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公开(公告)号：EP0568827A3
公开(公告)日：1995-08-09
申请号：EP93105753.3
申请日：1993-04-07
Applicant: SHIPLEY COMPANY INC.
Inventor： Pai, Daniel Y. , Rodriguez, Stephen S. , Sinta, Roger F.
CPC classification number: G03F7/039 , G03F7/164 , Y10S430/106 , Y10S430/111 , Y10S524/901
Abstract: The present invention provides photoimageable compositions, processes and articles of manufacture. In particular, the invention provides a process comprising electrophoretically applying a coating layer of a photoimageable composition onto a conductive surface, the composition comprising a material that contains one or more photoacid labile groups. The photoimageable compositions of the invention preferably comprise a photoacid generator, a material that contains one or more acid-cleavable functional groups, and a carrier resin that contains one or more functional groups that are, or can be treated to be, at least partially ionized.
Abstract translation: 本发明提供可光成像组合物，工艺和制造物品。 特别地，本发明提供了一种方法，该方法包括将电子成像组合物的涂层电泳施加到导电表面上，该组合物包含含有一个或多个光酸不稳定基团的材料。 本发明的可光成像组合物优选包含光酸产生剂，含有一个或多个酸可分解官能团的材料和含有一种或多种官能团的载体树脂，所述官能团是或可被处理为至少部分电离 。
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公开(公告)号：EP0555749A1
公开(公告)日：1993-08-18
申请号：EP93101634.9
申请日：1993-02-03
Applicant: SHIPLEY COMPANY INC.
Inventor： Pai, Daniel Y. , Rodriguez Stephen S. , Cheetham, Kevin, J. , Calabrese, Gary, S. , Sinta Roger F.
CPC classification number: G03F7/038 , G03F7/0045
Abstract: A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.
Abstract translation: 辐射敏感组合物，使用所述组合物的方法，以及用所述组合物涂覆的基材。 可光成像组合物包含光碱产生剂化合物，树脂粘合剂和能够在碱存在下交联的材料。 在优选的方面，本发明提供负性作用的水性可显影光成像组合物，其包含光碱产生剂化合物，优选酚醛聚合物的树脂粘合剂，包含一个或多个将进行碱引发交联的活性基团的交联剂， 和固化剂。
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公开(公告)号：EP0565858B1
公开(公告)日：1999-09-01
申请号：EP93103750.1
申请日：1993-03-09
Applicant: SHIPLEY COMPANY INC.
Inventor： Knudsen, Philip D. , Shipley, Charles R. , Pai, Daniel Y.
IPC: G03F7/033
CPC classification number: G03F7/038 , G03F7/0045 , H05K3/287 , Y02P20/582 , Y10T428/24917
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公开(公告)号：EP0565858A1
公开(公告)日：1993-10-20
申请号：EP93103750.1
申请日：1993-03-09
Applicant: SHIPLEY COMPANY INC.
Inventor： Knudsen, Philip D. , Shipley, Charles R. , Pai, Daniel Y.
IPC: G03F7/033
CPC classification number: G03F7/038 , G03F7/0045 , H05K3/287 , Y02P20/582 , Y10T428/24917
Abstract: Radiation sensitive compositions, processes for using the compositions, and articles of manufacture comprising the compositions. The photoimageable compositions of the invention comprises a radiation sensitive component, a resin binder and a polybutadiene that comprises one or more internal epoxide groups. In preferred aspects, the compositions off the invention further comprise a crosslinking agent such as a melamine or an epoxidized material, or mixtures thereof.
Abstract translation: 辐射敏感组合物，使用组合物的方法和包含该组合物的制品。 本发明的可光成像组合物包含辐射敏感组分，树脂粘合剂和包含一个或多个内部环氧基团的聚丁二烯。 在优选的方面，本发明的组合物还包含交联剂，例如三聚氰胺或环氧化物质，或其混合物。
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Patent Agency Ranking
公开(公告)号：EP0568827B1
公开(公告)日：2000-08-02
申请号：EP93105753.3
申请日：1993-04-07
Applicant: SHIPLEY COMPANY INC.
Inventor： Pai, Daniel Y. , Rodriguez, Stephen S. , Sinta, Roger F.
CPC classification number: G03F7/039 , G03F7/164 , Y10S430/106 , Y10S430/111 , Y10S524/901
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公开(公告)号：EP0555749B1
公开(公告)日：1999-05-19
申请号：EP93101634.9
申请日：1993-02-03
Applicant: SHIPLEY COMPANY INC.
Inventor： Pai, Daniel Y. , Rodriguez Stephen S. , Cheetham, Kevin, J. , Calabrese, Gary, S. , Sinta Roger F.
CPC classification number: G03F7/038 , G03F7/0045
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公开(公告)号：EP0539714B1
公开(公告)日：1998-12-23
申请号：EP92116000.8
申请日：1992-09-18
Applicant: SHIPLEY COMPANY INC.
Inventor： Hawkins, Robert E. , Pai, Daniel Y.
CPC classification number: G03F7/164 , C09D5/44 , G03F7/032 , G03F7/038 , Y10S430/136
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公开(公告)号：EP0568827A2
公开(公告)日：1993-11-10
申请号：EP93105753.3
申请日：1993-04-07
Applicant: SHIPLEY COMPANY INC.
Inventor： Pai, Daniel Y. , Rodriguez, Stephen S. , Sinta, Roger F.
CPC classification number: G03F7/039 , G03F7/164 , Y10S430/106 , Y10S430/111 , Y10S524/901
Abstract: The present invention provides photoimageable compositions, processes and articles of manufacture. In particular, the invention provides a process comprising electrophoretically applying a coating layer of a photoimageable composition onto a conductive surface, the composition comprising a material that contains one or more photoacid labile groups. The photoimageable compositions of the invention preferably comprise a photoacid generator, a material that contains one or more acid-cleavable functional groups, and a carrier resin that contains one or more functional groups that are, or can be treated to be, at least partially ionized.
Abstract translation: 本发明提供可光成像的组合物，方法和制品。 特别地，本发明提供了一种方法，其包括将可光成像组合物的涂层电泳施加到导电表面上，该组合物包含含有一个或多个光致酸不稳定基团的材料。 本发明的可光成像组合物优选包含光致酸产生剂，含有一种或多种酸可切割官能团的材料，以及载体树脂，其含有一种或多种官能团，或可被处理为至少部分电离 。
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公开(公告)号：EP0539714A1
公开(公告)日：1993-05-05
申请号：EP92116000.8
申请日：1992-09-18
Applicant: SHIPLEY COMPANY INC.
Inventor： Hawkins, Robert E. , Pai, Daniel Y.
CPC classification number: G03F7/164 , C09D5/44 , G03F7/032 , G03F7/038 , Y10S430/136
Abstract: The invention provides radiation sensitive compositions that comprise an amphoteric polymer, the polymer comprising at least two distinct carrier groups so that the polymer is positively polarized or negatively polarized upon treatment with an acid or base, respectively, enabling the compositions to be electrodeposited either anaphoretically or cataphoretically. Employing this amphoteric polymer in a radiation sensitive composition also allows the use of either an acid or base solution to image and remove the deposited composition irrespective of whether the composition was applied cataphoretically or anaphoretically. The compositions of the invention are also suitably formulated as liquid coating compositions or used to form dry film resists.
Abstract translation: 本发明提供了包含两性聚合物的辐射敏感组合物，所述聚合物包含至少两个不同的载体基团，使得分别在用酸或碱处理时聚合物被正极化或负极化，使组合物可以通过阴离子或电沉积 cataphoretically。 在辐射敏感组合物中使用这种两性聚合物还允许使用酸或碱溶液来成像和除去沉积的组合物，而不管组合物是用阴离子或阴离子涂覆的。 本发明的组合物也适当地配制成液体涂料组合物或用于形成干膜抗蚀剂。
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