CAVITATION PROCESSING METHOD AND CAVITATION PROCESSING APPARATUS

    公开(公告)号:EP4454813A1

    公开(公告)日:2024-10-30

    申请号:EP24171675.2

    申请日:2024-04-22

    发明人: MATSUI, Taiki

    摘要: The cavitation process is performed on the inner surface of the target hole. The cavitation processing method includes; attaching a cap (50) having a through hole (58) to an inlet (21) of a target hole (20e) of a workpiece (10e); immersing the workpiece (10e) and a nozzle (102) into a processing liquid; and ejecting a jet of the processing liquid from the nozzle (102) located outside of the target hole (20e) to an inside of the target hole (20e) through the through hole (58) such that a cavitation process is performed on a processing region (A1e) that is located downstream of a non-processing region (B1e, B2e) covered by the cap (50) on an inner surface of the target hole (20e).

    CLEANING APPARATUS
    3.
    发明公开
    CLEANING APPARATUS 审中-公开

    公开(公告)号:EP3766591A1

    公开(公告)日:2021-01-20

    申请号:EP20181045.4

    申请日:2020-06-19

    摘要: A compact cleaning apparatus including a robot with a narrow range of motion is provided. The cleaning apparatus (10) includes: a cleaning chamber (11); a cleaning station (15); a drying station (23); a separation wall (13); a single axis robot (44) including a column (46) arranged adjacent to a side surface (38), a linear guide (59) extending vertically, and a vertical moving saddle (77) movable vertically; an arm portion (45) including a first rotation saddle (93) rotatable about a second axis extending vertically, a first arm (101) swingable about a third axis (143) extending horizontally and extending orthogonal to the third axis (143), a second arm (113) rotatable about a fourth axis (145) orthogonal to the third axis (143), a second rotation saddle (129) rotatable about a fifth axis (147) orthogonal to the fourth axis (145), a third rotation saddle (136) rotatable about a sixth axis (149) orthogonal to the fifth axis (147); and a hand (137) for gripping a workpiece (151).

    PROCESSING SYSTEM
    4.
    发明公开
    PROCESSING SYSTEM 审中-公开

    公开(公告)号:EP3995220A1

    公开(公告)日:2022-05-11

    申请号:EP21204173.5

    申请日:2021-10-22

    IPC分类号: B08B3/02

    摘要: A processing system is provided that is easy to maintain when arranged laterally. The processing system (10) includes a plurality of cleaning units (10a - 10d), each cleaning unit (10a - 10d) including a processing chamber (13) located frontward and including a loading door (17) located at a front surface for loading or unloading a workpiece and an inspection door (21) located at a rear surface, a control panel (43) arranged separately and rearward from the processing chamber (13) and having a substantially the same width as the processing chamber (13), and a step (31) arranged between the processing chamber (13) and the control panel (43) and having a substantially the same width as the processing chamber (13). The processing chambers (13) are laterally arranged to have front surfaces aligned for connecting each of the steps (31) to form a passage.

    MACHINING APPARATUS
    5.
    发明公开
    MACHINING APPARATUS 审中-公开

    公开(公告)号:EP3922406A1

    公开(公告)日:2021-12-15

    申请号:EP21169209.0

    申请日:2021-04-19

    IPC分类号: B23Q11/08 E06B3/90

    摘要: The machining apparatus (10) includes: a cover (11) including a side plate (12), a projecting portion (14) disposed below the side plate (12), a rectangular shaped front opening (13a), and a semicircular shaped planar opening (13b); a first door body (29) including a first drum (29a) disposed in a first side of a mating surface (28), a first abutting surface (29c) connected to the first drum (29a), and a first top plate (29b), and accommodated inside the cover (11) by rotated about a first axis (25); and a second door body (34) including a second drum (34a) disposed in the second side of the mating surface (28), a second abutting surface (34c) abut to the first abutting surface (29c) on the mating surface (28), and a second top plate (34b), and accommodated inside the cover (11) by rotated about a second axis (33).

    CLEANING APPARATUS
    6.
    发明公开
    CLEANING APPARATUS 审中-公开

    公开(公告)号:EP3919192A1

    公开(公告)日:2021-12-08

    申请号:EP21173912.3

    申请日:2021-05-14

    IPC分类号: B08B3/02 B23Q11/00

    摘要: A cleaning apparatus capable of thoroughly cleaning all parts of a workpiece is provided. The cleaning apparatus (10) includes: a cleaning chamber (11); a table rotation shaft (25) that rotates about a first axis (3); a first swivel fitting (31) disposed inside the table rotation shaft (25); a table (37) on which the cleaning workpiece (42) is placed; a first motor (15) that rotates the table rotation shaft (25); a propeller shaft (63) that rotates about a second axis (7) that is parallel to the first axis (3); a second swivel fitting (65) connected to a propeller shaft (63); and a nozzle (69) that rotates integrally with the second swivel shaft (65b) and that ejects a cleaning fluid (9) in a direction different from the second axis (7) toward the cleaning workpiece (42).

    PEENING APPARATUS
    7.
    发明公开
    PEENING APPARATUS 审中-公开

    公开(公告)号:EP4151363A1

    公开(公告)日:2023-03-22

    申请号:EP22185524.0

    申请日:2022-07-18

    发明人: MATSUI, Taiki

    IPC分类号: B24C1/10 B24C3/06 B24C3/22

    摘要: The peening apparatus (10) includes a processing tank (11), a table (21), a moving unit (49) including a nozzle moving device (50), a quill (52), a first head (53) having a mounting hole (53a) and disposed at a distal end of the quill (52), a motor (54) and a first spindle 58 exposed from the mounting hole (53a), a nozzle head portion (61) separable from the moving unit (49) and including a second head (65) having a connection port (65a) connected to the mounting hole (53a), a connecting shaft (66) connected to the first spindle (58), a second spindle (76), a nozzle (90) disposed below the second spindle (76), a nozzle flow path (87) penetrating inside the second spindle (76) and connected to the nozzle (90) to be opened to an upper end of the second spindle (76), and a swivel joint (81) disposed at an upper end portion of the second spindle (76) and connected to the nozzle flow path (87).

    PROCESSING MACHINE
    8.
    发明公开
    PROCESSING MACHINE 审中-公开

    公开(公告)号:EP4091764A1

    公开(公告)日:2022-11-23

    申请号:EP21208794.4

    申请日:2021-11-17

    发明人: MATSUI, Taiki

    IPC分类号: B23Q11/00 B23Q11/10

    摘要: Provided is an easy and clean processing machine. The processing machine (10) includes a processing chamber (11) having a discharge port (18); a tank (15) having an inflow port (15a) with a gap from the discharge port (18); a drawer (24) to be stowed in the processing chamber (11) and pulled out rearward from the processing chamber (11), the drawer (24) including a front plate (25), a pair of side plates (27), and a bottom plate (31) including a filter (32) disposed in a front portion, a guide (16) including a stopper (19); and a slider (34) including a latch portion (37) to collide with the stopper (19) to stop the drawer (24) at an intermediate position. The discharge port (18) is located above the bottom plate (31), and the filter (32) is located above the inflow port (15a) when the drawer (24) is located at the intermediate position.

    ABRASIVE PEENING APPARATUS AND ABRASIVE PEENING METHOD

    公开(公告)号:EP3964331A1

    公开(公告)日:2022-03-09

    申请号:EP21186312.1

    申请日:2021-07-19

    发明人: MATSUI, Taiki

    IPC分类号: B24C1/10 C21D7/06 B24C9/00

    摘要: An apparatus capable of efficiently performing a metal surface processing. The abrasive peening apparatus (10) includes a processing tank (11) storing abrasive particles (5) and peening liquid (3), and including a bottom portion (11f) in which a workpiece (1) is immersed in the peening liquid (3); a dispensing chamber (15) having a plurality of recesses (17) on an upper surface, and disposed in the bottom portion (11f) to dispense the peening liquid (3); a stirring nozzle (30) disposed at a center of the recess (17) directing vertically upward and connected to the dispensing chamber (15) to eject the peening liquid (3); a peening nozzle (55) immersed inside the processing tank (11) to eject the peening liquid (3) toward the workpiece (1); and a moving device (47) moving the peening nozzle (55) relative to the workpiece (1).