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1.发明公开WAFER AND RETICLE INSPECTION SYSTEMS AND METHOD FOR SELECTING ILLUMINATION PUPIL CONFIGURATIONS 审中-公开水和光检测系统和用于选择照明柱配置的方法
公开(公告)号：EP2823288A4
公开(公告)日：2015-09-23
申请号：EP13757677
申请日：2013-03-01
Applicant: KLA TENCOR CORP
Inventor： CHEN GRACE H , BRUNNER RUDOLF , GAO LISHENG , DANEN ROBERT M , CHEN LU
IPC: G01N21/88 , G01N21/956 , H01L21/66
CPC classification number: G01N21/8806 , G01N21/8851 , G01N21/9501 , G01N21/956 , G01N21/95623 , G01N2021/8822 , G01N2021/95676 , G01N2201/061 , G01N2201/0638 , G01N2201/068 , G01N2201/12
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2.发明公开SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER 审中-公开系统维也纳ZUR ERKENNUNG VON DEFEKTEN AUF EINEM WAFER
公开(公告)号：EP2389685A4
公开(公告)日：2017-04-19
申请号：EP10733928
申请日：2010-01-22
Applicant: KLA-TENCOR CORP
Inventor： CHEN LU , KIRKWOOD JASON , MAHADEVAN MOHAN , SMITH JAMES A , GAO LISHENG , HUANG JUNQING , LUO TAO , WALLINGFORD RICHARD
CPC classification number: G01N21/9501 , G01N2021/887 , H01L22/12
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