摘要:
Disclosed is an organic light emitting display device and a method of manufacturing the same. The organic light emitting display device includes a thin film transistor of a drive unit (110) that has an activation layer formed in a structure where a first oxide semiconductor layer (112a) and a second oxide semiconductor layer (112b) are stacked, a thin film transistor of the pixel unit (120) that has the activation layer formed of the second oxide semiconductor layer (122), and an organic light emitting diode coupled to the thin film transistor of the pixel unit. The thin film transistor of the drive unit has a channel formed on the first oxide semiconductor layer having a higher carrier concentration than the second oxide semiconductor layer, having a high charge mobility, and the thin film transistor of the pixel unit has a channel formed on the second oxide semiconductor layer, having a stable and uniform functional property.
摘要:
An organic thin film transistor that can prevent damage to source and drain electrodes when patterning an organic semiconductor layer, and a method of manufacturing an organic light emitting display device comprising the organic thin film transistor. The organic thin film transistor includes a source electrode and a drain electrode; an organic semiconductor layer that contacts the source and drain electrodes, and has an ashed surface except a channel area between the source and drain electrodes; a gate electrode insulated from the source electrode, the drain electrode, and the organic semiconductor layer; and a gate insulating film that insulates the gate electrode from the source electrode, the,drain electrode, and the organic semiconductor layer.
摘要:
A method of manufacturing an IGZO active layer includes depositing ions including In, Ga, and Zn from a first target, and depositing ions including In from a second target having a different atomic composition from the first target. The deposition of ions from the second target may be controlled to adjust an atomic% of In in the IGZO layer to be about 45 atomic% to about 80 atomic%.