摘要:
A process for preparing an aqueous concentrated fabric conditioner composition, being an aqueous dispersion, comprising from 10 to 30 wt % of an ester-linked quaternary ammonium fabric softening active; water; and electrolyte; wherein the process comprises the steps of i) adding a proportion of the electrolyte before the addition of the fabric softening active to the water, and ii) adding a proportion of the electrolyte after the addition of the ester-linked quaternary ammonium fabric softening active leads to improved viscosity stability following preparation without loss of storage stability.
摘要:
Disclosed herein are methods for improving safety and delivery of commercial application of cleaning compositions that include enzymes and other protein irritants. The methods reduce the mist and aerosolization of proteins so that inhalation and exposure to the same are reduced. According to the invention, when commercial pressurized sprayers are used to apply protein containing use cleaning compositions of up to 5 ppm protein, aerosolization is decreased to below 60 ng active protein per meter cubed. Applicants have also identified a specific metering tip/nozzle, dispense rate, and low pressure application of not more than 100 psi are critical to achieving the benefits of the invention.
摘要:
A post chemical-mechanical-polishing (post-CMP) cleaning composition comprising: (A) is cysteine, glutathione, N-acetylcysteine, thiourea, (L) at least one oligomeric or polymeric polycarboxylic acid, and (C) water, wherein the post-CMP cleaning composition has a pH-value in the range of from 4 to not more than 7. The use of the composition for removing residues and contaminants from the surface of semiconductor substrates useful for manufacturing microelectronic devices. A process for manufacturing microelectronic devices from semiconductor substrates comprising the step of removing residues and contaminants from the surface of the semiconductor substrates by contacting them at least once with the post-CMP cleaning composition.
摘要:
Disclosed is a method of cleaning fabrics having oily stains thereon. The method comprises a first step of applying one or more fatty acids to a stained portion of the fabric in which step there is no contact of said stained portion with any surfactant. There is a second step of washing the stained portion in wash liquor comprising a detergent composition. In the first step, a monoglyceride is applied to the stained portion simultaneously with the one or more fatty acids wherein said stained portion is treated with a pretreatment composition containing said one or more fatty acids and said monoglyceride and wherein said composition comprises a mixture of fatty acids containing 60 wt% to 90 wt% oleic acid, the balance being either stearic or palmitic acid or a combination thereof.
摘要:
The present invention relates to a method for treating laundry comprising spraying a liquid with dissolved detergent into a drum holding laundry, waiting a predetermined time period after spraying the liquid, to allow the detergent to be absorbed in the laundry, spraying steam into the drum to rinse the laundry and supplying heated air into the drum to dry the laundry, wherein the detergent comprises 5 to 10wt% of polyoxyethylene alkylether, 3 to 10wt% of sodium ethylhexyl sulfate, and balance of water.
摘要:
The present invention relates to a method for reducing odor generated by the activity of a lipase comprising a step of adding to said lipase a peptide capable of binding to the lipase.
摘要:
Disclosed is a method of cleaning fabrics having oily stains thereon. The method comprises a first step of applying one or more fatty acids to a stained portion of the fabric in which step there is no contact of said stained portion with any surfactant. There is a second step of washing the stained portion in wash liquor comprising a detergent composition. In the first step, a monoglyceride is applied to the stained portion simultaneously with the one or more fatty acids wherein said stained portion is treated with a pretreatment composition containing said one or more fatty acids and said monoglyceride and wherein said composition comprises a mixture of fatty acids containing 60 wt% to 90 wt% oleic acid, the balance being either stearic or palmitic acid or a combination thereof.
摘要:
A post chemical-mechanical-polishing (post-CMP) cleaning composition comprising: (A) is cysteine, glutathione, N-acetylcysteine, thiourea, (L) at least one oligomeric or polymeric polycarboxylic acid, and (C) water, wherein the post-CMP cleaning composition has a pH-value in the range of from 4 to not more than 7. The use of the composition for removing residues and contaminants from the surface of semiconductor substrates useful for manufacturing microelectronic devices. A process for manufacturing microelectronic devices from semiconductor substrates comprising the step of removing residues and contaminants from the surface of the semiconductor substrates by contacting them at least once with the post-CMP cleaning composition.