摘要:
The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.
摘要:
Provided is a charged particle beam lens apparatus having a small size and high resolution, and a charged particle beam column and a charged particle beam exposure apparatus. A charged particle beam lens apparatus includes a lens unit positioned around a through hole through which a charged particle beam (EB) travels, where the lens unit is configured to converge or diffuse the charged particle beam, and a supporting unit (50) surrounding the lens unit. Here, at least one of an outer peripheral portion of the lens unit that is in contact with the supporting unit and an inner peripheral portion of the supporting unit that is in contact with the lens unit includes a groove (61) through which a coolant fluid flows along an outer periphery of the lens unit. In this way, the charged particle beam lens apparatus can achieve a small size and high resolution.
摘要:
A device that deforms and deflects a beam, including an aperture layer that includes a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section that includes a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section that includes an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode that faces the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.
摘要:
A photoacoustic diagnosis device that diagnoses a state of a skin of a human body, includes a pulsed light source, an electric signal converter, a blood distribution obtaining section, and a diagnosis section. The pulsed light source generates a pulsed light. The electric signal converter receives a photoacoustic wave generated at the skin by the pulsed light and converts the photoacoustic wave into an electric signal. The blood distribution obtaining section obtains distribution of blood in the skin based on the electric signal. The diagnosis section diagnoses a state of the skin based on a result obtained by the blood distribution obtaining section.
摘要:
In a multi-column electron beam exposure apparatus for performing exposure treatment in parallel by arranging a plurality of column cells on a wafer, a relationship between exposure intensity and a line width for each column cell is obtained (Steps S41 and S44). Then, correction parameters are obtained, which allow a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between exposure intensity and a line width for a reference column cell selected from among the plurality of column cells (Steps S43 and S46). Thereafter, exposure time of each column cell is obtained by correcting the exposure time of the reference column cell based on the correction parameters thus obtained (Steps S30 and S40).
摘要:
A testing apparatus for testing an electronic device, having a pattern creation section for creating a testing pattern to be supplied to the electronic device, an electric source circuit for supplying source power to the electronic device, and a determination section for determining good or bad of the electronic device based on an output signal outputted by the electronic device. The electric source circuit has a voltage source for producing a predetermined input voltage to be applied to the electronic device, a power device for supplying electric source power to the electronic device based on the input voltage produced by the voltage source, an electric source for supplying drive power for the power device, and a voltage control section for controlling, based on the electric source power outputted by the power device, a drive voltage applied by the electric source to the power device.
摘要:
[PROBLEMS] To provide a patterning method capable of accurately and rapidly forming a structure having a large opening and a small opening. [MEANS FOR SOLVING PROBLEMS] An electron beam resist is applied onto a film as a patterning object and the electron beam resist is subjected to electron beam exposure and development so as to form a first resist pattern defining a belt-shaped opening of a predetermined width having a first opening contour and a second opening shape. The first resist pattern is used as a mask for etching the film as a patterning object so as to form the belt-shaped opening and the second opening. After this, photoresist is applied onto the film as a patterning object and the photoresist is subjected to exposure and development so as to form a second resist pattern defining a shape of the first opening excluding the belt-shaped opening. The second resist pattern is used as a mask for etching the film as a patterning object to form the first opening.
摘要:
A test equipment (100) for providing a cable laying technology satisfying limitation of curvature of a plurality of optical fibers, comprising a test head (102) having a plurality of test boards for applying a test pattern to a device under test, a main frame (104) for controlling a test sequence by the test head (102), an optical fiber cable unit (106) having a plurality of flat cables (200) for connecting the test head (102) with the main frame (104) optically, a plurality of optical fiber cables (108), a dam (107) for connecting the optical fiber cable unit (106) with the plurality of optical fiber cables (108), a unit (110) for offsetting a difference in circumferential length among the plurality of flat cables (200) in the optical fiber cable unit (106), and a cable guide unit (112) for holding the optical fiber cables (108) being connected with a test board (612) in the main frame (104) while bending them.