Abstract:
An optical measurement system is disclosed for evaluating samples with multi-layer thin film stacks. The optical measurement system includes a reference ellipsometer and one or more non-contact optical measurement devices. The reference ellipsometer is used to calibrate the other optical measurement devices. Once calibration is completed, the system can be used to analyse multi-layer thin film stacks. In particular, the reference ellipsometer provides a measurement which can be used to determine the total optical thickness of the stack. Using that information coupled with the measurements made by the other optical measurement devices, more accurate information about individual layers can be obtained.
Abstract:
An ellipsometer, and a method of ellipsometry, for analyzing a sample (2) using a broad range of wavelengths, includes a ligth source (4) for generating a beam of polychromatic light for interacting with the sample. A polarizer (6) polarizes the light beam before the light beam interacts with the sample. A rotating compensator (8) induces phase retardations of a polarization state of the light beam wherein the range of wavelengths and the compensator are selected such that at least a first phase retardation value is induced that is within a primary range of effective retardations of substantially 135° to 225°, and at least a second phase retardation value is induced that is outside of the primary range. An analyzer (10) interacts with the light beam after the light beam interacts with the sample. A detector (12) measures the intensity of light after interacting with the analyzer as a function of compensator angle and of wavelength, preferably at all wavelengths simultaneously. A processor (23) determines the polarization state of the analyzer from the light intensities measured by the detector.