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122 条记录 (耗时 0.017 秒)

    Nano-wires and method of manufacturing the same
    91.
    发明专利
    Nano-wires and method of manufacturing the same 审中-公开
    纳米线及其制造方法

    公开(公告)号：JP2006248893A

    公开(公告)日：2006-09-21

    申请号：JP2006062815

    申请日：2006-03-08

    申请人： Samsung Electronics Co Ltd ,  三星電子株式会社Samsung Electronics Co.,Ltd.

    发明人： CHOI BYOUNG-IYONG ,  LEE EUN-KYUNG

    IPC分类号： C01B33/02 ,  B01J23/52 ,  B82B1/00 ,  B82B3/00 ,  H01L29/06

    CPC分类号： B82Y30/00 ,  C30B11/12 ,  C30B29/605 ,  Y10S977/721 ,  Y10S977/762 ,  Y10S977/768 ,  Y10S977/789 ,  Y10S977/81 ,  Y10S977/938

    摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing nano-wires which are grown by controlling diameters and distribution of nano-wires, and nano-wires accurately grown using the method. SOLUTION: The method of manufacturing the nano-wires includes (1) a step for forming microgrooves having a plurality of microcavities regularly on the surface of a silicon substrate, (2) a step for forming a metal layer on the silicon substrate by depositing a material which acts as a catalyst to form nano-wires on the silicon substrate, (3) a step for agglomerating the metal layer within the microgrooves on the surface of the silicon substrate by heating the metal layer to form catalysts and (4) a step for growing the nano-wires between the catalysts and the silicon substrate using a thermal process. COPYRIGHT: (C)2006,JPO&NCIPI

    摘要翻译： 要解决的问题：提供一种通过控制纳米线的直径和分布而生长的纳米线的制造方法，以及使用该方法精确生长的纳米线。 解决方案：制造纳米线的方法包括（1）在硅衬底的表面上规则地形成具有多个微腔的微槽的步骤，（2）在硅衬底上形成金属层的步骤 通过沉积作为催化剂的材料在硅衬底上形成纳米线，（3）通过加热金属层形成催化剂和（4）在硅衬底的表面上的微槽内的金属层附聚的步骤 ）使用热处理在催化剂和硅衬底之间生长纳米线的步骤。 版权所有（C）2006，JPO＆NCIPI

    Optical member including antireflection film and method for producing the same
    98.
    发明专利
    Optical member including antireflection film and method for producing the same 有权
    包括抗反射膜的光学构件及其制造方法

    公开(公告)号：JP2014098885A

    公开(公告)日：2014-05-29

    申请号：JP2013054850

    申请日：2013-03-18

    申请人： Fujifilm Corp ,  富士フイルム株式会社

    发明人： SONODA SHINICHIRO ,  HAKUTA SHINYA ,  YOSHIHIRO TATSUYA

    IPC分类号： G02B1/11 ,  B32B3/30 ,  B32B7/02 ,  B32B9/00

    CPC分类号： G02B1/118 ,  B82Y20/00 ,  C03C17/3417 ,  C03C17/3435 ,  C03C17/3452 ,  C03C2217/734 ,  C03C2217/77 ,  C03C2218/155 ,  G02B1/02 ,  G02B1/115 ,  G02B1/116 ,  G02B1/12 ,  G02B1/18 ,  Y10S977/81 ,  Y10S977/811 ,  Y10S977/832

    摘要： PROBLEM TO BE SOLVED: To provide an optical member which can be produced with high productivity and includes an antireflection film having sufficient optical characteristics.SOLUTION: The optical member includes an antireflection film 19 comprising a transparent thin film layer 15 and a transparent finely rugged layer 18 essentially comprising an alumina hydrate, disposed in this order on a surface of a transparent substrate 10. The transparent thin film layer 15 comprises, successively from the transparent substrate 10 side, an alumina layer 11, a water barrier layer 12 having a refractive index lower than that of the alumina layer and serving a water barrier for the alumina layer 11, and a flattening layer 13 essentially comprising an alumina hydrate and having a refractive index lower than that of the water barrier layer 12, in which the thickness of the water barrier layer 12 is 70 nm or less.

    摘要翻译： 要解决的问题：提供一种可以以高生产率制造的光学构件，并且包括具有足够光学特性的抗反射膜。解决方案：光学构件包括防反射膜19，其包括透明薄膜层15和透明细小凹凸层 18基本上包括水合氧化铝，其依次设置在透明基板10的表面上。透明薄膜层15依次由透明基板10侧包括氧化铝层11，具有折射率的防水层12 低于氧化铝层并且用于氧化铝层11的防水层，以及基本上包含氧化铝水合物并且具有低于防水层12的折射率的平坦化层13，其中水的厚度 阻挡层12为70nm以下。