公开(公告)号：EP3226043A4

公开(公告)日：2018-08-01

申请号：EP15775063

申请日：2015-05-21

申请人： BOE TECHNOLOGY GROUP CO LTD ,  CHENGDU BOE OPTOELECT TECH CO

发明人： LONG QINGDE ,  REN JIAWEI ,  LI DANHUI ,  GAO BIN ,  ZHAO DEGANG ,  ZHANG ZHIYONG ,  CHEN YI ,  FU CHANGYU ,  BAI XUEJIE

IPC分类号： G02B5/20 ,  G02F1/1335 ,  G03F7/20

CPC分类号： G03F7/0007 ,  G02B5/201 ,  G02F1/133516 ,  G03F7/20 ,  G03F7/2008 ,  G03F7/2022

摘要： The present invention relates to a method for manufacturing color filter, a color filter, and a display device including a color filter, to solve the problems of non-uniform edge luminance and color and poor contrast of prior liquid crystal display modules. The method for manufacturing a color filter includes: forming a black matrix on a transparent substrate; forming a photosensitive resist layer on the transparent substrate with the black matrix; disposing a reflection sheet capable of reflecting light on a first side of the transparent substrate to be exposed, the first side being provided with the black matrix; disposing a mask on a second side of the transparent substrate to be exposed, the second side being not provided with the black matrix; and carrying out an exposing process from the second side of the transparent substrate.

公开(公告)号：EP3226043A1

公开(公告)日：2017-10-04

申请号：EP15775063.9

申请日：2015-05-21

申请人： BOE Technology Group Co., Ltd. ,  Chengdu BOE Optoelectronics Technology Co., Ltd.

发明人： LONG, Qingde ,  REN, Jiawei ,  LI, Danhui ,  GAO, Bin ,  ZHAO, Degang ,  ZHANG, Zhiyong ,  CHEN, Yi ,  FU, Changyu ,  BAI, Xuejie

IPC分类号： G02B5/20 ,  G02F1/1335 ,  G03F7/20

CPC分类号： G03F7/0007 ,  G02B5/201 ,  G02F1/133516 ,  G03F7/20 ,  G03F7/2008 ,  G03F7/2022

摘要： The present invention relates to a method for manufacturing color filter, a color filter, and a display device including a color filter, to solve the problems of non-uniform edge luminance and color and poor contrast of prior liquid crystal display modules. The method for manufacturing a color filter includes: forming a black matrix on a transparent substrate; forming a photosensitive resist layer on the transparent substrate with the black matrix; disposing a reflection sheet capable of reflecting light on a first side of the transparent substrate to be exposed, the first side being provided with the black matrix; disposing a mask on a second side of the transparent substrate to be exposed, the second side being not provided with the black matrix; and carrying out an exposing process from the second side of the transparent substrate.

摘要翻译： 本发明涉及一种用于制造滤色器，滤色器和包括滤色器的显示装置的方法，以解决现有液晶显示模块的边缘亮度和颜色不均匀以及对比度差的问题。 用于制造滤色器的方法包括：在透明基板上形成黑矩阵; 在具有黑矩阵的透明基板上形成光敏抗蚀剂层; 在所述透明基板的第一面上设置能够反射光线的反射片，所述第一面设置有所述黑矩阵; 在所述透明基板的第二侧设置待曝光的掩模，所述第二侧未设置有所述黑矩阵; 并从透明基板的第二面进行曝光过程。

公开(公告)号：EP3182206A1

公开(公告)日：2017-06-21

申请号：EP15200040.2

申请日：2015-12-15

申请人： Agfa Graphics NV

发明人： Van Dorpe, Jurgen ,  Meuris, Werner

IPC分类号： G03F7/20

CPC分类号： G03F7/2008 ,  B41J2/465 ,  G03F7/2057

摘要： In a system for making a flexographic print master, a digital mask replaces a conventional mask film in a light box.

摘要翻译： 在用于制作柔版印刷母版的系统中，数字掩模取代了灯箱中的传统掩模薄膜。

公开(公告)号：EP2216684B1

公开(公告)日：2015-10-07

申请号：EP10152686.1

申请日：2010-02-04

申请人： Rohm and Haas Electronic Materials LLC ,  International Business Machines Corporation

发明人： Cameron, James F. ,  Sung, Jin Wuk ,  Amara, John P. ,  Prokopowicz, Gregory P. ,  Valeri, David A. ,  Vyklicky, Libor ,  Huang, Wu-Song S. ,  Li, Wenjie ,  Varanasi, Pushkara R. ,  Popova, Irene Y.

IPC分类号： G03F7/09 ,  G03F7/20 ,  G03F7/11

CPC分类号： G03F7/2008 ,  C08L25/18 ,  C08L29/02 ,  C08L33/06 ,  C08L33/24 ,  G03F7/091 ,  G03F7/11

公开(公告)号：EP2851751A1

公开(公告)日：2015-03-25

申请号：EP12850328.1

申请日：2012-11-15

申请人： Seong, Nak Hoon

发明人： Seong, Nak Hoon

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B21/60

CPC分类号： G03F7/70058 ,  G03B21/60 ,  G03F7/2004 ,  G03F7/2008 ,  G03F7/70066 ,  G03F7/70166 ,  G03F7/7035

摘要： The present invention relates to a linear light source generator, a lenticular system used in the linear light source generator, and a stepper equipped with the linear light source generator. The present invention is also directed to a method for producing a micro-sized linear light source. The present invention is further directed to a method for manufacturing a micro-sized circuit substrate which uses a linear light source with a micro-sized line width and a micro-sized circuit substrate thereof. The present invention uses a linear light source characteristic that a lenticular has. The linear light source generator of the present invention is manufactured sing the characteristics of a linear light source of the lenticular. In order to generate a linear light source with a nono sized line width, a lenticular system is constituted. The lenticular system uses one sheet of the lenticular or stacked lenticulars. The linear light source generator of the present invention may be best applied to the field of a stepper. The linear light source generator of the present invention comprises a light source and a lenticular system. It is preferred that the light source is uniformly scanned onto the lenticular system, and it is also preferred that the light is scanned with uniform strength onto the whole area of the lenticular system.

公开(公告)号：EP2710415A1

公开(公告)日：2014-03-26

申请号：EP12720522.7

申请日：2012-05-15

申请人： Carl Zeiss SMT GmbH

发明人： EHM, Dirk Heinrich ,  HUBER, Peter ,  MUELLENDER, Stephan ,  BLANCKENHAGEN, Gisela von

IPC分类号： G02B1/10 ,  G02B5/08 ,  G02B27/00 ,  G02B19/00 ,  G03F7/20

CPC分类号： G03F7/2008 ,  B82Y10/00 ,  G02B1/105 ,  G02B1/14 ,  G02B5/0816 ,  G02B5/0891 ,  G02B19/0095 ,  G02B27/0006 ,  G03F7/2004 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  Y10T428/265

摘要： In order to reduce the negative influence of reactive hydrogen on the lifetime of a reflective optical element, particularly inside an EUV lithography device, there is proposed for the extreme ultraviolet and soft X-ray wavelength region a reflective optical element (50) having a reflective surface (60) with a multilayer system (51) and in the case of which the reflective surface (60) has a protective layer system (59) with an uppermost layer (56) composed of silicon carbide or ruthenium, the protective layer system (59) having a thickness of between 5 nm and 25 nm.

公开(公告)号：EP2473839B1

公开(公告)日：2014-03-26

申请号：EP10744690.8

申请日：2010-08-16

申请人： Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. ,  Albert-Ludwigs-Universität Freiburg

发明人： HAUNSCHILD, Jonas ,  REIN, Stefan ,  GLATTHAAR, Markus

IPC分类号： G01N21/64 ,  G01N21/66 ,  G01R31/26 ,  H01L21/66

CPC分类号： G01N21/6489 ,  G01N21/66 ,  G01N21/9501 ,  G01N2015/1479 ,  G03F7/2008 ,  G06F17/00 ,  H02S50/10

公开(公告)号：EP1950493A3

公开(公告)日：2013-01-16

申请号：EP08075014.4

申请日：2008-01-07

申请人： DYMAX CORPORATION

发明人： Lester, George H. ,  Cavanaugh, Thomas J. ,  Middlemass, Kirk A. ,  Platzer, Stephan J.W.

IPC分类号： F21V9/10 ,  G02B5/00 ,  G02B6/26 ,  G03F7/20

CPC分类号： G02B5/005 ,  G03F7/20 ,  G03F7/2008

摘要： The invention provides a light exposure apparatus containing a light exposure control device for curing light sensitive adhesives. The light exposure apparatus includes a) a light source; b) a light transmitter for transmitting light from the light source; and c) a light intensity controlling component between the light source and the light transmitter. The light intensity controlling component includes a light regulator (116) having a planar face between the light source and the light transmitter. The light regulator (116) has opaque members (2) having a continuously tapered width, on the face of the light regulator. Each planar member is spaced from adjacent planar members by a light transparent segment (4) having a tapered width, on the face of the light regulator (116). The light regulator (116) is mounted such that a portion of the opaque members (2) and portion of the substantially light transparent segments (4) are adjustably positioned between the light source and the light transmitter.

公开(公告)号：EP1245998A2

公开(公告)日：2002-10-02

申请号：EP02290697.8

申请日：2002-03-20

申请人： Automa-Tech

发明人： Vibet, Gilles M. ,  Sorel, Alain M.

IPC分类号： G03B27/10 ,  H05K3/00 ,  G03F7/20

CPC分类号： G03F7/2032 ,  G03F7/2008 ,  G03F7/201 ,  G03F7/2014 ,  H05K3/0082

摘要： L'invention concerne un dispositif pour insoler une face (118) d'un panneau (120), en particulier pour panneau de circuit imprimé. Selon un premier aspect de l'invention, le dispositif comporte :

des moyens pour maintenir un cliché et ledit panneau (120),
un système optique (112) émettant un faisceau lumineux (I), des moyens de traitement (116, 151) pour générer un faisceau lumineux homogène et collimaté (III) dont l'angle d'incidence moyen par rapport à la surface à insoler (118) est inférieur à 2° et dont l'homogénéité de l'éclairement présente un écart inférieur à ± 10% par rapport à la valeur moyenne, et des moyens de mise en forme (158, 160) pour transformer ledit faisceau lumineux (III) en une bande lumineuse (126, 162),
des moyens de déplacement (121) pour générer un mouvement entre ladite bande lumineuse (126) et ladite face (118), et
des moyens d'adaptation de la vitesse de déplacement entre ladite bande lumineuse (126) et ladite face (118).

摘要翻译： 该装置具有用于支撑该板（120）的刻板印版的单元，发射光束（1）的光学系统（112），用于产生均匀光束的处理装置（116,151）并使其准直（111 ），其具有将要暴露的表面的入射角小于2度，并且其照明均匀度低于10％的平均值。 存在用于将该光束变换为发光带（126,162）的成形单元（158,160）以及用于产生发光带（126）和该面（118）之间的运动的位移布置（121）。 还有一个单元适应发光带和这个面之间的移动速度。

公开(公告)号：EP0497311A2

公开(公告)日：1992-08-05

申请号：EP92101465.0

申请日：1992-01-29

申请人： FUJI PHOTO FILM CO., LTD.

发明人： Yamaguchi, Jun, c/o Fuji Photo Film Co., Ltd.

IPC分类号： G03B27/16 ,  G03B27/30 ,  G03F7/00

CPC分类号： G03B27/30 ,  G03B2227/325 ,  G03F7/0022 ,  G03F7/2008

摘要： An exposing apparatus adapted for exposing a completely dry photosensitive recording medium which produces no waste and uses no developing solution, and which can expose a multicolor photosensitive recording medium quickly to form a clear image free from mixture of colors, and a method for forming high-quality color images with ease using the above exposing apparatus. The exposing apparatus includes a device for transmitting light whose wavelength corresponds to a spectral response of the photosensitive recording medium, which device is interposed between an exposing light source and the photosensitive recording medium, and a device for shielding a heat ray from the exposing light source, which device is interposed between the device for transmitting light whose wavelength corresponds to the spectral response and the exposing light source. The method for forming an image uses such exposing apparatus and forms the image by exposing a heat developed photosensitive recording medium a plurality of times and then heating the exposed photosensitive recording medium substantially uniformly, the heat developed photosensitive recording medium forming a latent image on a photocuring composition by exposure and causing a component having to do with coloring or discoloring by heating to migrate within itself (the recording medium) in accordance with the latent image.

摘要翻译： 一种曝光装置，适用于曝光不产生浪费的完全干燥的光敏记录介质，不使用显影液，并且能够快速曝光多色感光记录介质以形成不含色彩混合的清晰图像， 使用上述曝光装置容易地获得高质量的彩色图像。 曝光装置包括用于透射光的装置，该装置的波长对应于感光记录介质的光谱响应，该装置介于曝光光源和感光记录介质之间，以及用于屏蔽来自曝光光源的热射线的装置 该装置插入在用于透射波长对应于光谱响应的光的装置和曝光光源之间。 形成图像的方法使用这种曝光装置并通过多次暴露出热显影的光敏记录介质形成图像，然后基本均匀地加热曝光的感光记录介质，在光固化中形成潜像的显影感光记录介质 通过曝光产生组合物，并使根据潜像使得通过加热而着色或变色的组分在其本身（记录介质）内迁移。