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公开(公告)号：EP3079014A3
公开(公告)日：2017-06-14
申请号：EP16162738.5
申请日：2016-03-30
发明人： HORIKOSHI, Jun
IPC分类号： G03F1/64
CPC分类号： G03F1/64
摘要： An EUV pellicle is proposed in which the pellicle frame is made of a material having a linear expansion coefficient of 10 x 10 -6 (1/K) or smaller, and as such this pellicle is recommendable for use in EUV exposure technology wherein temperature is raised and lowered repeatedly and hence the expansion and contraction of the pellicle frame would harm the pellicle membrane and the pellicle flatness.
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公开(公告)号：EP3159739A3
公开(公告)日：2017-05-17
申请号：EP16192598.7
申请日：2016-10-06
发明人： HORIKOSHI, Jun
IPC分类号： G03F1/64
摘要： A pellicle is proposed in which an adhesive layer which adheres a pellicle film to a pellicle frame is mixed (filled) with powder of thermally conductive material such as metallic compound so that the heat generated by the strong EUV ray is quickly passed to the pellicle frame from the pellicle film lest the latter is deformed by the heat.
摘要翻译： 提出了一种防护薄膜组件，其中将防护薄膜组件粘附到防护薄膜组件框架的粘合剂层与诸如金属化合物的导热材料的粉末混合（填充），使得由强烈的紫外线产生的热量快速传递到防护薄膜组件框架 从薄膜膜上免除后者由于热而变形。
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公开(公告)号：EP3159739A2
公开(公告)日：2017-04-26
申请号：EP16192598.7
申请日：2016-10-06
发明人： HORIKOSHI, Jun
IPC分类号： G03F1/64
摘要： A pellicle is proposed in which an adhesive layer which adheres a pellicle film to a pellicle frame is mixed (filled) with powder of thermally conductive material such as metallic compound so that the heat generated by the strong EUV ray is quickly passed to the pellicle frame from the pellicle film lest the latter is deformed by the heat.
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4.发明公开AN ADHESIVE SUITABLE FOR A PELLICLE FOR EUV LITHOGRAPHY AND A PELLICLE USING THE SAME ADHESIVE 审中-公开适用于EUV光刻的PELLICLE胶粘剂和使用相同粘合剂的PELLICLE
公开(公告)号：EP3165964A1
公开(公告)日：2017-05-10
申请号：EP16194501.9
申请日：2016-10-19
发明人： HORIKOSHI, Jun
IPC分类号： G03F1/64
CPC分类号： G03F1/64 , C09J163/00 , C09J183/00
摘要： A pellicle is proposed in which an adhesive layer is formed of an adhesive which undergoes a hardness change at a rate from -50 % through +50 % of its initial hardness, measured after curing, when it is let to sit in atmosphere of a temperature of 300 degrees C for 7 days on end; the rate of hardness change being defined by a following equation: Rate of hardness change % = hardness after the sitting − initial hardness before the sitting ÷ initial hardness before the sitting × 100.
摘要翻译： 提出了这样的防护薄膜组件，其中粘合剂层由粘合剂形成，所述粘合剂在硬化后以固化后测量时的初始硬度的-50％至+ 50％的比率进行硬度变化，当其被放置在温度 300摄氏度，连续7天; 硬度变化率由以下公式定义：硬度变化率（％）=就坐前的硬度 - 就座前的初始硬度（÷坐在前的初始硬度）×100。
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公开(公告)号：EP2990870A1
公开(公告)日：2016-03-02
申请号：EP15002087.3
申请日：2015-07-14
发明人： HORIKOSHI, Jun
IPC分类号： G03F1/64
摘要： The present invention is directed to a pellicle frame of a pellicle for use in photolithography, comprising: a coating of a layer containing a paraxylylene-based polymer. The invention can inhibit release of sulfate ions, ammonium ions and so on from the pellicle frame and thereby reduce the occurrence of haze under exposure environment.
摘要翻译： 本发明涉及一种用于光刻的防护薄膜组件框架，包括：包含对二甲苯基聚合物的层的涂层。 本发明可以防止防护薄膜组件框架中的硫酸根离子，铵离子等的释放，从而在暴露环境下减少雾度的发生。
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公开(公告)号：EP3159739B1
公开(公告)日：2020-08-12
申请号：EP16192598.7
申请日：2016-10-06
发明人： HORIKOSHI, Jun
IPC分类号： G03F1/64
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公开(公告)号：EP3079014A2
公开(公告)日：2016-10-12
申请号：EP16162738.5
申请日：2016-03-30
发明人： HORIKOSHI, Jun
IPC分类号： G03F1/64
CPC分类号： G03F1/64
摘要： An EUV pellicle is proposed in which the pellicle frame is made of a material having a linear expansion coefficient of 10 x 10 -6 (1/K) or smaller, and as such this pellicle is recommendable for use in EUV exposure technology wherein temperature is raised and lowered repeatedly and hence the expansion and contraction of the pellicle frame would harm the pellicle membrane and the pellicle flatness.
摘要翻译： 提出了一种EUV薄膜，其中薄膜框架由线膨胀系数为10×10 -6（1 / K）或更小的材料制成，因此这种薄膜被推荐用于EUV曝光技术，其中温度是 反复升高和降低，因此防护膜框架的膨胀和收缩会损坏防护膜和防护膜的平整度。
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公开(公告)号：EP3944018A1
公开(公告)日：2022-01-26
申请号：EP21195196.7
申请日：2015-02-24
发明人： HORIKOSHI, Jun
摘要： There is provided a pellicle having a frame (12), a film (11) and an adhesive (13) for bonding the film (11) to the frame (12), and this adhesive (13) is a silicone compound having a low outgassing tendency and high heat resistance; in a better mode case, it can maintain its adhesive strength at temperatures 100 - 200 degrees C and it exhibits results of TML being 1.0 % or lower and CVCM being 0.1 % or lower when tested in accordance with ASTM E595-93; thus this pellicle is useful for EUV light exposure lithography.
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9.发明公开ADHESIVE FOR PELLICLE, PELLICLE, AND METHOD OF SELECTING ADHESIVE FOR PELLICLE 审中-公开PELLICLE用粘合剂，PELLICLE和PEEICLE用粘合剂选择方法
公开(公告)号：EP3270224A1
公开(公告)日：2018-01-17
申请号：EP17180463.6
申请日：2017-07-10
发明人： YANASE, Yu , HORIKOSHI, Jun
IPC分类号： G03F1/64
CPC分类号： G03F1/64 , C08F220/18 , C09J133/12 , C09J2433/00
摘要： Provided are an adhesive comprising substantially no surface modifier and leaving a less residue behind after a pellicle is separated; a pellicle; and a method of selecting an adhesive leaving a less residue behind. More specifically, provided are an adhesive for a pellicle having a ratio of a peel strength to a tensile strength of from 0.10 to 0.33; a pellicle comprising a pellicle frame, a pellicle film provided over an upper end face of the pellicle frame, and the adhesive adhered to a lower end face of the pellicle frame; and a method of selecting an adhesive, comprising the steps of: measuring a peel strength and a tensile strength of an adhesive, and selecting an adhesive having a ratio of the former to the latter of from 0.10 to 0.33 as the adhesive for a pellicle.
摘要翻译： 提供了基本上不包含表面改性剂并且在薄膜被分离后留下较少残留物的粘合剂; 薄膜; 和一种选择粘合剂的方法，留下较少的残留物。 更具体而言，提供一种剥离强度与拉伸强度之比为0.10〜0.33的防尘薄膜组件用粘合剂， 该防护薄膜组件包括防护薄膜组件框架，设置在防护薄膜组件框架的上端面上的防护薄膜，以及粘附于防护薄膜组件框架的下端面的粘接剂; 以及选择粘合剂的方法，其包括以下步骤：测量粘合剂的剥离强度和拉伸强度，并选择前者与后者的比率为0.10-0.33的粘合剂作为用于防尘薄膜组件的粘合剂。
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公开(公告)号：EP2990870B1
公开(公告)日：2017-05-10
申请号：EP15002087.3
申请日：2015-07-14
发明人： HORIKOSHI, Jun
IPC分类号： G03F1/64
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