公开(公告)号：EP1420002B1

公开(公告)日：2009-09-09

申请号：EP02751698.8

申请日：2002-07-25

Applicant: OSAKA Titanium Technologies Co., Ltd.

Inventor： NATSUME, Yoshitake ,  ONISHI, Takashi ,  OGASAWARA, Tadashi ,  WATANABE, Munetoshi ,  IWASE, Toshiharu

IPC: C04B35/01 ,  C23C14/34 ,  C23C14/24 ,  C01B33/113

CPC classification number: C04B35/14 ,  C04B35/645 ,  C04B2235/3418 ,  C04B2235/428 ,  C04B2235/5427 ,  C04B2235/6567 ,  C04B2235/6581 ,  C04B2235/77 ,  C04B2235/79 ,  C23C14/10 ,  C23C14/30 ,  C23C14/3414

Abstract: A method for producing a silicon monoxide sintered product which comprises effecting a sintering by hot press forming under a pressure of 15 MPa or more at a temperature of 1200 to 1350˚C, to thereby provide a sintered product having a bulk density of 1.68 g/cm3 or more; and the method which further comprises using a press mold having an outer mold of integral type and, disposed inside it, plural inner molds divided with spaces packed with cushioning sheets, to thereby provide a sintered product having a diameter of 100 mm or more and a bulk density being 95 % or more of its true density and 2.13 g/cm3 or more. The method allows the production of a silicon monoxide sintered product exhibiting a uniform structure, good mechanical processability and reduced splashing, which is required to a silicon monoxide material for vapor deposition, and such a product further having a diameter of 100 mm or more and a shape matching to a target holder, which is required to a silicon monoxide material for a sputtering target, with stability and good productivity.