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    CYLINDRICAL PLASMA RESONANT CAVITY
    2.
    发明公开
    CYLINDRICAL PLASMA RESONANT CAVITY 审中-公开
    圆柱状等离子体共鸣腔

    公开(公告)号：EP2557629A4

    公开(公告)日：2015-12-30

    申请号：EP10849310

    申请日：2010-12-01

    申请人： YANGTZE OPTICAL FIBRE AND CABLE COMPANY LTD

    发明人： LI ZHENYU ,  LU SONGTAO ,  LIU SHANPEI ,  LONG SHENGYA ,  LEI GAOQING ,  LIU YONGTAO

    IPC分类号： H01P7/06 ,  C23C16/511 ,  H01J37/32

    CPC分类号： H05H7/18 ,  H01J37/32247

    摘要： The present invention relates to a cylindrical plasma resonant cavity for the PCVD (Plasma Chemical Vapor Deposition) optical fiber preform processing machine. The cylindrical plasma resonant cavity includes a cylindrical resonant cavity case. Cutoff waveguides are set at the both sides of the cylindrical resonant cavity case, and a waveguide inlet is opened in the circumferential direction of the cylindrical resonant cavity case. The cylindrical plasma resonant cavity is characterized in that: the cutoff waveguides at the both sides of the cylindrical resonant cavity case are movable end cover structure, middle vias are opened in said movable end cover structural cutoff waveguides, and bumped truncated cones configured with the cylindrical resonant cavity are set at the inside end surfaces. The present invention enables the matching between the resonant cavity and the glass tubes with different diameters through the disassembly and change of the cutoff waveguides, and enables a better matching between the waveguide devices and the resonant cavity load. The coupling effect is improved to adapt the variation of the load in the machining process, and the energy loss is decreased, thus the adaptation range of the machining of the cylindrical plasma resonant cavity is improved. With the simple structure, easy machining and manufacturing, uniform deposition, good deposition attachment effect, the present invention improves the machining precision and efficiency of the PCVD process.