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1.发明授权Laser ablation process for preparing a superconducting thin film formed of compound oxide superconductor material and apparatus for executing such process 失效Laserablationprozess用于生产超导化合物oxidically材料和装置用于执行该方法的超导薄膜
公开(公告)号：EP0518778B1
公开(公告)日：1997-04-09
申请号：EP92401636.3
申请日：1992-06-12
发明人： Nagaishi,Tatsuoki, c/o Itami Works of Sumitomo , Ota, Nobuhiro, c/o Itami Works of Sumitomo , Fujimori, Naoji, c/o Itami Works of Sumitomo
IPC分类号： H01L39/24
CPC分类号： H01L39/2448 , C23C14/28 , Y10S505/73 , Y10S505/732
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公开(公告)号：EP0392467A3
公开(公告)日：1991-10-09
申请号：EP90106868.4
申请日：1990-04-10
CPC分类号： H01C7/041 , H01C17/14 , Y10T29/49085
摘要： A thermistor comprising a temperature detecting part which comprises a temperature sensing part made of a vapor phase deposited semiconductive diamond film (12), a metal electrode layer (13) formed on one surface of the semiconductive diamond film (12), and at least one lead wire (14) connected with the metal electrode layer (13) provided that at least 50 % of a total volume of the temperature sensing part and the metal electrode layer consists of the vapor phase deposited diamond, has good thermal response and good heat resistance.
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3.发明授权Oxide thin film having quartz crystal structure and process for producing the same 失效Dünneroxydefilm石英晶体结构和工艺及其制备
公开(公告)号：EP0693580B1
公开(公告)日：1999-03-24
申请号：EP95111249.9
申请日：1995-07-18
发明人： Tanaka, Motoyuki, c/o Itami Works of Sumitomo , Imai, Takahiro, c/o Itami Works of Sumitomo , Fujimori, Naoji, c/o Itami Works of Sumitomo
CPC分类号： C30B23/02 , C23C14/10 , C23C16/401 , C23C18/1216 , C23C18/1254 , C23C18/1279 , C30B5/00 , C30B25/02 , C30B29/18
摘要： An oxide thin film having a quartz crystal structure formed on a substrate, the oxide thin film being composed of a single layer or a plurality of layers having a thickness of 5 nm to 50 mu m per layer, each of the layer comprising silicon dioxide, germanium dioxide, or a mixture thereof.
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公开(公告)号：EP0435189B1
公开(公告)日：1996-11-06
申请号：EP90125084.5
申请日：1990-12-21
IPC分类号： H03H9/02
CPC分类号： H03H9/02582
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5.发明公开Method of working aluminum nitride ceramics 失效Verfahren zum Bearbeiten von aluminiumnitrid Keramiken。
公开(公告)号：EP0669297A1
公开(公告)日：1995-08-30
申请号：EP95102441.3
申请日：1995-02-21
发明人： Harano, Katsuko, c/o Itami Works of Sumitomo , Ota, Nobuhiro, c/o Itami Works of Sumitomo , Fujimori, Naoji, c/o Itami Works of Sumitomo
CPC分类号： C04B41/0036 , B28D1/221
摘要： A method of working aluminum nitride ceramics is adapted to enable accurate cutting and smoothing of a surface of an aluminum nitride ceramics workpiece and to improve the working speed without exerting a bad influence on the material of the aluminum nitride ceramics workpiece itself. A surface of an aluminum nitride ceramics workpiece (5) is irradiated with light (2) having a wavelength which is in the range of 190 nm and not more than 360 nm, and worked. Proper working can be performed by defining the energy density of the light as applied, the divergence angle of a beam and the half-width of the spectrum in prescribed ranges. A laser beam (2) is converged by cylindrical lenses (3, 4) or cylindrical mirrors. It is possible to widen the range of application of aluminum nitride ceramics to the field of structural members, which have generally been hard to work with requirement for high costs.
摘要翻译： 一种加工氮化铝陶瓷的方法适用于对氮化铝陶瓷工件的表面进行精确的切割和平滑化，并提高工作速度，而不会对氮化铝陶瓷工件本身的材料产生不良影响。 用波长在190nm以上且360nm以下的光（2）照射氮化铝陶瓷工件（5）的表面，进行加工。 可以通过定义施加的光的能量密度，光束的发散角和规定范围内的光谱的半宽度来进行适当的工作。 激光束（2）由柱面透镜（3,4）或圆柱形镜子会聚。 可以将氮化铝陶瓷的应用范围扩大到结构构件领域，这通常难以用于高成本的要求。
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6.发明授权
公开(公告)号：EP0424953B1
公开(公告)日：1995-06-14
申请号：EP90120566.6
申请日：1990-10-26
CPC分类号： B23P15/28 , B23P5/00 , B24D5/02 , B24D18/0018
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公开(公告)号：EP0567129A3
公开(公告)日：1994-01-19
申请号：EP93106566.8
申请日：1993-04-22
发明人： Ota, Nobuhiro, c/o Itami Works of Sumitomo , Harano, Katsuko, c/o Itami Works of Sumitomo , Fujimori, Naoji, c/o Itami Works of Sumitomo
CPC分类号： B23K26/0075 , B28D1/221 , C04B41/0045 , C04B41/009 , C04B41/80 , C04B35/52
摘要： Diamond (3) is subjected to working such as smoothing or cutting by irradiation of light having a wavelength in the range of 190 nm to 360 nm to the surface of the diamond (3). The energy density of the incident light, the divergent angle of the light beam and the half-width of spectrum of the light are specified. The light beam is converged by a cylindrical lens (2). Moreover, the working is conducted in a specified material, whereby the flatness of the worked face and the working speed are improved.
摘要翻译： 通过向金刚石（3）的表面照射具有190nm至360nm范围内的波长的光，金刚石（3）经受平滑或切割等加工。 指定入射光的能量密度，光束的发散角和光谱的半宽度。 光束由圆柱透镜（2）会聚。 而且，加工是在特定的材料中进行的，由此改善了加工面的平坦度和加工速度。
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公开(公告)号：EP0567129A2
公开(公告)日：1993-10-27
申请号：EP93106566.8
申请日：1993-04-22
发明人： Ota, Nobuhiro, c/o Itami Works of Sumitomo , Harano, Katsuko, c/o Itami Works of Sumitomo , Fujimori, Naoji, c/o Itami Works of Sumitomo
CPC分类号： B23K26/0075 , B28D1/221 , C04B41/0045 , C04B41/009 , C04B41/80 , C04B35/52
摘要： Diamond (3) is subjected to working such as smoothing or cutting by irradiation of light having a wavelength in the range of 190 nm to 360 nm to the surface of the diamond (3). The energy density of the incident light, the divergent angle of the light beam and the half-width of spectrum of the light are specified. The light beam is converged by a cylindrical lens (2). Moreover, the working is conducted in a specified material, whereby the flatness of the worked face and the working speed are improved.
摘要翻译： 通过将波长在190nm至360nm范围内的光照射到金刚石的表面，对金刚石进行平滑化或切割等工作。 规定入射光的能量密度，光束的发散角和光的光谱的半宽度。 光束被柱面透镜会聚。 此外，以特定的材料进行加工，从而提高加工面的平坦度和加工速度。
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公开(公告)号：EP0480470A3
公开(公告)日：1992-05-13
申请号：EP91117412.6
申请日：1991-10-11
发明人： Ikegaya, Akihiko, c/o Itami Works of Sumitomo , Fujimori, Naoji, c/o Itami Works of Sumitomo , Yashiki, Tetsuo, c/o Itami Works of Sumitomo , Abe, Tetsuya, c/o Japan Atomic Energy , Murakami, Yoshio, c/o Japan Atomic Energy
CPC分类号： G21B1/13 , Y02E30/128 , Y10T428/12535 , Y10T428/12611 , Y10T428/12924 , Y10T428/26
摘要： An insulating member has an insulating layer in the form of a thin ceramic plate made of at least one of SiC, Si₃N₄, AℓN and Aℓ₂O₃ ad having a thickness not less than 0.1 mm and not more than 2.0 mm, and cushioning layers provided on both sides of the insulating layer through brazing alloy for relieving thermal stress. An electric part can be made of such an insulating member. The insulating member is disposed between a conductive substrate and a conductive member and brazed thereto.
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公开(公告)号：EP0392467B1
公开(公告)日：1998-07-01
申请号：EP90106868.4
申请日：1990-04-10
CPC分类号： H01C7/041 , H01C17/14 , Y10T29/49085
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