公开(公告)号：EP2592123A4

公开(公告)日：2014-01-29

申请号：EP11803292

申请日：2011-06-29

申请人： MITSUI CHEMICALS INC

发明人： TANEICHI DAIKI ,  KOZEKI TAKASHI ,  KOIDE AKIHIRO

IPC分类号： C09J133/00 ,  C09J109/00 ,  C09J125/08 ,  C09J133/06 ,  C09J153/00 ,  G03F1/64

CPC分类号： G03F1/62 ,  C08L23/20 ,  C08L57/02 ,  C08L91/06 ,  C08L2205/02 ,  C09J135/06 ,  C09J153/025 ,  G03F1/64

摘要： The purpose is to provide a pellicle which has a mask adhesive layer that can be plastic-deformed readily particularly at a temperature at which exposure to light is carried out, rarely remains an adhesive agent upon the removal of the mask adhesive layer from a mask and has good handling properties, and which can prevent the position gap of a pattern. For achieving the purpose, a pellicle (10) is provided, which comprises a pellicle frame (14), a pellicle membrane (12) and a mask adhesive layer (15) containing a mask adhesive agent. The mask adhesive agent comprises 100 parts by mass of a thermoplastic elastomer (A) having a tand peak temperature of -20 to 30 DEG C and 20 to 150 parts by mass of an adhesiveness-imparting resin (B).

公开(公告)号：EP3196700A4

公开(公告)日：2018-06-20

申请号：EP15841822

申请日：2015-09-18

申请人： MITSUI CHEMICALS INC

发明人： KOHMURA KAZUO ,  TANEICHI DAIKI ,  KOZEKI TAKASHI ,  ONO YOSUKE ,  ISHIKAWA HISAKO ,  BIYAJIMA TSUNEAKI ,  OKUBO ATSUSHI ,  SATO YASUYUKI ,  HIROTA TOSHIAKI

IPC分类号： G03F1/64 ,  H01L21/027

CPC分类号： G03F1/64 ,  G03F1/62 ,  G03F7/2008

摘要： Provided are a pellicle for extreme ultraviolet light lithography, a method for producing the same, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame supporting the first frame; a through-hole running through the first frame; and a filter covering the through-hole on the side of a surface of the first frame on which the pellicle film is located. The through-hole may run through the pellicle film; and the filter may be located on the pellicle film. The filter may be located, adjacent to the pellicle film, on the first frame.

公开(公告)号：EP3118683A4

公开(公告)日：2017-11-01

申请号：EP15786200

申请日：2015-04-27

申请人： MITSUI CHEMICALS INC

发明人： KOHMURA KAZUO ,  ONO YOSUKE ,  TANEICHI DAIKI ,  SATO YASUYUKI ,  HIROTA TOSHIAKI

IPC分类号： G03F1/64 ,  G03F1/62 ,  G03F7/20

CPC分类号： G03F1/64 ,  G03F1/22 ,  G03F1/62 ,  G03F7/2004 ,  H01L21/67359

摘要： A pellicle frame containing a frame body, the frame body having a groove formed in one end surface of the frame body, the one end surface being an end surface in a thickness direction of the frame body that is located at a side configured to support a pellicle membrane, and a through-hole that penetrates through a portion between an outer circumferential surface of the frame body and a wall surface of the groove formed in the one end surface.

公开(公告)号：EP3196699A4

公开(公告)日：2018-05-16

申请号：EP15841815

申请日：2015-09-17

申请人： MITSUI CHEMICALS INC

发明人： KOHMURA KAZUO ,  TANEICHI DAIKI ,  ONO YOSUKE ,  ISHIKAWA HISAKO ,  BIYAJIMA TSUNEAKI ,  OKUBO ATSUSHI ,  SATO YASUYUKI ,  HIROTA TOSHIAKI

IPC分类号： G03F1/64 ,  H01L21/027

CPC分类号： G03F1/64 ,  G03F7/2008 ,  H01L21/027

摘要： Provided are a pellicle for extreme ultraviolet light lithography, a production method thereof, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame including a thick portion including a first surface carrying a surface of the first frame opposite to a surface on which the pellicle film is located, and also including a second surface connected with the first surface and carrying a side surface of the first frame, the second frame enclosing the pellicle film and the first frame; a through-hole provided in the thick portion of the second frame; and a filter located on an outer side surface of the second frame and covering the through-hole, the outer side surface crossing the surface of the first frame on which the pellicle film is located.

公开(公告)号：EP1719794A4

公开(公告)日：2010-04-28

申请号：EP05703929

申请日：2005-01-20

申请人： MITSUI CHEMICALS INC

发明人： NAGAI NAOSHI ,  MITSUZUKA MASAHIKO ,  NAKAI KAZUOKI ,  ISOKAWA MOTOAKI ,  NAKATSUKA SHIRO ,  TANEICHI DAIKI ,  HONMA SHIROU ,  NARUTAKI TOSHIMITSU

IPC分类号： C08G81/02 ,  C08F8/00 ,  C08G18/62 ,  C08G65/02 ,  C08G65/26 ,  C08G65/34 ,  C08G75/02 ,  C08G77/04 ,  C08G77/442 ,  C08L71/02 ,  C08L81/02

CPC分类号： C08G65/02 ,  A61K8/8111 ,  A61K8/89 ,  A61Q19/00 ,  C08F8/00 ,  C08F8/08 ,  C08F8/14 ,  C08F8/18 ,  C08F8/32 ,  C08F8/42 ,  C08F2810/40 ,  C08G65/34 ,  C08G69/40 ,  C08G73/028 ,  C08G75/02 ,  C08G77/442 ,  C08L71/02 ,  C08L77/00 ,  C08L79/02 ,  C08L81/02 ,  C08L2666/02 ,  C08F110/02 ,  C08F210/16