公开(公告)号：EP0634457A4

公开(公告)日：1995-04-19

申请号：EP94905239

申请日：1994-02-01

申请人： SUMITOMO CHEMICAL CO

发明人： HISHIRO YOSHIKI ,  TAKEYAMA NAOKI ,  YAMAMOTO SHIGEKI

IPC分类号： C09B29/01 ,  C09B29/15 ,  C09B29/30 ,  C09B29/50 ,  C09B35/18 ,  C09B35/205 ,  C09B43/32 ,  G02B5/20 ,  G02B5/22 ,  C09B29/10 ,  C09B29/28 ,  C09B35/03 ,  C09B69/00

CPC分类号： C09B43/325 ,  C09B29/0014 ,  C09B29/103 ,  C09B29/30 ,  C09B29/366 ,  C09B35/18 ,  C09B35/205 ,  G02B5/201 ,  G02B5/223

摘要： An azo color for color filters which has at least one monosubstituted sulfonamide group in its molecule and is soluble in an aqueous alkali solution and organic solvents, and a process for producing a color filter having a number of colored filter elements which comprises the step (a) of forming an adherent layer by coating a substrate with a solution of a photoresist composition containing the azo colors in an organic solvent and drying the coating, the step (b) of exposing a predetermined part of the adherent layer to a radiation, the step (c) of forming a colored pattern by the alkaline development of an exposed or nonexposed area, and the step (d) of repeating the steps (a) through (c) with each of the different colors contained in the above composition.

公开(公告)号：EP0779552A3

公开(公告)日：1998-06-03

申请号：EP96120062

申请日：1996-12-13

申请人： SUMITOMO CHEMICAL CO

发明人： YAKO YUKO ,  TAKEYAMA NAOKI ,  TAKAHASHI KENJI

IPC分类号： G03F7/004 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/121 ,  Y10S430/125

摘要： A positive photoresist composition having excellent various performances (e.g. resolution, resistance to time delay effect, profile), small PEB dependence as well as excellent sensitivity, film retention and coatability, which comprises a polyvinylphenol resin whose phenolic hydroxyl group is partially protected; a sulfonate of a N-hydroxyimide compound as an acid generator; an amine compound; and an electron donor having a redox potential of not more than 1.7 eV is provided.

摘要翻译： 一种具有优异的各种性能（例如分辨率，抗延时效应，轮廓），小的PEB依赖性以及优异的敏感性，膜保持性和可涂布性的正型光刻胶组合物，其包含酚羟基部分保护的聚乙烯苯酚树脂; 作为产酸剂的N-羟基酰亚胺化合物的磺酸盐; 胺化合物; 并提供氧化还原电位不超过1.7eV的电子给体。

公开(公告)号：EP0628599A4

公开(公告)日：1995-07-12

申请号：EP94903051

申请日：1993-12-24

申请人： SUMITOMO CHEMICAL CO

发明人： HISHIRO YOSHIKI ,  TAKEYAMA NAOKI ,  YAMAMOTO SHIGEKI

IPC分类号： C08G8/08 ,  C08L61/06 ,  G03F7/023 ,  G02B5/20

CPC分类号： G03F7/0236 ,  C08G8/08 ,  C08L61/06

摘要： A photosensitive resin composition for color filters, which comprises a novolak resin containing repeating units represented by general formula (I) and having a molecular weight of about 1,000 to 50,000, a solvent, and a dye or pigment, and which is excellent in various performances including resolution, heat resistance and transparency. In formula (I) R1 through R5 represent each hydrogen, alkyl, etc.; and R6 and R7 represent each hydrogen, alkyl, etc., provided that the alpha group is located at the o- or p-position with respect to the OH group.