公开(公告)号：EP0047895A2

公开(公告)日：1982-03-24

申请号：EP81106690.1

申请日：1981-08-28

Applicant: SHIPLEY COMPANY INC.

Inventor： Martin, Robert L. ,  Gibson, George A.

IPC: C11D7/34 ,  C11D1/755 ,  C23G5/02 ,  G03F7/10 ,  G03F7/00 ,  G03F7/02 ,  G03F7/26

CPC classification number: G03F7/426 ,  C09D9/005 ,  C09D9/04

Abstract: A novel stripping composition and method of using same is disclosed, which stripping composition comprises:

a) a solvent comprising one or more compounds of formula (I)
wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and
b) a suitable organosulfonic acid.

The stripping composition is especially useful for stripping positive photoresists faster and at lower temperatures than known strippers. A preferred composition comprises 10% by weight para-toluene sulfonic acid in dimethyl sulfoxide.

公开(公告)号：EP0047895B1

公开(公告)日：1985-12-04

申请号：EP81106690.1

申请日：1981-08-28

Applicant: SHIPLEY COMPANY INC.

Inventor： Martin, Robert L. ,  Gibson, George A.

IPC: C11D7/34 ,  C11D1/755 ,  C23G5/02 ,  G03F7/10 ,  G03F7/00 ,  G03F7/02 ,  G03F7/26

CPC classification number: G03F7/426 ,  C09D9/005 ,  C09D9/04

公开(公告)号：EP0047895A3

公开(公告)日：1982-07-14

申请号：EP81106690

申请日：1981-08-28

Applicant: SHIPLEY COMPANY INC.

Inventor： Martin, Robert L. ,  Gibson, George A.

IPC: C11D07/34 ,  C11D01/755 ,  C23G05/02 ,  G03F07/10 ,  G03F07/00 ,  G03F07/02 ,  G03F07/26 ,  H01L21/312 ,  H01L21/47

CPC classification number: G03F7/426 ,  C09D9/005 ,  C09D9/04

Abstract: A novel stripping composition and method of using same is disclosed, which stripping composition comprises:
a) a solvent comprising one or more compounds of formula (I)
wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and b) a suitable organosulfonic acid. The stripping composition is especially useful for stripping positive photoresists faster and at lower temperatures than known strippers. A preferred composition comprises 10% by weight para-toluene sulfonic acid in dimethyl sulfoxide.