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1.发明公开
公开(公告)号：EP2201160A1
公开(公告)日：2010-06-30
申请号：EP09765476.8
申请日：2009-05-08
申请人： RENA GmbH
CPC分类号： H01L31/18 , C23C18/1621 , C23C18/163 , C25D5/006 , C25D5/028 , C25D5/08 , C25D5/18 , C25D7/126 , C25D17/001 , C25D17/005 , C25D17/02 , C25D17/06 , C25F3/12 , C25F7/00
摘要： The invention relates to the wet-chemical or electrolytic treatment of flat material, for example a wafer, which according to the prior art is treated by means of technically complex frames or grippers in treatment chambers. Particularly in the case of fracture-sensitive material such as silicon solar cells, the handling is very time-consuming, especially when the underside of the material must not be wetted. According to the invention, the material (1) is placed without frames, grippers or holders above a vertically arranged treatment chamber (3) so that only the underside is wetted by the treatment liquid. As a result of a rotationally symmetric flow (4) on the underside (7) of the material placed on the surface of a treatment liquid, the adhesion forces acting horizontally on the material (1) cancel one another out. A lateral shift of the material does not occur. The limiters or lateral end stops which are usually used can therefore be dispensed with.
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公开(公告)号：EP2443649A1
公开(公告)日：2012-04-25
申请号：EP10726433.5
申请日：2010-06-14
申请人： RENA GmbH , Siltronic AG
发明人： SCHIENLE, Frank , SCHWAB, Mario , HAMID, Rahim , HERMANN, Lothar , SCHWAB, G nter , BUSCHHARDT, Thomas , FEIJÓO, Diego , KALTENBACH, Konrad , SOLLINGER, Franz
IPC分类号： H01L21/00 , H01L21/677
CPC分类号： H01L21/6776 , H01L21/67057 , H01L21/67086 , H01L21/67784
摘要： The present invention relates to an apparatus and a method for the fluidic inline-treatment of flat substrates with at least one process module. In particular, the invention relates to such a treatment during the gentle and controlled transport of the substrates, wherein the treatment can also just relate to the transport of the substrates. According to the invention, a process module 1 is provided which comprises a treatment chamber 2 having at least one treatment surface 7A being substantially horizontally arranged in a treatment plane 5 and being designed for the formation of a lower fluid cushion 6A, wherein two openings in the form of entry 3 and exit 4 for the linear feed-through of the substrates 22 in the same plane are assigned to the treatment surface 7A, and at least one feed device with at least one catch 10 for the controlled feed 9 of the substrates 22 within the treatment chamber 2. Furthermore, the invention provides a method using the apparatus according to the invention.
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公开(公告)号：EP2289097A1
公开(公告)日：2011-03-02
申请号：EP09765641.7
申请日：2009-06-19
申请人： RENA GmbH
IPC分类号： H01L21/677
CPC分类号： H01L21/67784
摘要： The present invention relates to methods and devices for transporting substantially flat, freely movable objects, wherein at least the holding and guiding of the same is carried out solely through the use of a flowing liquid. The device according to the invention comprises at least one treatment surface having at least one flow region comprising a plurality of openings, at least one draining region for draining the liquid after the flow, however no non-fluidic edges, limiters, or other mechanical guide means for guiding the flat object. A transport device based on the invention may preferably be utilized within and between treatment systems for flat objects or substrates. Simultaneously with the transport a preferably wet-chemical treatment may be carried out, if the transport liquid has respective properties, or comprises respective substances or agents.
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4.发明授权
公开(公告)号：EP2201160B1
公开(公告)日：2012-10-31
申请号：EP09765476.8
申请日：2009-05-08
申请人： RENA GmbH
IPC分类号： C25D5/08 , C25D7/12 , C25D17/02 , C25D17/06 , H01L31/0224 , H01L31/18 , C25D5/02 , C25D17/00
CPC分类号： H01L31/18 , C23C18/1621 , C23C18/163 , C25D5/006 , C25D5/028 , C25D5/08 , C25D5/18 , C25D7/126 , C25D17/001 , C25D17/005 , C25D17/02 , C25D17/06 , C25F3/12 , C25F7/00
摘要： The invention relates to the wet-chemical or electrolytic treatment of flat material, for example a wafer, which according to the prior art is treated by means of technically complex frames or grippers in treatment chambers. Particularly in the case of fracture-sensitive material such as silicon solar cells, the handling is very time-consuming, especially when the underside of the material must not be wetted. According to the invention, the material (1) is placed without frames, grippers or holders above a vertically arranged treatment chamber (3) so that only the underside is wetted by the treatment liquid. As a result of a rotationally symmetric flow (4) on the underside (7) of the material placed on the surface of a treatment liquid, the adhesion forces acting horizontally on the material (1) cancel one another out. A lateral shift of the material does not occur. The limiters or lateral end stops which are usually used can therefore be dispensed with.
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公开(公告)号：EP2289097B1
公开(公告)日：2012-10-10
申请号：EP09765641.7
申请日：2009-06-19
申请人： RENA GmbH
IPC分类号： H01L21/677
CPC分类号： H01L21/67784
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公开(公告)号：EP2155403B1
公开(公告)日：2010-10-06
申请号：EP08758660.8
申请日：2008-05-20
申请人： RENA GmbH
CPC分类号： C23C2/04 , C03C17/002 , C03C17/22 , C03C17/3678 , C03C2217/28 , C03C2218/36 , H01L31/18 , H01L31/1836 , Y02E10/50
摘要： The invention relates to a method and to an apparatus for coating substrates within the context of producing thin-film solar cells or modules made of glass, metal or plastic with metallic compounds, such as, for example, cadmium sulphide or zinc sulphide using a liquid (F) which is located in a treatment basin (3) and the chemical constituents of which can be deposited on the substrate surface by suitable temperature control and with the formation of a permanent film, in which the under side of the substrate, which side is to be coated, is heated, which is necessary in order to form the desired film, by means of a suitable heating means (11) which is capable of heating the substrate (2) to the required temperature without the upper side which is not to be treated being wetted during the treatment with a heating liquid and without the substrate (2) being held or protected from above.
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7.发明公开VERFAHREN UND VORRICHTUNG ZUR OBERFLÄCHENMODIFIKATION VON FLACHEN SUBSTRATEN 有权VERFAHREN UND VORRICHTUNG ZUROBERFLÄCHENMODIFIKATIONVON FLACHEN SUBSTRATEN
公开(公告)号：EP2155403A1
公开(公告)日：2010-02-24
申请号：EP08758660.8
申请日：2008-05-20
申请人： RENA GmbH
CPC分类号： C23C2/04 , C03C17/002 , C03C17/22 , C03C17/3678 , C03C2217/28 , C03C2218/36 , H01L31/18 , H01L31/1836 , Y02E10/50
摘要： The invention relates to a method and to an apparatus for coating substrates within the context of producing thin-film solar cells or modules made of glass, metal or plastic with metallic compounds, such as, for example, cadmium sulphide or zinc sulphide using a liquid (F) which is located in a treatment basin (3) and the chemical constituents of which can be deposited on the substrate surface by suitable temperature control and with the formation of a permanent film, in which the under side of the substrate, which side is to be coated, is heated, which is necessary in order to form the desired film, by means of a suitable heating means (11) which is capable of heating the substrate (2) to the required temperature without the upper side which is not to be treated being wetted during the treatment with a heating liquid and without the substrate (2) being held or protected from above.
摘要翻译： 本发明涉及在使用液体制造由玻璃，金属或塑料制成的薄膜太阳能电池或模块与金属化合物（例如硫化镉或硫化锌）的情况下用于涂覆衬底的方法和设备 （F），其位于处理池（3）中，并且其化学成分可通过合适的温度控制和形成永久性膜而沉积在基材表面上，其中基材的下侧 通过合适的加热装置（11）被涂覆，被加热，这对于形成期望的膜是必需的，该合适的加热装置（11）能够将基板（2）加热到所需的温度， 在用加热液处理过程中被处理为被润湿，并且在没有衬底（2）被保持或保护不在上方的情况下被处理。
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