公开(公告)号：EP1835323A4

公开(公告)日：2010-07-21

申请号：EP05793232

申请日：2005-10-14

Applicant: UNIV OSAKA

Inventor： FUJITA KATSUMASA ,  KAWATA SATOSHI ,  KOBAYASHI MINORU ,  NAKAMURA OSAMU ,  NAKAMURA NAOKO

IPC: G02B21/00 ,  G01N21/64

CPC classification number: G01N21/6458 ,  G01N21/6408 ,  G01N21/6428 ,  G01N2201/0697 ,  G02B21/16

公开(公告)号：EP2239629A4

公开(公告)日：2012-10-31

申请号：EP09706190

申请日：2009-01-28

Applicant: UNIV OSAKA ,  NANOPHOTON CORP

Inventor： FUJITA KATSUMASA ,  KOBAYASHI MINORU ,  KIKUCHI KAZUYA ,  MIZUKAMI SHIN ,  KAWATA SATOSHI ,  KAWANO SHOGO

IPC: G03F7/004 ,  G02F1/355 ,  G03C1/73 ,  G11B7/24 ,  G11B7/244 ,  G11B7/246 ,  G11B7/2467

CPC classification number: G03F7/028 ,  G02F1/0063 ,  G02F1/3526 ,  G03F7/2053 ,  G11B7/245 ,  G11B7/2467 ,  G11B2007/24624

Abstract: Provided is a nonlinear optical material an optical recording maternal, an optical recording method, a photosensitive material, a photopolymerization initiator, and a photosensitizer. One exemplary aspect of the present invention is a photosensitive material used for photolithography for forming a pattern by irradiating a photoresist with excitation light which includes a donor molecule 11 that is excited by the excitation light, and an acceptor molecule 12 that is excited by energy transfer or charge transfer from the excited donor 11.

Abstract translation: 本发明提供一种非线性光学材料，以光学记录母体，光记录方法中，光敏材料，光聚合引发剂，和光敏剂。 本发明的一个示例性方面是用于光刻法用于通过照射的激发光的光致抗蚀剂，其包括供体分子11没有被激发光激发形成图案的感光材料，以及受体分子12并通过能量转移激发 或从激发供体的电荷转移。11