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    System and method for electron beam irradiation
    1.
    发明公开
    System and method for electron beam irradiation 审中-公开
    电子束照射的系统和方法

    公开(公告)号：EP1339085A2

    公开(公告)日：2003-08-27

    申请号：EP03251031.5

    申请日：2003-02-20

    申请人： Jeol Ltd. ,  Sony Corporation

    发明人： Norioka, Setsuo ,  Miyokawa, Toshiaki ,  Date, Naoki ,  Sasaki, Jun, c/o Sony Corporation ,  Aki, Yuichi, c/o Sony Corporation ,  Miura, Yoshihisa, c/o Sony Corporation

    IPC分类号： H01J37/304 ,  H01J37/20

    CPC分类号： H01J37/305 ,  H01J37/18 ,  H01J37/21 ,  H01J37/3056 ,  H01J2237/162 ,  H01J2237/188 ,  H01J2237/216 ,  H01J2237/24405

    摘要： An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner to the master disk, thus permitting accurate recordings. The system has a support mechanism portion holding the master disk on it. The support mechanism portion has a slide table on which a focusing stage is placed. The focusing stage has a knife edge and a Faraday cup. The knife edge is located immediately beside the master disk. When recordings are made, an electron beam is first shot at the focusing stage and brought to focus. Then, the beam is shot at the master disk, thus making recordings.

    摘要翻译： 一种电子束照射系统，用于在母盘上拍摄电子束以进行记录。 该系统能够以对应的方式容易且精确地将光束聚焦到主盘，从而允许准确的记录。 该系统有一个支撑机构部分，将主盘放在上面。 支撑机构部分具有滑台，聚焦台放置在该滑台上。 聚焦阶段有一个刀刃和一个法拉第杯。 刀口紧靠主盘。 当进行记录时，首先在聚焦阶段拍摄电子束并聚焦。 然后，光束在主盘上被拍摄，从而进行录制。

    Electron beam irradiation apparatus and method
    2.
    发明公开
    Electron beam irradiation apparatus and method 审中-公开
    Vorrichtung und Verfahren zur Bestrahlung mittels Elektronen

    公开(公告)号：EP1339084A2

    公开(公告)日：2003-08-27

    申请号：EP03250922.6

    申请日：2003-02-14

    申请人： SONY CORPORATION ,  Jeol Ltd.

    发明人： Miura, Yoshihisa, c/o Sony Corporation ,  Aki, Yuichi, c/o Sony Corporation ,  Kawase, Hiroshi, c/o Sony Corporation ,  Yamamoto, Masanobu, c/o Sony Corporation ,  Date, Naoki ,  Norioka, Setsuo ,  Koikumi, Mitsuru ,  Komatsubara, Gakuo

    IPC分类号： H01J37/301 ,  H01J37/20

    CPC分类号： H01J37/18 ,  G11B7/261 ,  H01J37/305 ,  H01J37/3056 ,  H01J2237/162 ,  H01J2237/188

    摘要： An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18. When the static pressure floating pad 18 is separated from the subject 1, the vacuum seal valve 30 is structured to be activated to close the electron beam path 19 so as to prevent the air from flowing into the vacuum chamber 14. In this structure, the vacuum seal valve 30 is formed with a round shaped cross section and in a tapered shape with a narrow tip so as to accomplish high vacuum seal without a gap, so that the degree of vacuum in the vacuum chamber and the electron beam column can surely be maintained.

    摘要翻译： 部分真空法中的电子束照射装置由连接到包含电子束柱15的真空室14的静压浮动垫18构成，并且在将静压浮动垫18附着到被检体1的状态下 照射没有接触的电子束，以及照射被摄体1以通过静压浮动垫18的电子束路径19照射的电子束，由此即使在真空室和电子束柱中也可以将真空室和电子束柱保持在所需的真空度 条件是静压浮动垫18与待照射的被检体1分离。 在静压浮动垫18内设置包括打开和关闭电子束通道19的活塞的真空密封阀30.当静压浮动垫18与被检体1分离时，真空密封阀30构成为 激活以闭合电子束路径19，以防止空气流入真空室14.在该结构中，真空密封阀30形成为圆形截面并具有窄尖端的锥形形状，以便 以实现高真空密封而没有间隙，从而可以可靠地保持真空室和电子束柱中的真空度。

    Electron beam irradiation apparatus and method
    3.
    发明公开
    Electron beam irradiation apparatus and method 审中-公开
    装置和方法通过照射电子的手段

    公开(公告)号：EP1339084A3

    公开(公告)日：2010-05-05

    申请号：EP03250922.6

    申请日：2003-02-14

    申请人： Sony Corporation ,  JEOL Ltd.

    发明人： Miura, Yoshihisa, c/o Sony Corporation ,  Aki, Yuichi, c/o Sony Corporation ,  Kawase, Hiroshi, c/o Sony Corporation ,  Yamamoto, Masanobu, c/o Sony Corporation ,  Date, Naoki ,  Norioka, Setsuo ,  Koikumi, Mitsuru ,  Komatsubara, Gakuo

    IPC分类号： H01J37/301 ,  H01J37/20

    CPC分类号： H01J37/18 ,  G11B7/261 ,  H01J37/305 ,  H01J37/3056 ,  H01J2237/162 ,  H01J2237/188

    摘要： An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18. When the static pressure floating pad 18 is separated from the subject 1, the vacuum seal valve 30 is structured to be activated to close the electron beam path 19 so as to prevent the air from flowing into the vacuum chamber 14. In this structure, the vacuum seal valve 30 is formed with a round shaped cross section and in a tapered shape with a narrow tip so as to accomplish high vacuum seal without a gap, so that the degree of vacuum in the vacuum chamber and the electron beam column can surely be maintained.

    Detection apparatus, detection method and electron beam irradiation apparatus
    7.
    发明公开
    Detection apparatus, detection method and electron beam irradiation apparatus 有权
    Detektionsgerät，Detektionsverfahren undGerätzur Bestrahlung mittels Elektronen

    公开(公告)号：EP1359602A2

    公开(公告)日：2003-11-05

    申请号：EP03290943.4

    申请日：2003-04-16

    申请人： SONY CORPORATION

    发明人： Miura, Yoshihisa, c/o Sony Corporation ,  Aki, Yuichi, c/o Sony Corporation

    IPC分类号： H01J37/301 ,  H01J37/305 ,  G11B7/26

    CPC分类号： G11B7/261 ,  H01J37/18 ,  H01J37/301 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/188 ,  H01J2237/24465

    摘要： A detection apparatus, a detection method and an electron beam irradiation apparatus for detecting deflection electrons in order to precisely focus even if a vacuum seal valve is provided.
    An electron beam irradiation apparatus including a vacuum seal valve mechanism which is provided in a static pressure floating pad, and opens/closes an electron beam passage with a piston so as to switch between an electron beam irradiation state and a vacuum seal state, and a deflection electron detector which is provided between the vacuum seal valve mechanism and a master disk and detects a deflection electron signal generated from the master disk with electron beam irradiation.

    摘要翻译： 检测装置，检测方法和电子束照射装置，用于检测偏转电子，以便即使设置真空密封阀也能精确地聚焦。 一种电子束照射装置，包括设置在静压浮动垫中的真空密封阀机构，并且利用活塞打开/关闭电子束通道，以便在电子束照射状态和真空密封状态之间切换， 设置在真空密封阀机构和母盘之间的偏转电子检测器，并用电子束照射检测从母盘产生的偏转电子信号。