ULTRAVIOLET LIGHT EMISSION DEVICE
    1.
    发明公开

    公开(公告)号:EP4418303A3

    公开(公告)日:2024-10-23

    申请号:EP24153246.4

    申请日:2024-01-22

    摘要: An ultraviolet light emission device (1) includes: an excimer lamp (2) having an elongated shape and having a light emission surface (2a) that emits ultraviolet light (L) toward an object (W) for irradiation; a light intensity sensor (3) that is disposed around the excimer lamp (2) and detects ultraviolet light (L); and a first reflection member (61) disposed around the excimer lamp (2) and facing a part of the light emission surface (2a) in a longitudinal direction, wherein ultraviolet light (L) emitted from the light emission surface (2a) is reflected by the first reflection member (61) and enters the light intensity sensor (3).

    LIGHT SOURCE DEVICE
    2.
    发明公开
    LIGHT SOURCE DEVICE 审中-公开

    公开(公告)号:EP4444041A1

    公开(公告)日:2024-10-09

    申请号:EP22928864.2

    申请日:2022-10-31

    发明人: FUKUDA, Minoru

    摘要: An object of the present invention is to provide a light source device having a novel structure and including an ultraviolet radiation lamp that emits light by dielectric barrier discharge and a lighting circuit. The light source device includes an ultraviolet radiation lamp (1) and a lighting circuit (S). The lamp (1) includes: a substantially rod-shaped light-emitting tube (11) in which light-emitting gas containing at least a halogen gas is sealed; and a pair of electrodes (12, 13) for generating discharge plasma (14) inside the light-emitting tube (11) in a direction in which the light-emitting tube extends, and the lighting circuit (S) constitutes a flyback circuit and controls a width of pulse voltage applied to the electrodes to be 450 ns or more to 1000 ns or less.

    BACTERIOSTATIC METHOD
    3.
    发明公开

    公开(公告)号:EP4345863A3

    公开(公告)日:2024-07-03

    申请号:EP24151462.9

    申请日:2021-02-15

    发明人: NAITO, Keisuke

    IPC分类号: H01J65/00 A61L2/10 H01J61/16

    摘要: Provided is a bacteriostatic method for suppressing the proliferation of a bacterium while reducing the influence on a human body.
    The bacteriostatic method is for suppressing a proliferation of a bacterium in a target region and includes a step (a) for irradiating the target region with ultraviolet light having a main peak wavelength of 200 nm to 230 nm inclusive at an average irradiance equal to or less than DMax (µW/cm2) defined by Formula (1): DMax=9391.1×exp−0.043λ
    where λ is the main peak wavelength (nm),
    wherein,
    when the bacterium is Staphylococcus aureus, the step (a) includes irradiating the target region with the ultraviolet light at an irradiance equal to or greater than 0.4 µW/cm2, and
    when the bacterium is a mold, the step (a) includes irradiating the target region with the ultraviolet light at an irradiance equal to or greater than 0.29 µW/cm2.

    EXCIMER LAMP AND LIGHT IRRADIATION DEVICE INCLUDING THE SAME

    公开(公告)号:EP3886142A3

    公开(公告)日:2022-05-18

    申请号:EP21159519.4

    申请日:2021-02-26

    摘要: An excimer lamp (2) includes a long light-emitting tube (10) transparent to ultraviolet light, a pair of electrodes (11) disposed separately along the radial direction of the light-emitting tube (10), and a reflective coating (14) formed on the inner wall surface (10b) of the light-emitting tube (10). The reflective coating (14) includes a first reflective area (14p) facing a light-emitting surface (12) that emits light toward a light irradiation target area, and a second reflective area (14q) facing a light-collecting area (13) disposed at a position different from the light-emitting surface (12).

    ULTRAVIOLET EXCIMER LAMP SYSTEMS AND METHODS

    公开(公告)号:EP3929963A2

    公开(公告)日:2021-12-29

    申请号:EP21181109.6

    申请日:2021-06-23

    摘要: An excimer lamp 100 includes a first electrode 110, a dielectric plate 120, and a second electrode 130. The dielectric plate has a first side 122 and a second side 124 opposite the first side. The dielectric plate is spaced a distance from the first electrode to define a volume 150 configured to hold a gas. The first side of the dielectric plate is oriented toward the first electrode. The second electrode is oriented toward the dielectric plate, wherein the dielectric plate is interposed between the first electrode and the second electrode.

    SYSTEMS AND METHODS FOR EXTENDING A LIFESPAN OF AN EXCIMER LAMP

    公开(公告)号:EP3483918A3

    公开(公告)日:2020-02-26

    申请号:EP18205352.0

    申请日:2018-11-09

    摘要: System and method generally relate to extending a lifespan of an excimer lamp. The system 100 includes a ultra-violet (UV) light source 101 (for example, an excimer lamp) having a pair of dielectrics 104,108 configured to separate electrodes 102,110. One of the electrodes includes a metal mesh 102. The system includes a power supply 116 electrically coupled to the UV light source and configured to deliver electrical power to the UV light source. The system includes a temperature sensor 118 operably coupled to the UV light source. The temperature sensor is configured to generate a temperature signal indicative of a temperature of the UV light source. The system includes at least one processor 114. The at least one processor is configured to determine a temperature of the UV light source based on the temperature signal, and adjust the electrical power delivered to the UV light source based on the temperature signal.

    ELECTRODELESS SINGLE CW LASER DRIVEN XENON LAMP

    公开(公告)号:EP3295470A1

    公开(公告)日:2018-03-21

    申请号:EP16724576

    申请日:2016-05-12

    发明人: BLONDIA RUDI

    摘要: An ignition facilitated electrodeless sealed high intensity illumination device is disclosed. The device is configured to receive a laser beam from a continuous wave (CW) laser light source. A sealed chamber is configured to contain an ionizable medium. The chamber has an ingress window disposed within a wall of a chamber interior surface configured to admit the laser beam into the chamber, a plasma sustaining region, and a high intensity light egress window configured to emit high intensity light from the chamber. A path of the CW laser beam from the laser light source through the ingress window to a focal region within the chamber is direct. The ingress window is configured to focus the laser beam to within a predetermined volume, and the plasma is configured to be ignited by the CW laser beam, optionally by heating of a non-electrode ignition agent located entirely within the chamber.