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公开(公告)号：EP0628599A4
公开(公告)日：1995-07-12
申请号：EP94903051
申请日：1993-12-24
申请人： SUMITOMO CHEMICAL CO
CPC分类号： G03F7/0236 , C08G8/08 , C08L61/06
摘要： A photosensitive resin composition for color filters, which comprises a novolak resin containing repeating units represented by general formula (I) and having a molecular weight of about 1,000 to 50,000, a solvent, and a dye or pigment, and which is excellent in various performances including resolution, heat resistance and transparency. In formula (I) R1 through R5 represent each hydrogen, alkyl, etc.; and R6 and R7 represent each hydrogen, alkyl, etc., provided that the alpha group is located at the o- or p-position with respect to the OH group.
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公开(公告)号：EP0634457A4
公开(公告)日：1995-04-19
申请号：EP94905239
申请日：1994-02-01
申请人： SUMITOMO CHEMICAL CO
IPC分类号： C09B29/01 , C09B29/15 , C09B29/30 , C09B29/50 , C09B35/18 , C09B35/205 , C09B43/32 , G02B5/20 , G02B5/22 , C09B29/10 , C09B29/28 , C09B35/03 , C09B69/00
CPC分类号： C09B43/325 , C09B29/0014 , C09B29/103 , C09B29/30 , C09B29/366 , C09B35/18 , C09B35/205 , G02B5/201 , G02B5/223
摘要： An azo color for color filters which has at least one monosubstituted sulfonamide group in its molecule and is soluble in an aqueous alkali solution and organic solvents, and a process for producing a color filter having a number of colored filter elements which comprises the step (a) of forming an adherent layer by coating a substrate with a solution of a photoresist composition containing the azo colors in an organic solvent and drying the coating, the step (b) of exposing a predetermined part of the adherent layer to a radiation, the step (c) of forming a colored pattern by the alkaline development of an exposed or nonexposed area, and the step (d) of repeating the steps (a) through (c) with each of the different colors contained in the above composition.
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