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    APPARATUS FOR PRODUCING PARBOILED RICE
    1.
    发明授权
    APPARATUS FOR PRODUCING PARBOILED RICE 有权

    公开(公告)号：EP2772158B1

    公开(公告)日：2018-12-05

    申请号：EP11874583.5

    申请日：2011-10-26

    申请人： Satake Corporation

    发明人： MATSUSHIMA, Hideaki ,  MIZUNO, Hidenori ,  WAKABAYASHI, Keishi ,  NISHIMURA, Akiko ,  UEMUKI, Naoya

    IPC分类号： A47J27/16 ,  A23L7/196 ,  F26B11/18 ,  F26B5/12 ,  A47J27/04 ,  A47J37/12 ,  A23B7/06

    CPC分类号： A47J27/04 ,  A23B7/06 ,  A23L7/196 ,  A47J37/1214 ,  A47J2027/043 ,  F26B5/12

    摘要： An object of this invention is to provide a parboiled rice manufacturing apparatus capable of efficiently manufacturing good-quality parboiled rice without increasing the overall size of the apparatus. A parboiled rice manufacturing apparatus according to this invention includes a drum which has a raw material hatch provided at a peripheral surface and is disposed to be rotatable about a horizontal axis, a heating unit which is disposed inside the drum and heats an interior of the drum, an agitation unit which is disposed inside the drum and agitates a raw material charged through the raw material hatch into the drum, a steam supply unit which supplies steam into the drum, a pressure adjustment unit which has a valve allowing communication of the interior of the drum with outside air and allows increase of pressure inside the drum with steam supplied from the steam supply unit by closing the valve at the time of processing of the raw material through the pressurized steam-boiling treatment, a water addition unit which is disposed inside the drum and adds water to the raw material inside the drum, and a drying unit which dries the raw material by reducing the pressure inside the drum.

    Spin dryer
    5.
    发明公开
    Spin dryer 失效
    回转烘干机。

    公开(公告)号：EP0137947A1

    公开(公告)日：1985-04-24

    申请号：EP84109419.6

    申请日：1984-08-08

    申请人： FUJITSU LIMITED

    发明人： Motoki, Yasunari ,  Ohkuma, Yuji

    IPC分类号： H01L21/302 ,  H01L21/68 ,  H05K3/00 ,  F26B11/18

    CPC分类号： F26B5/08 ,  F26B7/00 ,  G03F7/40

    摘要： A spin dryer including a rotary stage (12) for supporting a substrate (1) to be dried, particularly adapted for use in producing semiconductor devices, and a stationary cover (11) spaced from the substrate (1). The stationary cover has at least the same area as that of the substrate and is provided with a number of openings for charging a dry and dust-free gas onto the substrate, whereby oxidation and dust-contamination of the substrate are avoided.

    Coating film drying method
    9.
    发明公开
    Coating film drying method 审中-公开
    Verfahren zum Trocknen von einem Beschichtungsfilm

    公开(公告)号：EP1950515A2

    公开(公告)日：2008-07-30

    申请号：EP07150144.9

    申请日：2007-12-19

    申请人： AISIN SEIKI KABUSHIKI KAISHA

    发明人： Yamamoto Minoru c/o Aisin Seiki Kabushiki Kaisha ,  Io Kenji c/o Aisin Seiki Kabushiki Kaisha

    IPC分类号： F26B3/30 ,  F26B11/18

    CPC分类号： F26B3/30 ,  F26B11/18

    摘要： A coating film drying method includes a coating process for applying a waterborne coating to a work (13) and forming a coating film (8, 9) on the work (13), so that a coated member (2) is produced, a preliminary drying process for heating the coated member (2) and preliminarily drying the coated member (2) until a nonvolatile content of the coating film (8, 9) reaches a percentage ranging from 70% to 90%, a final drying process for heating and drying the coated member (2) until the nonvolatile content reaches 97% or more, and a cooling process for cooling the coated member (2) until a surface temperature of the coated member (2) is decreased to a temperature at which the coated member (2) is touchable by hand, whereby the preliminary drying process is carried out by repeatedly heating and cooling the coated member (2) at a predetermined frequency.

    摘要翻译： 涂膜干燥方法包括将工程（13）上涂布水性涂料并在工件（13）上形成涂膜（8,9）的涂布方法，从而制成涂布部件（2） 用于加热涂覆部件（2）的干燥过程，并预先干燥涂覆部件（2），直到涂膜（8,9）的不挥发物含量达到70％至90％的百分比，加热的最终干燥过程和 干燥涂布的构件（2）直到不挥发物含量达到97％以上，并且用于冷却涂覆构件（2）直到涂覆构件（2）的表面温度的冷却过程降低到涂覆构件 （2）可手动接触，由此通过以预定的频率反复加热和冷却涂覆部件（2）来进行预干燥处理。

    SPIN DRYING APPARATUS
    10.
    发明授权
    SPIN DRYING APPARATUS 失效
    旋转干燥装置

    公开(公告)号：EP0305402B1

    公开(公告)日：1991-02-27

    申请号：EP87903597.0

    申请日：1987-05-11

    申请人： EASTMAN KODAK COMPANY (a New Jersey corporation)

    发明人： KARL, Gerald, Martin

    IPC分类号： F26B11/18 ,  H01L21/00

    CPC分类号： H01L21/67034 ,  F26B5/08 ,  F26B11/18 ,  F26B21/14 ,  G03F7/168

    摘要： A spin drying apparatus for drying semiconductor wafers (32) wherein the wafers are contacted only at the edge thereof by a plurality of radially extending arms (122) and wherein means (200, 202) is provided for preventing the generation of turbulent air flow by the fan-like effect of the rotation of the arms during the spin drying step and the recontamination of already cleaned and dried wafer surfaces by contaminants stirred up by the operation of the spin drying apparatus itself.