公开(公告)号：EP3163375A1

公开(公告)日：2017-05-03

申请号：EP16183984

申请日：2004-08-27

申请人： NIPPON KOGAKU KK

发明人： ARAI DAI ,  HARA HIDEAKI ,  TAKAIWA HIROAKI

IPC分类号： G03F7/20 ,  G03B27/42 ,  H01L21/027

CPC分类号： G03F7/70341 ,  G03F7/70991

摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.

摘要翻译： 曝光设备通过经由投影光学系统和填充投影光学系统和基板之间的间隙的液体将图案的图像投影到基板上来曝光基板。 该曝光装置具有液体回收机构，该液体回收机构具有由商用电源供应的电力驱动的驱动部分以及与商用电源分离的不间断电源。 当商用电源发生故障时，驱动部分的电力供应被切换到不间断电源。

公开(公告)号：EP1652003A4

公开(公告)日：2007-10-10

申请号：EP04754129

申请日：2004-06-02

申请人： NIPPON KOGAKU KK

发明人： HAZELTON ANDREW J ,  TAKAIWA HIROAKI

IPC分类号： G03F7/20 ,  G03B27/58 ,  G03F20060101

CPC分类号： G03F7/70975 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  Y10T29/49826

摘要： Methods and apparatus for allowing a liquid to be substantially contained between a lens (46) and a wafer table (51) assembly of an immersion lithography system are disclosed. According to one aspect of the present invention, an exposure apparatus includes a lens (46) and a wafer table (51) assembly. The wafer table (51) assembly has a top surface, and is arranged to support a wafer (64) to be moved with respect to the lens (46) as well as at least one component (350). The top surface of the wafer (64) and the top surface of the component (350) are each at substantially a same height as the top of the wafer table (51) assembly. An overall top surface of the wafer table (51) assembly which includes the top surface of the wafer (64), the top surface of the wafer table (51) assembly, and the top surface of the at least one component (350) is substantially planar.

摘要翻译： 公开了用于允许液体基本上包含在浸没式光刻系统的透镜（46）和晶片台（51）组件之间的方法和装置。 根据本发明的一个方面，曝光装置包括透镜（46）和晶片台（51）组件。 晶片台（51）组件具有顶表面，并且被布置成支撑相对于透镜（46）移动的晶片（64）以及至少一个部件（350）。 晶片（64）的顶表面和部件（350）的顶表面各自与晶片台（51）组件的顶部处于基本相同的高度。 晶片台（51）组件的整个顶表面包括晶片（64）的顶表面，晶片台（51）组件的顶表面和至少一个部件（350）的顶表面， 基本上平面。

公开(公告)号：EP1713114A4

公开(公告)日：2010-09-22

申请号：EP05709451

申请日：2005-01-28

申请人： NIPPON KOGAKU KK

发明人： TAKAIWA HIROAKI ,  HORIUCHI TAKASHI

IPC分类号： H01L21/027 ,  G01B11/00 ,  G01B11/02 ,  G01B11/24 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03B27/42 ,  G03F7/7085 ,  G03F7/70916

摘要： An exposure apparatus for exposing a substrate by emitting exposure light thereto through a projection optical system and liquid, has a detection apparatus that detects whether the liquid is present on an object disposed lower than a front end of the projection optical system. Another detection apparatus has an emitting portion that emits detection light to an immersion area between the projection optical system and an object disposed on an image plane side thereof, and a light-receiving portion disposed at a predetermined position for the detection light; therein, at least one of size and shape of the immersion area is obtained based on light receiving results. The detection apparatus is used to detect the presence of liquid on such lower-disposed object, the state of the immersion area, or shape or contact angle of the liquid. Optimal measures are taken, based on detection results, for maintaining high exposure and measurement accuracies.

公开(公告)号：EP1801850A4

公开(公告)日：2008-12-10

申请号：EP05783614

申请日：2005-09-16

申请人： NIPPON KOGAKU KK

发明人： NAGASAKA HIROYUKI ,  SHIBUTA MAKOTO ,  NAKANO KATSUSHI ,  YOSHIDA YUICHI ,  TAKAIWA HIROAKI

IPC分类号： H01L21/00

CPC分类号： G03F7/70341 ,  G03F7/707 ,  H01L21/6715 ,  H01L21/6838 ,  H01L21/68735 ,  H01L21/6875 ,  Y10T29/49002

摘要： To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus (PH) is provided with a base material (PHB), a first holding portion (PHB) formed on the base material (PHB) for holding the substrate (P), and a second holding portion (PH2) formed on the base material (PHB) for holding a plate member (T) by surrounding the circumference of a processing substrate (P) held by the first holding portion (PH1). The second holding portion (PH2) holds the plate member (T) so as to form a second space (32) on the side of the rear surface (Tb) of the plate member (T). On the rear surface (Tb) of the plate member (T), an absorbing member (100) is arranged for absorbing the liquid (LQ) entered from a gap (A) between the substrate (P) held by the first holding portion (PH1) and the plate member (T) held by the second holding portion (PHB2).

公开(公告)号：EP1653501A4

公开(公告)日：2008-05-21

申请号：EP04748150

申请日：2004-07-26

申请人： NIPPON KOGAKU KK

发明人： MAGOME NOBUTAKA ,  KOBAYASHI NAOYUKI ,  SAKAKIBARA YASUYUKI ,  TAKAIWA HIROAKI

IPC分类号： H01L21/027 ,  G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70525 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/709

摘要： An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.

公开(公告)号：EP1659620A4

公开(公告)日：2008-01-30

申请号：EP04772736

申请日：2004-08-27

申请人： NIPPON KOGAKU KK

发明人： ARAI DAI ,  HARA HIDEAKI ,  TAKAIWA HIROAKI

IPC分类号： H01L21/027 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70991

摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.

公开(公告)号：EP1641028A4

公开(公告)日：2008-10-15

申请号：EP04746086

申请日：2004-06-11

申请人： NIPPON KOGAKU KK

发明人： OWA SOICHI ,  MAGOME NOBUTAKA ,  HIRUKAWA SHIGERU ,  KUDO YOSHIHIKO ,  INOUE JIRO ,  KOHNO HIROTAKA ,  NEI MASAHIRO ,  IMAI MOTOKATSU ,  NAGASAKA HIROYUKI ,  SHIRAISHI KENICHI ,  NISHII YASUFUMI ,  TAKAIWA HIROAKI

IPC分类号： H01L21/027 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： In exposing substrate P by projecting an image of a pattern onto substrate P via projection optical system PL and liquid 1, side surface PB and underside surface PC of substrate P are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

公开(公告)号：EP1571694A4

公开(公告)日：2008-10-15

申请号：EP03777282

申请日：2003-12-05

申请人： NIPPON KOGAKU KK

发明人： MAGOME NOBUTAKA ,  TAKAIWA HIROAKI ,  ARAI DAI

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70991 ,  G03F7/70341 ,  G03F7/7075 ,  Y10S430/146

摘要： An exposure apparatus which performs an exposure while filling a space between a projection optical system and a substrate with a liquid, and in which deterioration of a device caused by adherent liquid on the substrate is suppressed is provided. A device manufacturing system (SYS) includes a main body of an exposure apparatus (EX) which fills a space between a projection optical system (PL) and a substrate (P)with a liquid (50) and projects an image of a pattern onto the substrate (P) via the projection optical system (PL) and the liquid (50); an interface section (IF) which is arranged between the exposure apparatus main body (EX) and a coater/developer main body (C/D) which processes the substrate (P) after exposure; and a liquid-removing unit (100) which removes the liquid (50) adhering to the substrate (P) before the exposed substrate (P) is transferred into the coater/developer main body (C/D) through the interface section (IF).

摘要翻译： 在用液体填充投影光学系统和基板之间的空间的同时执行曝光的曝光设备能够抑制由基板上的粘附液体引起的设备劣化。 装置制造系统（SYS）包括曝光装置主单元（EX），接口部分（IF）和液体去除单元（100）。 在曝光装置主体（EX）中，投影光学系统（PL）与基板（P）之间的空间填充有液体（50），并且图案的图像通过 投影光学系统（PL）和液体（50）。 接口部分（IF）布置在曝光装置主单元（EX）和曝光后处理基板（P）的涂布机/显影主单元（C / D）之间。 在暴露的基板（P）经由界面部分（IF）被转移到涂布/显影主体（C / D）中之前，液体去除单元（100）去除粘附到基材（P）的液体（50）。

公开(公告)号：EP1670039A4

公开(公告)日：2008-07-23

申请号：EP04772744

申请日：2004-08-27

申请人： NIPPON KOGAKU KK

发明人： HARA HIDEAKI ,  TAKAIWA HIROAKI

IPC分类号： H01L21/027 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70916

摘要： An exposure apparatus EX exposes a substrate P by filling a liquid 1 between a projection optical system PL and the substrate P, and projecting the image of a pattern onto the substrate P through the projection optical system PL and the liquid 1, and includes a liquid removing mechanism 40 that intermittently blows a gas against a reference member 7 disposed in a vicinity of the image plane of the projection optical system PL, movable mirror 55, and the like, to which the liquid 1 is adhered in order to remove that liquid 1. By such a constitution, it is possible to provide an exposure apparatus that can remove unnecessary liquid when exposing a substrate by projecting a pattern onto the substrate through the projection optical system and the liquid, and to form a desired device pattern on the substrate.