专利检索 ap:("Smoltek AB") AND inv:"MUHAMMAD, Amin Saleem" 第 1 页

1.

发明公开
HIGH ASPECT RATIO TEMPLATE FOR LITHOGRAPHY, METHOD OF MAKING THE SAME TEMPLATE AND USE OF THE TEMPLATE FOR PERFORATING A SUBSTRATE AT NANOSCALE 审中-公开
标题翻译：原有的高宽比光刻，方法生产该文件，并使用该模板射孔ON纳米尺度A SUBSTRATE

公开(公告)号：EP2307928A2

公开(公告)日：2011-04-13

申请号：EP09777381.6

申请日：2009-07-23

申请人： Smoltek AB

发明人： MUHAMMAD, Amin Saleem , BRUD, David , BERG, Jonas , KABIR, Mohammad, Shafiqul , DESMARIS, Vincent

IPC分类号： G03F7/00

CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/932

摘要： Template and method of making high aspect ratio template, stamp, and imprinting at nanoscale using nanostructures for the purpose of lithography, and to the use of the template to create perforations on materials and products.