公开(公告)号：EP3579269A1

公开(公告)日：2019-12-11

申请号：EP18747717.9

申请日：2018-01-30

申请人： Kaneka Corporation

发明人： MURAKAMI, Mutsuaki ,  TATAMI, Atsushi ,  TACHIBANA, Masamitsu

IPC分类号： H01L23/36 ,  C01B32/205 ,  C09J7/20 ,  C09J133/00 ,  C09J163/00 ,  C09J183/04 ,  C09J201/00 ,  H01L23/373 ,  H05K7/20

摘要： An object of the present invention is to provide a thermal interface material made of a graphite film having excellent thermal resistance even when interposed between materials having unevenness, and a method for preparing the thermal interface material. The above object is solved by the thermal interface material containing a graphite film and a fluid substance, wherein the graphite film has a thickness of 100 nm to 15 µm, a density of 1.20 g/cm 3 to 2.26 g/cm 3 , a thermal conductivity of 500 W/mK to 2000 W/mK in a film plane direction, and a weight ratio of the fluid substance to the graphite film is 0.08 to 25.

公开(公告)号：EP3330744A1

公开(公告)日：2018-06-06

申请号：EP16830549.8

申请日：2016-07-27

申请人： Kaneka Corporation

发明人： TATAMI, Atsushi ,  TACHIBANA, Masamitsu ,  MURAKAMI, Mutsuaki

IPC分类号： G01T1/29 ,  H05H13/00 ,  H05H13/04

CPC分类号： G01T1/29 ,  A61N5/1048 ,  H05H13/00 ,  H05H13/04

摘要： An object of the present invention is to provide a graphite sheet for a beam sensor, which is excellent in yield when subjected to laser working. The present invention is a graphite sheet for a beam sensor characterized in that the graphite sheet has no eyeball-shaped convex portions on a surface of its a-b plane.

公开(公告)号：EP3285263A1

公开(公告)日：2018-02-21

申请号：EP16780098.6

申请日：2016-04-14

申请人： Kaneka Corporation ,  Riken

发明人： MURAKAMI, Mutsuaki ,  TACHIBANA, Masamitsu ,  TATAMI, Atsushi ,  HASEBE, Hiroo

IPC分类号： G21K1/14 ,  C01B31/02 ,  G21K1/00 ,  H05H7/08 ,  H05H13/04

CPC分类号： G21K1/14 ,  B29D7/01 ,  B32B5/14 ,  B32B9/007 ,  B32B9/041 ,  B32B15/00 ,  B32B33/00 ,  B32B2307/302 ,  B32B2307/718 ,  B32B2313/04 ,  C01B32/05 ,  C08J7/08 ,  C08J2333/24 ,  C08J2337/00 ,  C08J2339/00 ,  G21K1/00 ,  H01J27/022 ,  H01J2237/004 ,  H05H7/00 ,  H05H7/08 ,  H05H13/04 ,  H05H2007/005 ,  H05H2007/088

摘要： The present invention aims to provide a high-quality charge stripping film for a charge stripping device of ion beam, that has high heat resistance and high thermal conductivity, and that has high quality to the degree of withstanding a beam irradiation over a long period of time. The present invention is a charge stripping film for a charge stripping device of ion beam, wherein the charge stripping film is a carbon film produced by a polymer annealing method, and has a film thickness of not less than 10 µ m and not more than 150 µ m. The present invention comprises a charge stripping film for a charge stripping device of ion beam, wherein the charge stripping film is a carbon film having a thermal conductivity in a film surface direction at 25° C of not less than 300 W/mK, and has a film thickness of not less than 10 µ m and not more than 150 µ m. These stripping films preferably have a density of not less than 0.90 g/cm 3 and not more than 2.26 g/cm 3 , a weight per unit area of not less than 1.5 mg/cm 2 and not more than 30 mg/cm 2 , or an area of not less than 4 cm 2 .

摘要翻译： 本发明的目的在于提供一种用于离子束电荷剥离装置的高质量的充电剥离膜，其具有高耐热性和高导热性，并且在长时间耐受束照射的程度上具有高质量。 时间。 本发明是用于离子束的电荷剥离装置的电荷剥离膜，其中电荷剥离膜是通过聚合物退火法制造的碳膜，并且具有不小于10μm且不大于150μm的膜厚度 。 本发明包括用于离子束的电荷剥离装置的电荷剥离膜，其中该电荷剥离膜是在25℃下在膜表面方向上的热导率不小于300W / mK的碳膜，并且具有 膜厚不小于10μm且不大于150μm。 这些剥离膜的密度优选为不小于0.90g / cm 3且不大于2.26g / cm 3，单位面积重量不小于1.5mg / cm 2且不大于30mg / cm 2，或者面积 不小于4平方厘米。

公开(公告)号：EP3257811A1

公开(公告)日：2017-12-20

申请号：EP16749086.1

申请日：2016-02-02

申请人： Kaneka Corporation

发明人： TACHIBANA, Masamitsu ,  TATAMI, Atsushi ,  MURAKAMI, Mutsuaki

IPC分类号： C01B32/182

CPC分类号： C01B32/20 ,  C01B32/205 ,  C01B2204/04 ,  C01B2204/22 ,  C01P2004/03 ,  C01P2004/04 ,  C01P2004/30 ,  C01P2006/40

摘要： The present invention contains a graphite membrane having a thickness of 10 nm to 12 µm, an area of 5 × 5 mm 2 or more, an electrical conductivity of 8000 S/cm or more, and an arithmetic average roughness Ra of 200 nm or less on the surface of the graphite membrane. It is preferable that a kind of raw material polymer is polyimide, and the heating temperature at the graphitization of the raw material film is 2600 °C or more.

摘要翻译： 本发明包含厚度10nm〜12μm，面积5×5mm 2以上，电导率8000S / cm以上，算术平均粗糙度Ra为200nm以下的石墨膜， 石墨膜的表面。 原料聚合物的种类优选为聚酰亚胺，原料膜的石墨化时的加热温度优选为2600℃以上。

公开(公告)号：EP3579270A1

公开(公告)日：2019-12-11

申请号：EP18748781.4

申请日：2018-01-30

申请人： Kaneka Corporation

发明人： MURAKAMI, Mutsuaki ,  TATAMI, Atsushi ,  TACHIBANA, Masamitsu

IPC分类号： H01L23/36 ,  C01B32/205 ,  C09J7/20 ,  C09J201/00 ,  H01L23/373 ,  H05K7/20

摘要： The object of the present invention is to provide a method for thermally coupling materials with a thermal interface material made of the graphite film having a decreased thermal resistance and a high heat resistance, and the thermal interface material, in which the problems of the thermal interface material made of the conventional polymer/inorganic composite have been solved. The object is solved by using the thermal interface material for transferring heat by interposing between two materials, wherein the thermal interface material contains a graphite film, the graphite film has a thickness T of 200 nm to 3 µm, and a ratio of (Ra/T) of an arithmetic average roughness Ra to thickness T of the surface of the graphite film is 0.1 to 30.

公开(公告)号：EP3385956A1

公开(公告)日：2018-10-10

申请号：EP16870739.6

申请日：2016-11-30

申请人： Kaneka Corporation

发明人： MURAKAMI, Mutsuaki ,  TATAMI, Atsushi ,  TACHIBANA, Masamitsu

IPC分类号： G21K3/00 ,  A61N5/10 ,  C01B32/205 ,  G21K5/04

CPC分类号： A61N5/1001 ,  A61N5/10 ,  A61N5/1077 ,  A61N2005/1087 ,  A61N2005/1095 ,  G21K5/04

摘要： Provided is an energy degrader including an attenuation member that becomes radioactive only to a lesser extent than conventional attenuation members. An attenuation member (11) is a graphite film, the graphite film has a thermal conductivity, in a surface direction, of 1200 W/(m·K) or greater, and the graphite film has a thickness of 0.1 µm or greater and 50 µm or less.

公开(公告)号：EP3285264A1

公开(公告)日：2018-02-21

申请号：EP16780102.6

申请日：2016-04-14

申请人： Kaneka Corporation

发明人： MURAKAMI, Mutsuaki ,  TACHIBANA, Masamitsu ,  TATAMI, Atsushi

IPC分类号： G21K1/14 ,  C01B31/04 ,  G21K1/00 ,  H05H7/08 ,  H05H13/04

CPC分类号： H05H7/10 ,  B32B9/007 ,  B32B27/281 ,  B32B2307/302 ,  B32B2307/54 ,  C01B32/20 ,  C08J5/18 ,  G21K1/14 ,  H05H7/08 ,  H05H13/04 ,  H05H2007/005 ,  H05H2007/088

摘要： The objective of the present invention is providing a charge stripping film for an ion beam, the film is unlikely to be damaged or radioactivated under a high intensity beam irradiation, the film has high durability, and capability of controlling film thickness to be less than 10 µ m without any trouble. The present invention enables to prepare a charge stripping film for an ion beam, comprising a single layer body of a graphitic film having a carbon component of not less than 96 at% and a thermal conductivity in the film surface direction at 25° C of not less than 800 W/mK, or a laminated body of the graphitic film with the thickness of not less than 100 nm and less than 10 µn.

摘要翻译： 本发明的目的是提供用于离子束的电荷剥离膜，该膜在高强度光束照射下不可能被损坏或放射性活化，该膜具有高耐久性，并且控制膜厚度的能力小于10 μm没有任何问题。 本发明能够制备用于离子束的电荷剥离膜，其包括具有不低于96原子％的碳成分和25℃下的膜表面方向上的热导率的单层石墨膜 小于800W / mK，或者石墨膜的厚度不小于100nm且小于10μm的层压体。

公开(公告)号：EP3050845A1

公开(公告)日：2016-08-03

申请号：EP14847487.7

申请日：2014-08-07

申请人： Kaneka Corporation

发明人： TATAMI, Atsushi ,  MURAKAMI, Mutsuaki ,  TACHIBANA, Masamitsu

IPC分类号： C01B31/04

CPC分类号： H05K1/09 ,  B32B9/007 ,  B32B9/045 ,  B32B27/20 ,  B32B27/281 ,  B32B27/34 ,  B32B2307/202 ,  B32B2307/206 ,  B32B2307/302 ,  B32B2457/00 ,  C01B32/20 ,  C01B2204/04 ,  C01B2204/24 ,  C01B2204/32 ,  H05K1/0296 ,  H05K1/0306 ,  H05K1/0353 ,  H05K3/027 ,  H05K3/4611

摘要： The first present invention is a graphite sheet having a thickness of not more than 9.6 µm and more than 50 nm and a thermal conductivity along the a-b plane direction at 25°C of 1950 W/mK or more. The second present invention is a graphite sheet having a thickness in a range of less than 9.6 µm and 20 nm or more, an area of 9 mm2 or more, and a carrier mobility along the a-b plane direction at 25°C of 8000 cm2/V ·sec or more.

摘要翻译： 第一本发明是具有一个厚度不大于9.6微米的和大于50nm，并在25℃下1950 W / m·K以上的沿a-b面方向上的热导率的石墨片。 第二发明是厚度范围为小于9.6微米和20nm以上的石墨片，在9平方毫米或更大的面积，并在25℃下8000平方厘米沿着起始面内方向的载流子迁移/ V·sec以上。

公开(公告)号：EP3637437A1

公开(公告)日：2020-04-15

申请号：EP18814273.1

申请日：2018-06-06

申请人： Kaneka Corporation

发明人： TATAMI, Atsushi ,  TACHIBANA, Masamitsu ,  MURAKAMI, Mutsuaki

IPC分类号： G21K5/08 ,  G21G1/06 ,  G21G1/10 ,  G21G4/08

摘要： An object of the present invention is to realize a target, for neutron-beam or proton-beam irradiation, that can withstand prolonged beam irradiation. A target for proton-beam or neutron-beam, comprising a graphite film (A) having a thermal conductivity of 500 W/mK or more in a direction parallel to an a-b plane of a graphite layer at 25°C; and a layer (B) of a starting material for producing a radioactive substance, and being a laminate of the graphite film (A) and the layer (B). A density of the graphite film (A) is preferably 1.8 to 2.26 g/cm 3 . A tensile strength of the graphite film (A) is preferably 5 MPa or more.

公开(公告)号：EP3409644A1

公开(公告)日：2018-12-05

申请号：EP17744435.3

申请日：2017-01-27

申请人： Kaneka Corporation

发明人： TACHIBANA, Masamitsu ,  TATAMI, Atsushi ,  MURAKAMI, Mutsuaki

IPC分类号： C01B32/205

CPC分类号： C01B32/205

摘要： A graphite film having an area of 1 × 1 cm 2 or more, a thickness of 10 nm to 10 µm, an electrical conductivity in a film surface direction of 400 S/cm or more, and a ratio of an arithmetic average roughness Ra of a surface to the thickness of 1.0 to 600 or 0.3 or less.