公开(公告)号：EP2789668A4

公开(公告)日：2015-07-01

申请号：EP12854706

申请日：2012-11-12

申请人： NISSAN CHEMICAL IND LTD

发明人： NISHITA TOKIO ,  MIZUOCHI RYUTA ,  SAKAMOTO RIKIMARU ,  YAMADA TOMOHISA ,  NAKAIE NAOKI ,  TAKAYAMA YUKI

IPC分类号： C09K3/16 ,  C07B61/00 ,  C07C209/10 ,  C07C211/54 ,  C08G73/02 ,  C08L79/02 ,  C09D179/02 ,  G03F7/09 ,  G03F7/11

CPC分类号： C07C211/54 ,  C08G73/0266 ,  C08L79/02 ,  C09D179/02 ,  G03F1/00 ,  G03F7/093 ,  G03F7/11 ,  H01B1/128

摘要： There is provided a composition for forming an antistatic film that has a superior coating performance on the surface of a resist film and forms antistatic film capable of protecting a resist film from being charged. A composition for forming an antistatic film, comprising: an oligomer compound of Formula (1A): (where R 1 is a hydrogen atom or a group of Formula (2), each of R 2 and R 3 is independently a hydrogen atom, a group of Formula (3), or a group of Formula (4), at least one of the plurality of Rs is a sulfo group, a and b are positive integers satisfying 2 ‰¤ (a + b) ‰¤ 6; and each of a plurality of xs is independently an integer from 0 to 4): (where n is an integer satisfying 1 ‰¤ n

公开(公告)号：EP3106921A4

公开(公告)日：2017-10-04

申请号：EP15749601

申请日：2015-01-30

申请人： NISSAN CHEMICAL IND LTD

发明人： UMEZAKI MAKIKO ,  KARASAWA RYO ,  SHIGAKI SHUHEI ,  MIZUOCHI RYUTA

IPC分类号： G03F7/11 ,  C08F220/14 ,  C08L33/04 ,  C08L33/14 ,  C08L101/00 ,  C08L101/04 ,  C09D133/12 ,  G03F7/075 ,  G03F7/09 ,  H01L21/027

CPC分类号： C09D133/12 ,  C08F220/14 ,  C08L33/14 ,  C08L101/00 ,  C08L101/04 ,  G03F7/0752 ,  G03F7/094 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/30 ,  H01L21/0276 ,  C08F212/14