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    HARD LUBRICATING COATING FILM AND HARD LUBRICATING COATING FILM-COVERED TOOL
    1.
    发明公开
    HARD LUBRICATING COATING FILM AND HARD LUBRICATING COATING FILM-COVERED TOOL 审中-公开
    HARTER GLEITBESCHICHTUNGSFILM MIT DEM HARTEN GLEITBESCHICHTUNGSFILM BESCHICHTETES WERKZEUG

    公开(公告)号：EP3075474A4

    公开(公告)日：2017-05-17

    申请号：EP13898341

    申请日：2013-11-26

    申请人： OSG CORP ,  NAT UNIV CORP TOHOKU UNVERSITY

    发明人： WANG MEI ,  SAKURAI MASATOSHI ,  SUTOU YUJI ,  KOIKE JUNICHI

    IPC分类号： B23B27/14 ,  B23C5/16 ,  B23C5/28 ,  C23C14/00 ,  C23C14/06 ,  C23C14/08 ,  C23C14/34 ,  C23C14/50 ,  C23C28/00 ,  C23C28/04

    CPC分类号： C23C14/0073 ,  B23C5/28 ,  B23C2228/04 ,  B23C2228/08 ,  B23C2228/10 ,  C23C14/06 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/0664 ,  C23C14/0676 ,  C23C14/345 ,  C23C14/505 ,  C23C28/042 ,  C23C28/044 ,  C23C28/42

    摘要： Provided are: a hard lubricating coating film which is hard and has wear resistance; and a hard lubricating coating film-covered tool. A hard coating film (10), which is hard and has wear resistance, and an end mill (12) can be obtained by alternately forming two or more (CraMobWcVdBe)1-x-yCxNy layers A (22) and two or more (CraMobWcVdBe)1-x-y-zCxNyOz layers B (24) by controlling the composition ratios of Cr, Mo, W, V and B and various reaction gases during the film formation, or alternatively by controlling only the various reaction gases during the film formation. In this connection, the atomic ratios a-e, y and (x + y) of the layers A (22) are within predetermined ranges; the atomic ratios a-e, x, y, z and (x + y + z) of the layers B (24) are within predetermined ranges; the film thickness (D1) of the layers A (22) is within the range from 2 nm to 1,000 nm (inclusive); the film thickness (D2) of the layers B (24) is within the range from 2 nm to 500 nm (inclusive); and the total film thickness (D) is within the range from 0.1 µm to 10.0 µm (inclusive).

    摘要翻译： 提供：坚硬并具有耐磨性的硬质润滑涂膜; 和硬质润滑涂膜覆盖工具。 通过交替形成两个或更多个（CraMobWcVdBe）1-x-yCxNy层A（22）和两个或更多个（（C））（（22））的硬质涂层膜 通过在成膜过程中控制Cr，Mo，W，V和B以及各种反应气体的组成比，或者通过在成膜过程中仅控制各种反应气体，可以制备1-xy-zCxNyOz层B（24）。 就此而言，层A（22）的原子比a-e，y和（x + y）在预定范围内; 层B（24）的原子比a-e，x，y，z和（x + y + z）在预定范围内; A（22）的膜厚（D1）在2nm以上且1000nm以下的范围内。 层B（24）的膜厚（D2）在2nm以上且500nm以下的范围内。 并且总膜厚度（D）在0.1μm至10.0μm（包括端值）的范围内。