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    ELECTROWETTING SUBSTRATE, ELECTROWETTING DISPLAY PANEL AND ELECTROWETTING DISPLAY APPARATUS
    2.
    发明公开
    ELECTROWETTING SUBSTRATE, ELECTROWETTING DISPLAY PANEL AND ELECTROWETTING DISPLAY APPARATUS 审中-公开

    公开(公告)号：EP4321921A1

    公开(公告)日：2024-02-14

    申请号：EP23742676.2

    申请日：2023-01-03

    申请人： Honor Device Co., Ltd.

    发明人： CAI, Peizhi ,  QIAO, Yun

    IPC分类号： G02B26/02

    摘要： This application provides an electrowetting substrate, an electrowetting display panel, and an electrowetting display apparatus. In the electrowetting substrate, first scan lines and second scan lines are alternately arranged. Pixels are defined by data lines, the first scan lines, and the second scan lines. A first TFT connected to the first scan line as well as a second TFT and a third TFT that are connected to the second scan line are disposed in each pixel. A first metal layer, a second metal layer, and a reflective electrode layer are sequentially provided on a first base to form a first storage capacitor and a second storage capacitor. When the first scan lines are enabled, the first TFTs are turned on, and the second storage capacitor and the first storage capacitor are connected in series, so that overall capacitance is small, charging is fast, and fast refresh can be achieved. When the second scan lines are enabled, the second TFTs and the third TFTs jointly act, the second storage capacitor is short-circuited, and the first storage capacitor can provide long voltage holding time, so that a bistable state is achieved, and power consumption is reduced.

    CONTROLE DE TEMPERATURE D'UNE PIECE D'HORLOGERIE
    3.
    发明公开
    CONTROLE DE TEMPERATURE D'UNE PIECE D'HORLOGERIE 审中-公开

    公开(公告)号：EP4202572A1

    公开(公告)日：2023-06-28

    申请号：EP21217076.5

    申请日：2021-12-22

    申请人： Omega SA

    发明人： GIMKIEWICZ, Christiane

    IPC分类号： G04B43/00 ,  G02B26/02 ,  G02F1/01

    摘要： Un aspect de l'invention concerne un dispositif de contrôle de température (100) pour pièce d'horlogerie (1000), comportant une première partie (1) laissant passer la lumière, définissant avec une deuxième partie (2) adjacente une chambre intermédiaire (9) de dimensions variables selon la température de la première partie (1), la première partie (1) comporte des premières micropersiennes (10) selon une première répartition spatiale, la deuxième partie (2) comporte des deuxièmes micropersiennes (20) selon une deuxième répartition spatiale et faisant sensiblement face aux premières micropersiennes (10), pour se superposer partiellement ou totalement dans certaines positions relatives entre la première partie (1) et la deuxième partie (2), pour faire varier la transmission et/ou la réflexion de la lumière incidente sur la première partie (1) entre un maximum et un minimum.

    MICRO-ELECTROMECHANICAL OPTICAL SHUTTER WITH TRANSLATING SHIELDING STRUCTURES AND RELATED MANUFACTURING PROCESS
    7.
    发明公开
    MICRO-ELECTROMECHANICAL OPTICAL SHUTTER WITH TRANSLATING SHIELDING STRUCTURES AND RELATED MANUFACTURING PROCESS 审中-公开

    公开(公告)号：EP4187288A1

    公开(公告)日：2023-05-31

    申请号：EP22207130.0

    申请日：2022-11-14

    申请人： STMicroelectronics S.r.l.

    发明人： VERCESI, Federico ,  BONI, Nicolò ,  CERINI, Fabrizio ,  GUERINONI, Luca

    IPC分类号： G02B5/00 ,  G02B26/04 ,  G02B26/02

    摘要： A MEMS shutter (1) including: a semiconductor substrate (2) traversed by an aperture (9); a first semiconductor layer (14) and a second semiconductor layer (16), which form a supporting structure (28, 71, 87; 28, 171) fixed to the substrate; a plurality of deformable structures (29, 59, 68, 85; 169), each of which is formed by a corresponding portion of at least one between the first and second semiconductor layers; a plurality of actuators (36; 96); a plurality of shielding structures (33; 35; 333; 335; 433), each of which is formed by a corresponding portion of at least one between the first and second semiconductor layers, the shielding structures being arranged angularly around the underlying aperture so as to provide shielding of the aperture, each shielding structure being further coupled to the supporting structure via a deformable structure. Each actuator may be controlled so as to translate a corresponding shielding structure between a first position and a second position, thus varying shielding of the aperture; the first and second positions of the shielding structures are such that, in at least one operating condition, pairs of adjacent shielding structures at least partially overlap one another.