摘要:
A photovoltaic device comprising an intermediate contact layer for which the reflection characteristics have been optimized. The photovoltaic device (100) comprises a transparent electrode layer (2), which is disposed on a substrate (1) and has a textured structure on the surface opposite the substrate (1), a photovoltaic layer (3) composed of two electric power generation layers (91, 92), a back electrode layer (4), and an intermediate contact layer (5) disposed between the two electric power generation layers (91, 92), wherein the intermediate contact layer (5) comprises a titanium oxide film comprising mainly titanium oxide and a backside transparent conductive film comprising mainly a transparent conductive oxide, with the titanium oxide film disposed nearer the substrate (1), and the thickness of the titanium oxide film is a value that falls within a range defined as being from 65 to 110 nm inclusive when the thickness of the backside transparent conductive film is 5 nm, and similarly, from 65 to 95 nm inclusive when 10 nm, from 65 to 90 nm inclusive when 15 nm, from 60 to 85 nm inclusive when 20 nm, from 55 to 70 nm inclusive when 25 nm, and from 55 to 65 nm inclusive when 30 nm.
摘要:
The short-circuit current of a photovoltaic device is improved by optimizing the transparent conductive layer. A photovoltaic device 100 comprising a first transparent electrode layer 2, an electric power generation layer 3, a second transparent electrode layer 6 and a back electrode layer 4 on a substrate 1, wherein the film thickness of the second transparent electrode layer 6 is not less than 80 nm and not more than 100 nm, and the light absorptance for the second transparent electrode layer 6 in a wavelength region from not less than 600 nm to not more than 1,000 nm is not more than 1.5%. Also, a photovoltaic device 100 wherein the film thickness of the second transparent electrode layer 6 is not less than 80 nm and not more than 100 nm, and the reflectance for light reflected at the second transparent electrode layer 6 and the back electrode layer 4 is not less than 91% in the wavelength region from not less than 600 nm to not more than 1,000 nm.
摘要:
Status monitoring of a wind turbine is automatically performed, and evaluation of that status is quantitatively performed according to an appropriate criterion. Provided is a wind turbine monitoring device including a first storage unit (2) in which a diagnostic data file is stored; a second storage unit (28) in which a normal data file is stored; a diagnostics setting unit (29) that that extracts and sets a plurality of datasets to be used in diagnosis from the first storage unit and that extracts and sets a plurality of datasets to be used in diagnosis from the second storage unit; an index-value calculating unit (30) that calculates status index values representing the status of the wind turbine using a statistical calculation method, on the basis of the set datasets in the diagnostic data file and the datasets in the reference data file; a fault determining unit that evaluates the status of the wind turbine on the basis of the status index values; and a notification unit (32) that notifies the result of this evaluation.
摘要:
A film thickness configuration for a triple-junction photovoltaic device that is suitable for obtaining high conversion efficiency. The photovoltaic device (100) comprises, on top of a substrate (1), a transparent electrode layer (2), a photovoltaic layer (3) containing three stacked cell layers (91, 92, 93) having pin junctions, and a back electrode layer (4), wherein an incident section cell layer (91) provided on the light-incident side has an amorphous silicon i-layer having a thickness of not less than 100 nm and not more than 200 nm, a bottom section cell layer (93) provided on the opposite side from the light-incident side has a crystalline silicon-germanium i-layer having a thickness of not less than 700 nm and not more than 1,600 nm, and the ratio of germanium atoms relative to the sum of germanium atoms and silicon atoms within the crystalline silicon-germanium i-layer is not less than 15 atomic% and not more than 25 atomic%, and a middle section cell layer (92) provided between the incident section cell layer (91) and the bottom section cell layer (93) has a crystalline silicon i-layer having a thickness of not less than 1,000 nm and not more than 2,000 nm.
摘要:
A photovoltaic device that exhibits improved light absorption properties for the electric power generation layer and a process for producing such a photovoltaic device are provided by optimizing the surface shape of the back surface structure. A photovoltaic device 100 comprising a first transparent electrode layer 2, an electric power generation layer 3, a second transparent electrode layer 6 and a back electrode layer 4 provided sequentially on a substrate 1, wherein the back electrode layer 4 comprises a thin film of silver, and the surface of the second transparent electrode layer 6 on the surface of the back electrode layer 4 has a fine uneven texture, for which the surface area magnification ratio relative to the projected surface area is not less than 10% and not more than 32%. Also, a photovoltaic device comprising a first transparent electrode layer 2, an electric power generation layer 3, a second transparent electrode layer 6 and a back electrode layer 4 provided sequentially on a substrate 1, wherein the back electrode layer 4 comprises a thin film of silver, the back electrode layer-side surface of the second transparent electrode layer 6 has a fine uneven texture, and the second transparent electrode layer 6 comprises needle-like crystals.
摘要:
A photovoltaic device in which, by optimizing the structures for a substrate-side transparent electrode layer, an intermediate layer, and a back electrode layer, the extracted electrical current can be increased. The photovoltaic device (100) includes at least a transparent electrode layer (2), a photovoltaic layer (3) and a back electrode layer (4) provided on a substrate (1), wherein the surface of the transparent electrode layer (2) on which the photovoltaic layer (3) is disposed includes a textured structure composed of ridges (2a) and a fine micro-texture (2b) provided on the surface of the ridges (2a), the pitch of the textured structure is not less than 1.2 µm and not more than 1.6 µm, the height of the ridges (2a) is not less than 0.2 µm and not more than 0.8 µm, the pitch between peaks in the fine micro-texture (2b) is not less than 0.05 µm and not more than 0.14 µm, and the height of peaks is not less than 0.02 µm and not more than 0.1 µm.
摘要:
A thin-film inspection apparatus includes a storage section (14) that stores at least two feature-value characteristics in which at least two feature values selected from feature values in a spectral reflectance spectrum that are affected by a variation in the film thickness of at least one of a first transparent thin film and a second transparent thin film are each associated with the film thickness of the first transparent thin film and the film thickness of the second transparent thin film; a light irradiation section (11) that irradiates an inspection-target substrate (S) with white light through a transparent glass substrate; a light receiving section (12) that receives reflected light reflected from the inspection-target substrate (S); and an arithmetic section (15) that obtains measurement values of the feature values stored in the storage section (14) from a spectral reflectance spectrum generated based on the received reflected light and that calculates the film thickness of each of the first transparent thin film and the second transparent thin film by using the obtained measurement values of the feature values and the feature-value characteristics stored in the storage section (14).
摘要:
An object is to efficiently measure the resistivity of a transparent conductive film with high accuracy in a non-destructive and non-contact manner. Provided is a resistivity testing device that includes a light emitting device (3) that emits p-polarized emission light having a wavelength selected by a preliminarily performed test-condition selecting method toward a transparent conductive film, formed on a light-transmissive substrate conveyed along a manufacturing line, from a film-surface side at an incidence angle selected by the method; a light detecting device (2) that detects reflected light reflected at the transparent conductive film; and an information processor (7) that calculates an evaluation value related to the amount of light of the reflected light with respect to the wavelength on the basis of the intensity of the detected light and obtains a resistivity from the calculated evaluation value by using a correlation characteristic in which the evaluation value and the resistivity are associated with each other in advance.