Abstract:
PROBLEM TO BE SOLVED: To provide a metal foil polyimide laminate which has a high adhesion property to metal foil not subjected to roughening treatment and keeps the high adhesion property even after being preserved at a high temperature. SOLUTION: The metal foil polyimide laminate has an adhesive polyimide and the metal foil on at least one side of a polyimide film. The adhesive polyimide contains 1,3-bis(3-aminophenoxy)benzene. The ten-point average roughness (Rz) of the surface of the metal foil in contact with the polyimide is from 0.4 μ to 1.3 μ, and the quantity of elements of the surface of the metal foil in contact with the polyimide in an atom.% value by XPS (X-ray photoelectron spectroscopy measurement), Si value/(Zn value+Cr value+Ni value+Cu value) is at least 0.3. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a metal foil polyimide laminate which can form fine wiring, and can obtain a low rate of a dimension change. SOLUTION: A metal foil polyimide laminate includes a non-thermoplastic polyimide layer 3 and a heat contact-bonding polyimide layer 4 laminated on one surface of the non-thermoplastic polyimide layer 3, and includes a polyimide film 1 having a thickness of 5-15 μm, and metal foil 2 laminated on the heat contact-bonding polyimide layer 4. The non-thermoplastic polyimide layer 3 has a linear thermal expansion coefficient of 10 ppm/K or higher which is not higher than that of the metal foil 2, and the heat contact-bonding polyimide layer 4 has a linear thermal expansion coefficient of 40-60 ppm/K. The metal foil 2 has an Ef of 2.0 or larger when a thickness of wiring is Tc, a width of a top side of the wiring is Wt, a width of a bottom side of the wiring is Wb, and an etching factor Ef is defined as Ef=(2×Tc)/(Wb-Wt) when patterning is performed by an etching method. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a novel polyimide which retains such characteristics of polyimides as excellent heat resistance, electrical insulation and chemical resistance, of which dielectric constant is lower than those of known polyimides; and to provide a composition containing the same and a method for producing the same. SOLUTION: The crosslinked polyimide having a dielectric constant of at most 2.7, is produced by polycondensation of a tetramine, a tetracarboxyic dianhydride and an aromatic diamine in the presence of a catalyst. The composition containing the polyimide is also provided. COPYRIGHT: (C)2011,JPO&INPIT