SEMICONDUCTOR ELEMENT, METHOD FOR PRODUCING SAME AND ALIPHATIC POLYCARBONATE
    2.
    发明公开
    SEMICONDUCTOR ELEMENT, METHOD FOR PRODUCING SAME AND ALIPHATIC POLYCARBONATE 有权
    HALBLEITERBAUELEMENT,VERFAHREN ZUR HERSTELLUNG DAVON UND ALIPHATIS​​CHES POLYCARBONAT

    公开(公告)号:EP3086360A4

    公开(公告)日:2017-08-30

    申请号:EP14871269

    申请日:2014-12-16

    摘要: It is an object of the invention to provide a thin film transistor and a method for producing the same, which will easily achieve self-aligned formation of a source/drain region without through processes under a vacuum or a low pressure or with no use of expensive equipment. An exemplary method for producing a thin film transistor according to the invention includes an aliphatic polycarbonate layer forming step of forming an aliphatic polycarbonate layer 50 that covers a gate electrode layer 40 disposed above a semiconductor layer 20 with a gate insulator 30 being interposed between the gate electrode layer 40 and the semiconductor layer 20, and also covers the semiconductor layer 20, and has a dopant causing the semiconductor layer 20 to become an n-type or p-type semiconductor layer, and a heating step of heating at a temperature causing introduction of the dopant into the semiconductor layer 20 and decomposition of the aliphatic polycarbonate layer 50.

    摘要翻译: 本发明的一个目的是提供一种薄膜晶体管及其制造方法,该方法在真空或低压下不经过处理或不使用时可以容易地实现源/漏区的自对准形成 昂贵的设备。 根据本发明的用于制造薄膜晶体管的示例性方法包括:形成脂肪族聚碳酸酯层50的脂肪族聚碳酸酯层形成步骤,所述脂肪族聚碳酸酯层50覆盖设置在半导体层20上方的栅极电极层40,栅极绝缘体30介于栅极 电极层40和半导体层20,并且还覆盖半导体层20,并且具有使半导体层20变成n型或p型半导体层的掺杂剂,以及在导致引入的温度下加热的加热步骤 的掺杂剂进入半导体层20并分解脂族聚碳酸酯层50。