SUBSTRATE FILM AND SINTERING METHOD
    1.
    发明公开
    SUBSTRATE FILM AND SINTERING METHOD 审中-公开
    SUBSTRATFOLIE UND SINTERVERFAHREN

    公开(公告)号:EP2855148A4

    公开(公告)日:2016-01-20

    申请号:EP13799914

    申请日:2013-05-31

    申请人: SHOWA DENKO KK

    摘要: A coating layer 12 is formed on a base film 10 by heat resistant resin having a Tg (glass transition temperature) of 120° C. or more, and more preferably 200° C. or more, and a functional thin film 14 is produced by printing ink composite including conductive particles on a surface of the coating layer 12 and thereby forming an ink layer. This functional thin film 14 is sintered by heating performed by photo irradiation, and a conductive layer is formed thereby.

    摘要翻译: 通过Tg(玻璃化转变温度)为120℃以上,更优选为200℃以上的耐热树脂,在基膜10上形成涂层12,通过以下方式制造功能性薄膜14: 在涂层12的表面上包含导电性粒子的印刷油墨复合物,从而形成油墨层。 通过光照射进行加热烧结该功能性薄膜14,由此形成导电层。