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53 条记录 (耗时 0.013 秒)

    METHOD, APPARATUS, AND COMPOSITION FOR TREATING ACNE
    5.
    发明公开
    METHOD, APPARATUS, AND COMPOSITION FOR TREATING ACNE 审中-公开
    治疗痤疮的方法，装置和组合物

    公开(公告)号：EP1626730A1

    公开(公告)日：2006-02-22

    申请号：EP04750880.9

    申请日：2004-04-30

    申请人： Dermanew, Inc.

    发明人： RHOADES, Dean, L.

    IPC分类号： A61K33/08 ,  C09K3/14

    CPC分类号： A61K31/194 ,  A61K31/60 ,  A61K33/04 ,  A61M35/00 ,  C09K3/1409 ,  C09K3/1472

    摘要： A composition including a base, a plurality of abrasive particles, and an acne treatment agent. An apparatus including a handle, a head, and an applicator coupled to the head, the applicator having dimensions suitable for contacting localized areas of human skin. A method including applying a composition to an area of human skin, the composition comprising a base; a plurality of abrasive particles; and an acne treatment agent and manipulating the composition over the area of human skin with a handle-operated instrument.

    摘要翻译： 一种组合物，其包含基质，多个研磨颗粒和痤疮治疗剂。 一种装置，包括手柄，头部和连接到头部的施用器，施用器具有适于接触人体皮肤的局部区域的尺寸。 一种方法，包括将组合物施用于人体皮肤区域，所述组合物包含碱; 多个磨料颗粒; 和痤疮治疗剂，并用手柄操作仪器在人体皮肤区域上操作该组合物。

    Cerium oxide sol and abrasive
    7.
    发明公开
    Cerium oxide sol and abrasive 有权
    氧化铈溶胶和磨料

    公开(公告)号：EP1219568A3

    公开(公告)日：2003-12-03

    申请号：EP01130261.9

    申请日：2001-12-20

    申请人： Nissan Chemical Industries, Ltd.

    发明人： Ota, Isao, Nissan Chemical Ind. Ltd. ,  Tanimoto, Kenji, Nissan Chemical Ind. Ltd. ,  Nishimura, Tohru, Nissan Chemical Ind. Ltd.

    IPC分类号： C01F17/00 ,  C09K3/14

    CPC分类号： B82Y30/00 ,  C01F17/0043 ,  C01P2002/01 ,  C01P2002/72 ,  C01P2004/10 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C09G1/02 ,  C09K3/1472

    摘要： There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass. A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 µm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(Ce + X) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof. The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.

    摘要翻译： 提供一种用于研磨包含二氧化硅作为主要成分的基材的研磨剂，例如用于光掩模的石英玻璃，用于CMP的有机膜，层间电介质（ILD）和半导体的浅沟槽隔离的石英玻璃 装置或用于抛光由玻璃制成的硬盘。 一种颗粒分散在介质中的溶胶，其中所述颗粒具有0.005至1μm的粒度并且包含立方晶系的结晶氧化铈作为主要组分和作为附加组分的镧化合物，钕化合物或其组合 其中所述附加组分以X /（Ce + X）摩尔比计包含0.001至0.5，其中X是镧原子，钕原子或其组合。 该溶胶通过使铈（III）盐与镧（III）盐和/或钕（III）盐混合的水溶液与碱性物质反应而制得悬浮液，其中氢氧化铈（III） 与氢氧化镧（III）和/或氢氧化钕（III）均匀混合，并将氧气或含氧气体吹入悬浮液中。