专利检索 ap:("KOREA RES INST CHEM TECH" OR "SAMYANG CORP") AND inv:"SHIN SEUNG RIM" 第 1 页

1.

发明公开
NOVEL OXIMESTER FLUORINE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION COMPRISING SAME 有权
标题翻译：新型OXIMESTERFLUOR连接和光聚合引发剂和PHOTOLACK组合

公开(公告)号：EP2845845A4

公开(公告)日：2015-12-09

申请号：EP13785166

申请日：2013-05-03

申请人： KOREA RES INST CHEM TECH , SAMYANG CORP

发明人： SHIN SEUNG RIM , JUN KUN , SHIN JONG IL , PARK SOO YOUL , AN KYOUNG LYONG , LEE SANG OH , MOON BONG SEOK , OH CHUNRIM , CHOI ANAM , SO IN-YOUNG

IPC分类号： G03F7/004 , C07C13/567 , C07C251/66 , C07C251/68 , G03F7/027 , G03F7/031 , G03F7/105

CPC分类号： G03F7/027 , C07C251/66 , C07C251/68 , C07C2603/18 , G03F7/0007 , G03F7/031 , G03F7/105

摘要： Provided are a novel fluorene oxime ester compound, and a photopolymerization initiator and a photoresist composition containing the same.