METHOD FOR PROVIDING A RECESS PATTERN IN A FOIL
    2.
    发明公开
    METHOD FOR PROVIDING A RECESS PATTERN IN A FOIL 有权
    过程在电影一井网

    公开(公告)号:EP1305168A1

    公开(公告)日:2003-05-02

    申请号:EP01955747.9

    申请日:2001-07-16

    申请人: Zetfolie B.V.

    IPC分类号: B41M3/00

    CPC分类号: B41M3/006

    摘要: The invention relates to a method for providing in a foil a number of recesses which are arranged relative to each other in a recess pattern extending along a first side of the foil, each recess extending from a first side in the direction of an opposite, second side of the foil, the method comprising at least the following steps: (a) applying a medium pattern onto the unprocessed foil, the medium comprising a medium solvable in solvent, the medium pattern corresponding to the recess pattern to be provided; (b) applying the masking layer onto the foil; (c) bringing the foil, with the masking layer applied thereto, into contact with a solvent, whereby the parts of the masking layer applied substantially on the medium pattern are removed from the foil upon dissolution of the medium pattern; and (d) at least partly exposing the foil with the pattern of openings to a foil etching environment, whereby the recess pattern is created, characterized in that in step (a) the application of a medium pattern is executed with the aid of a printing technique.