公开(公告)号：EP3218926A2

公开(公告)日：2017-09-20

申请号：EP15830887.4

申请日：2015-11-12

申请人： Mapper Lithography IP B.V.

发明人： DANSBERG, Michel Pieter ,  HESDAHL, Sjoerd ,  JONGENEEL, Jan Pieter Roelof

IPC分类号： H01L21/67 ,  G03F7/20 ,  B25J9/04 ,  B25J11/00 ,  H01L21/677 ,  H01L21/687 ,  B25J17/02

CPC分类号： B65G47/90 ,  B25J9/0087 ,  B25J9/043 ,  G03F7/7075 ,  H01L21/67201 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67766 ,  H01L21/68707

摘要： The present invention relates to an apparatus and a method for transferring substrates into and from a vacuum chamber in a lithography apparatus. The load lock system comprises: a load lock chamber provided with an opening for allowing passage of a substrate in and out of the load lock chamber, and a transfer apparatus comprising a sub-frame at least partially arranged in the load lock chamber, an arm which is, with a proximal end thereof, connected to the sub-frame, and a substrate receiving unit which is connected to a distal end of the arm. The arm comprises at least three hinging arm parts, wherein a first and a second arm part are hingedly connected to the sub-frame with a proximal end thereof. A third arm part is hingedly connected to the distal ends of the first and second arm parts. The arm parts are arranged to form a four-bar linkage.

摘要翻译： 本发明涉及一种用于将衬底传送到光刻设备中的真空室和从真空室传送衬底的设备和方法。 所述负载锁定系统包括：装载锁定室，所述装载锁定室设置有用于允许基板进出所述负载锁定室的开口;以及传送装置，所述传送装置包括至少部分地布置在所述负载锁定室中的子框架，臂 其近端连接到副框架;以及基板接收单元，其连接到臂的远端。 臂包括至少三个铰接臂部分，其中第一和第二臂部分以其近端铰接地连接到子框架。 第三臂部分铰接连接到第一和第二臂部分的远端。 臂部分被布置成形成四连杆机构。

公开(公告)号：EP2732341B1

公开(公告)日：2016-11-30

申请号：EP12738653.0

申请日：2012-07-10

申请人： Mapper Lithography IP B.V.

发明人： LOOIJE, Alexius Otto ,  DANSBERG, Michel Pieter ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70775

公开(公告)号：EP2732341A1

公开(公告)日：2014-05-21

申请号：EP12738653.0

申请日：2012-07-10

申请人： Mapper Lithography IP B.V.

发明人： LOOIJE, Alexius Otto ,  DANSBERG, Michel Pieter ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70775

摘要： The invention relates to a lithography system (1) for patterning a target (30), said system comprising a feedback control system (90) comprising an actuator (40) for displacing the target, a measurement system (50) for measuring a position of said target, and a control unit (60) adapted for controlling the actuator based on the position measured by the measurement system, said feedback control system having a first latency {λι) being a maximum latency between measuring and controlling the actuator based on said measuring, a storage system (70) for storing the measured positions, comprising a receive buffer (71) and a storage unit (72) with a second latency (λ2) being an average latency between receiving measured positions in the receive buffer and storing said measured positions in the storage unit, wherein the first latency is at least an order of magnitude smaller than the second latency, the feedback control system comprising a unidirectional connection (82) for transmitting said measured positions to the storage system.

公开(公告)号：EP2179327A1

公开(公告)日：2010-04-28

申请号：EP08779017.6

申请日：2008-07-11

申请人： Mapper Lithography IP B.V.

发明人： DE BOER, Guido ,  DANSBERG, Michel Pieter ,  KRUIT, Pieter

IPC分类号： G03F7/20 ,  H01L21/67 ,  H01J37/317

CPC分类号： G03F7/707 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70308 ,  G03F7/70783 ,  H01J37/20 ,  H01J37/3174 ,  H01J2237/2007 ,  H01L21/6875 ,  H01L21/68757

摘要： The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

公开(公告)号：EP3140697A1

公开(公告)日：2017-03-15

申请号：EP15728208.8

申请日：2015-05-01

申请人： Mapper Lithography IP B.V.

发明人： VIJVERBERG, Joep Gerard ,  PLANDSOEN, Laurens Vincent ,  VAN GELDER, Bas ,  DE BOER, Guido ,  DANSBERG, Michel Pieter

IPC分类号： G03F7/20

CPC分类号： B25J11/00 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F9/7096 ,  H01J37/16 ,  H01J37/3177 ,  H01J2237/024 ,  H01J2237/166 ,  H01L21/6719 ,  H01L21/67225 ,  H01L21/67775

摘要： The invention relates to an assembly (1) for enclosing a target processing machine. The assembly comprises an enclosure (2) and a transfer unit (3). The enclosure comprises a base plate (21) for arranging said target processing machine thereon, side wall panels (22), which are fixed to said base plate, and a top wall panel (23) which is fixed to said side wall panels. In addition, the enclosure comprises an access opening (24) in a side wall of the enclosure. The transfer unit comprising one or more transfer elements (31) for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel (32) which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling (33) which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.

摘要翻译： 本发明涉及用于封闭目标加工机器的组件。 组件包括外壳和转移单元。 外壳包括用于在其上布置所述目标处理机的基板，固定到所述基板的侧壁板和固定到所述侧壁板的顶壁板。 此外，外壳包括在外壳的侧壁中的进入开口。 传送单元包括用于相对于基板移动传送单元的一个或多个传送元件。 传送单元还包括门板，其被布置成用于关闭进入开口，其中门板通过柔性联接件可移动地安装到传送单元，该柔性联接器允许门板相对于传送单元至少移动 在朝向和/或远离外壳的方向上。

公开(公告)号：EP2179327B1

公开(公告)日：2016-06-01

申请号：EP08779017.6

申请日：2008-07-11

申请人： Mapper Lithography IP B.V.

发明人： DE BOER, Guido ,  DANSBERG, Michel Pieter ,  KRUIT, Pieter

IPC分类号： G03F7/20 ,  H01L21/67 ,  H01J37/317

CPC分类号： G03F7/707 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70308 ,  G03F7/70783 ,  H01J37/20 ,  H01J37/3174 ,  H01J2237/2007 ,  H01L21/6875 ,  H01L21/68757