公开(公告)号：EP3026693A4

公开(公告)日：2017-03-08

申请号：EP14829929

申请日：2014-07-25

申请人： TOKUYAMA CORP

发明人： FURUYA HIROSHI ,  OBATA TOSHIYUKI

IPC分类号： H01L21/205 ,  C23C16/02 ,  C23C16/34 ,  C30B25/20 ,  C30B29/38

CPC分类号： C30B25/186 ,  C30B25/20 ,  C30B29/403 ,  H01L21/02043 ,  H01L21/02389 ,  H01L21/0242 ,  H01L21/0243 ,  H01L21/0254 ,  H01L21/02598 ,  H01L21/0262 ,  H01L21/02658

摘要： Provided is a method for pretreatment of a group III nitride single crystal substrate having a high Al composition ratio, for manufacturing a high-quality group III nitride thin film. The method includes heating the base substrate at a temperature range of 1000 to 1250°C for no less than 5 minutes under a first mixed gas atmosphere before a layer of a second group III nitride single crystal is grown, wherein the first mixed gas includes hydrogen gas and nitrogen gas; the base substrate includes a layer of a first group III nitride single crystal at least on a surface of the base substrate; the first group III nitride single crystal is represented by a composition formula of Al A Ga B In C N; and the layer of the second group III nitride single crystal is to be grown on the layer of the first group III nitride single crystal.

公开(公告)号：EP2298698A4

公开(公告)日：2013-11-06

申请号：EP09770114

申请日：2009-06-22

申请人： TOKUYAMA CORP

发明人： FURUYA HIROSHI ,  FUKUYAMA YOSHIKI ,  YATA SHIZUKUNI

IPC分类号： C01B31/02 ,  B01J20/20 ,  B01J20/28 ,  B01J20/30 ,  B82Y30/00 ,  C01B3/00 ,  C01B31/00

CPC分类号： B01J20/2808 ,  B01J20/20 ,  B01J20/28069 ,  B01J20/3064 ,  B01J20/3078 ,  B82Y30/00 ,  C01B3/0021 ,  C01B32/00 ,  C01B32/05 ,  Y02E60/325

摘要： Disclosed is a method for producing a porous carbon material comprising: heating a cured phenolic resin complex lump, including 150 to 450 parts by weight of sodium hydroxide and/or potassium hydroxide per 100 parts by weight of phenolic resin, at a temperature of 420 to 850°C in a non-oxidizing atmosphere to obtain carbonized material; and washing and removing sodium hydroxide and potassium hydroxide included in the carbonized material. According to the present invention, there can be provided a porous carbon material, including large volumes of subnano-pores having a diameter of in a range of 0.45 to 1.0 nm with a sharp distribution, which is particularly useful as a gaseous adsorbent.