摘要:
The present invention provides an electrolytic hard gold plating solution substitution inhibitor characterized by containing at least one compound selected from the group consisting of an imidazole compound having a mercapto group, a triazole compound having a mercapto group, and an aliphatic compound having a sulfonic acid group and a mercapto group, and further provides an electrolytic hard gold plating solution containing said electrolytic hard gold plating solution substitution inhibitor, a gold salt, a soluble cobalt salt and/or a soluble nickel salt, an organic acid conducting salt, and a chelating agent.
摘要:
The invention relates to a method for producing an electric contact element, the base of the contact element being made of a metal substrate which undergoes the following method steps in the listed order: a. a cold and/or hot and/or electrolytic degreasing of the substrate, b. an activation of the surface of the substrate i. in a nickel strike bath or ii. in a fluoride-containing activation solution or iii. in a fluoride-free activation solution, c. a galvanic deposition of an intermediate layer i., wherein a galvanically deposited nickel layer or ii. a nickel alloy layer, or iii. a copper alloy layer is applied as the intermediate layer, and d. an electrolytic deposition of a gold alloy layer in a direct and/or pulse current method in which the current density ranges from 0.3 to 0.6 A/dm 2 .
摘要:
The present invention discloses a solution for the electrodeposition of a gold alloy and the alloy derived therefrom having defined colour coordinates in the range of (L: 65-75; a: 6-9; b: 10-20). The solution comprises a gold salt, an iron salt and a vanadium salt, and optionally one or more salts of other metals selected from cobalt, palladium, ruthenium, for modulating the end colour shades; and optionally small amounts of tellurium, gallium or bismuth salts, as sparkling aids and grain refiners.
摘要:
The invention relates to an electroplated coating in the form of a gold alloy, which has a thickness of between 1 and 800 microns and contains copper. According to the invention, the coating includes indium as third main component. The invention relates to the field of electroplating processes.
摘要:
L'invention concerne un procédé galvanique de dépôt d'un revêtement de couleur anthracite pour des pièces métalliques, comportant une première étape de dépôt d'un alliage or-nickel au moyen d'un bain électrolytique, caractérisé en ce qu 'il comporte une deuxième étape de traitement dudit alliage or-nickel au moyen d'un bain d'acide dilué, contenant un acide choisi parmi les acides chlorhydrique, fluorhydrique, phosphorique, nitrique, et sulfurique.