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Patent Agency Ranking
公开(公告)号：EP0047895A3
公开(公告)日：1982-07-14
申请号：EP81106690
申请日：1981-08-28
Applicant: SHIPLEY COMPANY INC.
Inventor： Martin, Robert L. , Gibson, George A.
IPC: C11D07/34 , C11D01/755 , C23G05/02 , G03F07/10 , G03F07/00 , G03F07/02 , G03F07/26 , H01L21/312 , H01L21/47
Abstract: A novel stripping composition and method of using same is disclosed, which stripping composition comprises:
a) a solvent comprising one or more compounds of formula (I)
wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and b) a suitable organosulfonic acid. The stripping composition is especially useful for stripping positive photoresists faster and at lower temperatures than known strippers. A preferred composition comprises 10% by weight para-toluene sulfonic acid in dimethyl sulfoxide.-
公开(公告)号：EP0047895A2
公开(公告)日：1982-03-24
申请号：EP81106690.1
申请日：1981-08-28
Applicant: SHIPLEY COMPANY INC.
Inventor： Martin, Robert L. , Gibson, George A.
Abstract: A novel stripping composition and method of using same is disclosed, which stripping composition comprises:
a) a solvent comprising one or more compounds of formula (I)
wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and
b) a suitable organosulfonic acid.
The stripping composition is especially useful for stripping positive photoresists faster and at lower temperatures than known strippers. A preferred composition comprises 10% by weight para-toluene sulfonic acid in dimethyl sulfoxide.-
公开(公告)号：EP0287750A3
公开(公告)日：1989-07-19
申请号：EP88100176.2
申请日：1988-01-08
Applicant: SHIPLEY COMPANY INC.
Inventor： Martin, Robert L. , Rajaratnam, M. Martha , Turci, Pamela
IPC: G03F7/02
Abstract: The subject invention involves reduction of light refraction into a photoresist coating over a reflective substrate by the use of a photoactive compound in a photoresist formulation that is the reaction product of a diazooxide and curcumin.
Abstract translation: 本发明涉及通过在作为重氮氧化物和姜黄素的反应产物的光致抗蚀剂制剂中使用光活性化合物将光折射减少到反射底物上的光致抗蚀剂涂层中。
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公开(公告)号：EP0287750A2
公开(公告)日：1988-10-26
申请号：EP88100176.2
申请日：1988-01-08
Applicant: SHIPLEY COMPANY INC.
Inventor： Martin, Robert L. , Rajaratnam, M. Martha , Turci, Pamela
IPC: G03F7/02
Abstract: The subject invention involves reduction of light refraction into a photoresist coating over a reflective substrate by the use of a photoactive compound in a photoresist formulation that is the reaction product of a diazooxide and curcumin.
Abstract translation: 本发明涉及通过在作为重氮氧化物和姜黄素的反应产物的光致抗蚀剂制剂中使用光活性化合物，将光折射减少为反射基底上的光致抗蚀剂涂层。
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公开(公告)号：EP0047895B1
公开(公告)日：1985-12-04
申请号：EP81106690.1
申请日：1981-08-28
Applicant: SHIPLEY COMPANY INC.
Inventor： Martin, Robert L. , Gibson, George A.
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