 weight percent, more preferably 20 to 35 weight percent, and 0.1 to 30 weight percent of an aryl phosphate having a molecular weight from 500 to 1,200 Daltons, wherein weight percent is based on the total weight of the composition, is disclosed. The composition has a melt flow at least 10% greater than the melt flow of the same polyetherimide-siloxane composition without the aryl phosphate, measured according to ASTM D1238 at 300° C. under a 5.0 kilogram load.
Abstract:
Provided are: a polyimide resin which has high heat resistance and is capable of uniformly performing temporary adhesion over a large area with no void or the like; a resin composition using the same; and a laminated film. The polyimide resin of the present invention has at least an acid anhydride residue and a diamine residue and contains a residue of a polysiloxane diamine in an amount of not less than 60% by mole in the total amount of the diamine residue.
Abstract:
Aliphatic polyimides are synthesized by a 2:1 molar ratio reaction of an unsaturated monoanhydride or an unsaturated diacid with a diamine. Bio-derived monomers are particularly useful in the synthesis of the aliphatic polyimides.