公开(公告)号：EP3218926A2

公开(公告)日：2017-09-20

申请号：EP15830887.4

申请日：2015-11-12

申请人： Mapper Lithography IP B.V.

发明人： DANSBERG, Michel Pieter ,  HESDAHL, Sjoerd ,  JONGENEEL, Jan Pieter Roelof

IPC分类号： H01L21/67 ,  G03F7/20 ,  B25J9/04 ,  B25J11/00 ,  H01L21/677 ,  H01L21/687 ,  B25J17/02

CPC分类号： B65G47/90 ,  B25J9/0087 ,  B25J9/043 ,  G03F7/7075 ,  H01L21/67201 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67766 ,  H01L21/68707

摘要： The present invention relates to an apparatus and a method for transferring substrates into and from a vacuum chamber in a lithography apparatus. The load lock system comprises: a load lock chamber provided with an opening for allowing passage of a substrate in and out of the load lock chamber, and a transfer apparatus comprising a sub-frame at least partially arranged in the load lock chamber, an arm which is, with a proximal end thereof, connected to the sub-frame, and a substrate receiving unit which is connected to a distal end of the arm. The arm comprises at least three hinging arm parts, wherein a first and a second arm part are hingedly connected to the sub-frame with a proximal end thereof. A third arm part is hingedly connected to the distal ends of the first and second arm parts. The arm parts are arranged to form a four-bar linkage.

摘要翻译： 本发明涉及一种用于将衬底传送到光刻设备中的真空室和从真空室传送衬底的设备和方法。 所述负载锁定系统包括：装载锁定室，所述装载锁定室设置有用于允许基板进出所述负载锁定室的开口;以及传送装置，所述传送装置包括至少部分地布置在所述负载锁定室中的子框架，臂 其近端连接到副框架;以及基板接收单元，其连接到臂的远端。 臂包括至少三个铰接臂部分，其中第一和第二臂部分以其近端铰接地连接到子框架。 第三臂部分铰接连接到第一和第二臂部分的远端。 臂部分被布置成形成四连杆机构。