公开(公告)号：EP0555749B1

公开(公告)日：1999-05-19

申请号：EP93101634.9

申请日：1993-02-03

Applicant: SHIPLEY COMPANY INC.

Inventor： Pai, Daniel Y. ,  Rodriguez Stephen S. ,  Cheetham, Kevin, J. ,  Calabrese, Gary, S. ,  Sinta Roger F.

IPC: G03F7/004 ,  G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0045

公开(公告)号：EP0555749A1

公开(公告)日：1993-08-18

申请号：EP93101634.9

申请日：1993-02-03

Applicant: SHIPLEY COMPANY INC.

Inventor： Pai, Daniel Y. ,  Rodriguez Stephen S. ,  Cheetham, Kevin, J. ,  Calabrese, Gary, S. ,  Sinta Roger F.

IPC: G03F7/004 ,  G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0045

Abstract: A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.

Abstract translation: 辐射敏感组合物，使用所述组合物的方法，以及用所述组合物涂覆的基材。 可光成像组合物包含光碱产生剂化合物，树脂粘合剂和能够在碱存在下交联的材料。 在优选的方面，本发明提供负性作用的水性可显影光成像组合物，其包含光碱产生剂化合物，优选酚醛聚合物的树脂粘合剂，包含一个或多个将进行碱引发交联的活性基团的交联剂， 和固化剂。