A WAFER SUITABLE FOR RECONDITIONING A SUPPORT SURFACE OF A WAFER HOLDING STAGE

    公开(公告)号:EP3767308A1

    公开(公告)日:2021-01-20

    申请号:EP19186234.1

    申请日:2019-07-15

    申请人: Imec VZW

    发明人: Hantschel, Thomas

    摘要: The invention is related to a reconditioning wafer (1) comprising a carrier substrate (2) that supports at least one array of regularly spaced protrusions (3,5,6,7+8) suitable for forming indentations in a support surface of a wafer holding stage. The protrusions within the same array have essentially the same shape and the same dimensions, thereby enabling a more reliable reconditioning process compared to prior art solutions. The protrusions may have the form of pyramids (3) or pillars (6) or other similar shapes with at least the tip of the protrusions formed of a material suitable for making the indentations. The reconditioning wafer is obtainable by a molding technique wherein an array of molds (11) is created in a mold substrate (10), after which the molds are filled with an indentation material such as diamond, and bonded to the carrier substrate (2), after which the mold substrate is removed by thinning and wet etching.

    SYSTEM FOR SCANNING PROBE MICROSCOPY APPLICATIONS AND METHOD FOR OBTAINING SAID SYSTEM

    公开(公告)号:EP3623821A1

    公开(公告)日:2020-03-18

    申请号:EP18382665.0

    申请日:2018-09-14

    IPC分类号: G01Q60/06 G01Q70/18 G01Q60/08

    摘要: The invention relates to a system suitable for its use in scanning probe microscopy, such as tip-enhanced Raman spectroscopy or magnetic force microscopy, that comprises: a tip (1) comprising an apex (1'); a plurality of nanoparticles (2, 2') attached to the tip (1); having a size between 0.5 and 100 nm. Advantageously, the plurality of nanoparticles (2, 2') comprises a cluster (2") of one or more nanoparticles (2') disposed at the apex (1') of the tip (1), wherein the cluster (2") is spaced from any other nanoparticle (2) of the tip (1) at least a distance d of 0.5 nm. The invention also relates to a method for obtaining such system through a controlled thermal treatment that exploits the intrinsic properties of nanoparticles.