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1.发明授权METHOD OF MANUFACTURING AN X-RAY DIFFRACTION GRATING MICROSTRUCTURE FOR IMAGING APPARATUS 有权用于生产X射线辐射电网的微观结构图像记录装置
公开(公告)号：EP2646602B1
公开(公告)日：2016-04-27
申请号：EP11731520.0
申请日：2011-06-10
IPC分类号： C25D5/02 , C25D7/00 , C25D7/12 , G21K1/06 , H01L21/768
CPC分类号： C25D5/022 , C25D7/123 , G21K1/02 , G21K2207/005
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2.发明公开STRUCTURE, METHOD FOR MANUFACTURING THE SAME, AND TALBOT INTERFEROMETER 审中-公开STRUKTUR，VERFAHREN ZUR HERSTELLUNG DAVON UND TALBOT-INTERFEROMETER
公开(公告)号：EP2977992A1
公开(公告)日：2016-01-27
申请号：EP15176032.9
申请日：2015-07-09
发明人： TESHIMA, Takayuki , OKA, Arisa
IPC分类号： G21K1/10
CPC分类号： A61B6/484 , A61B6/032 , A61B6/4035 , C25D5/02 , G21K1/062 , G21K1/067 , G21K1/10 , G21K2201/061 , G21K2201/067 , G21K2207/005
摘要： A structure includes a silicon substrate (1) having a plurality of recessed portions (2), each having a bottom (3) and a side wall (7), silicide layers (4), one each in contact with the bottoms of the recessed portions, and a metal structure (5) including metal portions, one each disposed in the recessed portions and in contact with the silicide layers. The silicide layers are electrically connected to each other through the silicon substrate.
摘要翻译： 一种结构包括具有多个凹部（2）的硅基板（1），每个具有底部（3）和侧壁（7），硅化物层（4），每个与凹陷部分 部分以及包括金属部分的金属结构（5），每个都设置在凹部中并与硅化物层接触。 硅化物层通过硅衬底彼此电连接。
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3.发明公开METHOD OF MANUFACTURING AN X-RAY DIFFRACTION GRATING MICROSTRUCTURE FOR IMAGING APPARATUS 有权用于生产X射线辐射电网的微观结构图像记录装置
公开(公告)号：EP2646602A1
公开(公告)日：2013-10-09
申请号：EP11731520.0
申请日：2011-06-10
IPC分类号： C25D5/02 , C25D7/00 , C25D7/12 , G21K1/06 , H01L21/768
CPC分类号： C25D5/022 , C25D7/123 , G21K1/02 , G21K2207/005
摘要： A microstructure manufacturing method includes forming a first insulating film on an Si substrate, exposing an Si surface by removing a part of the first insulating film, forming a recessed portion by etching the Si substrate from the exposed Si surface, forming a second insulating film on a sidewall and a bottom of the recessed portion, forming an Si exposed surface by removing at least a part of the second insulating film formed on the bottom of the recessed portion, and filling the recessed portion with a metal from the Si exposed surface by electrolytic plating.
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公开(公告)号：EP3614398A1
公开(公告)日：2020-02-26
申请号：EP19192043.8
申请日：2015-07-09
发明人： TESHIMA, Takayuki , OKA, Arisa
IPC分类号： G21K1/10
摘要： A structure includes a silicon substrate (1) having a plurality of recessed portions (2), each having a bottom (3) and a side wall (7), silicide layers (4), one each in contact with the bottoms of the recessed portions, and a metal structure (5) including metal portions, one each disposed in the recessed portions and in contact with the silicide layers. The silicide layers are electrically connected to each other through the silicon substrate.
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公开(公告)号：EP2753961A2
公开(公告)日：2014-07-16
申请号：EP12772518.2
申请日：2012-08-07
CPC分类号： G01N23/20 , A61B6/484 , B81B3/0008 , B81C1/00952 , C25D1/00 , G03F7/00 , G21K1/025 , G21K2207/005
摘要： A method for manufacturing a structure by using a silicon mold, in which disturbances in arrangement due to charges are reduced, can be provided. The method for manufacturing a structure includes the steps of forming a recessed portion in a silicon substrate, cleaning, drying, or conveying the silicon substrate while charges of a plurality of portions sandwiched between the recessed portion are removed, and filling a metal into the recessed portion of the silicon substrate subjected to the cleaning, drying, or conveying.
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6.发明公开FLUID MIXING APPARATUS, INTEGRATED FLUID MIXING APPARATUS, FLUID MIXING SYSTEM AND PROCESS FOR PRODUCING A FLUID MIXING APPARATUS 审中-公开流体搅拌机，集成的流体混合机，流体混合的系统和方法制备流体搅拌机
公开(公告)号：EP1968733A1
公开(公告)日：2008-09-17
申请号：EP06835201.2
申请日：2006-12-27
发明人： EZAKI, Takahiro , YASUDA, Susumu , TSUKADA, Mamoru , TESHIMA, Takayuki , NAKAHAMA, Kazumichi , CHANG, Chienliu
CPC分类号： B01F13/0059 , B01F5/0256 , B01J19/0093 , B01J2219/00783 , B01J2219/00828 , B01J2219/00889 , B01J2219/0095 , B01J2219/00952
摘要： A fluid mixing apparatus is constituted by a plurality of flow passageways (12) for conveying fluids, respectively, and jet outlets (13), corresponding to and communicating with the flow passageways, respectively, for jetting the fluids therefrom so that movement directions of the fluids intersect each other to mix the fluids. The jet outlets are provided at a surface of a substrate (11) in which the flow passageways are provided. At least one of the flow passageways communicating with at least one of the jet outlets has a center axis (207) partially shifted from a center axis (208) of at least one of the jet outlets so as to incline a movement direction of a fluid jetted from at least one of the jet outlets with respect to the surface of the substrate.
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