摘要:
Melamine-containing photoresists are disclosed that display increased sensitivity, measured as lithographic potential, when compared to known photoresists that contain melamine resin as a crosslinker. The melamine resin in these photoresists contains a higher percent, by weight, of monomeric hexamethoxymethylmelamine than in known resists.
摘要:
Melamine-containing photoresists are disclosed that display increased sensitivity, measured as lithographic potential, when compared to known photoresists that contain melamine resin as a crosslinker. The melamine resin in these photoresists contains a higher percent, by weight, of monomeric hexamethoxymethylmelamine than in known resists.