RODDSHAPE HOT CATHODE AGGREGATE
    11.
    发明专利

    公开(公告)号:JPS5235575A

    公开(公告)日:1977-03-18

    申请号:JP11131375

    申请日:1975-09-12

    Abstract: PURPOSE:The distance between emission at heating section of rod-shape hot cathode is determined in order that it may become maximum at the emission area. In this way, the heating power is decreased as well as the life of cathode is efficiently extended.

    ELECTRON BEAM PROCESSING DEVICE
    13.
    发明专利

    公开(公告)号:JPS6438960A

    公开(公告)日:1989-02-09

    申请号:JP19570187

    申请日:1987-08-04

    Abstract: PURPOSE:To make it possible to obtain an electronic optical tube which can arrange a deflecting coil of magnetic field type at the circumference and has sufficient strength with low cost without lowering response frequency by forming a section of an electronic optical tube opposed to a coil out of semiconductive fine ceramics. CONSTITUTION:In an electronic beam processing device equipped with, at least, one coil among magnetic field type deflecting coils 25, 26 to deflection-scan an electronic beam 23 with high frequency and a magnetic field type conpensating coil 27 round an electronic optical tube 21, a part opposed to the coils 25-27 of the electronic optical tube 21 is formed of semiconductive fine ceramics. Thus, the conductivity of the material is lowered and skin effect can be substantially ignored and high speed responsiveness in the constituting part of an electronic optical system which drives in a high frequency magnetic field can be improved.

    ELECTRON BEAM MACHINE
    14.
    发明专利

    公开(公告)号:JPS63290693A

    公开(公告)日:1988-11-28

    申请号:JP12465387

    申请日:1987-05-20

    Abstract: PURPOSE:To perform the regular dull machining by deflecting and shunting an electron beam from a work while the arcing is generated and deflecting the electron beam and regulating a driving state of the work or the electron beam to restart the machining. CONSTITUTION:Based on the instructions from an arcing detector 17, in a state that the arcing is generated and a dull machining condition is unstable, the electron beam 5 is projected on a collector 20 other than a roll 10 which is the work by a blanking electrode 18. Then, with the stabilization of the machining condition, the electron beam 5 is deflected and projected on the next projecting position of the roll 10 to restart the dull machining. Accordingly, even if the arcing is generated, the stable and regular dull machining is performed on the work 10. Moreover, when the electron beam 5 is deflected and the machining is restarted, pulse frequency of the electron beam 5 is increased than that at the time of machining in a stationary state and it is regulated so that the deflection of the electron beam is not required gradually by accelerating, etc., the driving speed of the roll. Accordingly, accumulation of polarizing angle of the beam and gradual enlarging. is prevented.

    FORMATION OF THIN FILM
    16.
    发明专利

    公开(公告)号:JPS63111171A

    公开(公告)日:1988-05-16

    申请号:JP25898886

    申请日:1986-10-30

    Abstract: PURPOSE:To feed enough vapor to a vapor nozzle when a thin film is formed by a cluster-ion beam vapor deposition method, by evaporating starting material to be vapor-deposited by heating under vibration so as to prevent the formation of an impurity film on the evaporation surface. CONSTITUTION:Starting material 5 to be vapor-deposited in an evaporating source is evaporated by heating in vacuum under vibration and/or convection. The resulting vapor is jetted toward a substrate 18 through a nozzle 26 to form clusters 15 of the vapor. The clusters 15 are ionized and the ionized clusters 16 are accelerated and collided against the substrate 18.

    System for controlling charged electron beam device
    17.
    发明专利
    System for controlling charged electron beam device 失效
    用于控制充电电子束装置的系统

    公开(公告)号:JPS6174250A

    公开(公告)日:1986-04-16

    申请号:JP19812284

    申请日:1984-09-19

    CPC classification number: H01J37/243

    Abstract: PURPOSE: To prevent any breaking of a controllable power supply and inhibit the generation of falts on the subject to be irradiated by once fixing the feedback signal of beam-accelerating voltage at a given level corresponding to the feedback signal generated before arcing when arcing develops and then releasing the fixation of the feedback signal and then continueing feedback control.
    CONSTITUTION: When a short circuit of the load is produced by electric discharge, the feedback signal of the feedback control system is once fixed at a given level corresponding to the feedback signal generated before the production of the short circuit. For example, when a circuit 30 for detecting the generation of arcing is formed by using a comparator and a differentiation circuit and the feedback signal 19b of beam-accelerating volage VA is entered into the circuit 30, a trigger pulse 31 indicating the development of arcing generates. The trigger pulse 31 causes a monostable multivi brator 32 to generate a hold signal VH for sample-holding circuits 34a and 34b. As the result, the feedback signals 19a and 19b of a power supply current Ik and beam- accelerating voltage VA are held by the circuits 34a and 34b and open controlling performed according to data obtained immediately before the development of arcing is started. After the beam-accelerating voltage VA and the power supply current Ik recovers to almost normal levels, feed back control is initiated again.
    COPYRIGHT: (C)1986,JPO&Japio

    Abstract translation: 目的:为了防止可控电源的任何断开,并且通过一旦将射束加速电压的反馈信号固定在与电弧放电产生的电弧之前产生的反馈信号相对应的给定电平时,防止被照射的被照明物的产生, 然后释放反馈信号的固定,然后继续反馈控制。 构成:当通过放电产生负载短路时,反馈控制系统的反馈信号一旦固定在与产生短路之前产生的反馈信号相对应的给定电平。 例如,当通过使用比较器和微分电路形成用于检测电弧产生的电路30,并且将光束加速电压VA的反馈信号19b输入到电路30中时,指示电弧发展的触发脉冲31 生成。 触发脉冲31使单稳态多参数发生器32产生用于采样保持电路34a和34b的保持信号VH。 结果,电源电流Ik和光束加速电压VA的反馈信号19a和19b由电路34a和34b保持,并且根据在开始电弧开始之前获得的数据执行打开控制。 在光束加速电压VA和电源电流Ik恢复到几乎正常水平之后,再次启动反馈控制。

    ELECTRON BEAM PROCESSING DEVICE
    18.
    发明专利

    公开(公告)号:JPS60205955A

    公开(公告)日:1985-10-17

    申请号:JP5960884

    申请日:1984-03-29

    Abstract: PURPOSE:To enable data input in dialogue style by constituting so that a picture of processing program list composed by columns specifying movement locus of a processing table, movement locus of an electron beam, processing parameter etc. can be displayed on CRT. CONSTITUTION:A processing program list is stored in a memory device 12 previously as working program of an electron beam processing machine and when a predetermined key is operated by an input device 1, the list is recalled on the picture of a CRT display device 10. An operator inputs locus of a processing table and processing parameter in the predetermined column of the processing program list by operating the input device while watching pictures. These processing data are combined with names of maters to be processed and stored in the memory device 12, and recalled on the picture of the CRT display device 10 through the input device 1. Working procedure of the device is previously stored in a portion of the memory device 12, and all the devices are worked by start instruction through the input device 1 to execute a predetermined processing.

    Regulator for laser optical axis
    19.
    发明专利
    Regulator for laser optical axis 失效
    激光光轴调节器

    公开(公告)号:JPS59195890A

    公开(公告)日:1984-11-07

    申请号:JP6953383

    申请日:1983-04-20

    CPC classification number: G01B11/272

    Abstract: PURPOSE:To regulate laser beams simply, easily and extremely accurately by detecting a displacement between the laser beams and a set optical axis by the difference of the rises of the peripheral temperature of an annular body mounted to the same axis as the set optical axis. CONSTITUTION:A circular opening section 7a is formed to a monitor annular body 7, and thermocoples 8 are mounted into grooves 7b at four posiions. When the centers of a set optical axis 3 and laser beams 2 do not coincide, one part of the periphery of the monitor annular body 7 is heated, and difference is generated in the mutual thermal electromotive force of each thermocouple 8. Accordingly, the angle of a bender mirror 4 is changed and the absolute value of the difference of the thermal electromotive force of each thermocouple 8 is minimized, and the centers of the laser set optical axis 3 and the laser beams 2 can be conformed.

    Abstract translation: 目的:通过检测激光束与设定的光轴之间的位移,通过安装在与设定的光轴相同轴线的环形体的周围温度的上升差异,简单,容易和极其精确地调节激光束。 构成:将圆形开口部7a形成为监视器环状体7,热电偶8以四个位置安装到槽7b中。 当设置的光轴3和激光束2的中心不重合时,监视器环形体7的周边的一部分被加热,并且在每个热电偶8的相互热电动势中产生差异。因此, 并且每个热电偶8的热电动势差的绝对值最小化,并且可以使激光设定光轴3和激光束2的中心一致。

    Bias voltage control device of electron beam machining device
    20.
    发明专利
    Bias voltage control device of electron beam machining device 失效
    电子束加工装置的偏压控制装置

    公开(公告)号:JPS5940449A

    公开(公告)日:1984-03-06

    申请号:JP15220382

    申请日:1982-08-30

    CPC classification number: H01J37/241

    Abstract: PURPOSE:To make a device small-sized and perform a stable control by providing a bias circuit tap on the secondary winding of an insulated transformer for heating a cathode and controlling the bias voltage through a negative-feedback circuit of a pulse width-modulated light signal. CONSTITUTION:A main power supply 1 is stepped up 2, rectified 3 and applied to a cathode 5, which is heated by a heating power supply 10 connected to an insulated transformer 25. An electron beam 7 machines a work 8 and the current value of the beam 7 is controlled by a current control device 24. The current value is detected by a resistor 13, compared with a reference power supply 15 and fed to a PID regulator 17. The output of the regulator 17 is fed to a light emitting diode 27 through a PWM circuit 26. A light signal is sensed by a photosensing diode 29 through an optical fiber cable 28. The sensed signal is demodulated and controls the input voltage of a bias transformer 35 through a transistor 33. The output of the transformer 35 is rectified and applied across the cathode 5 and a Wehnelt electrode 12. Accordingly, the device can be made small-sized and perform a stable control.

    Abstract translation: 目的:通过在绝缘变压器的二次绕组上设置偏压电路抽头来加热阴极,并通过脉冲宽度调制光的负反馈电路控制偏置电压,使器件小型化并进行稳定的控制 信号。 构成:主电源1被升压2,整流3并施加到阴极5,阴极5由连接到绝缘变压器25的加热电源10加热。电子束7将工件8加载到电流 光束7由电流控制装置24控制。与参考电源15相比,电流值被电阻13检测并馈送到PID调节器17.调节器17的输出被馈送到发光二极管 光信号由光敏二极管29通过光纤电缆28感测。所感测的信号被解调并通过晶体管33控制偏置变压器35的输入电压。变压器35的输出 被整流并施加在阴极5和Wehnelt电极12上。因此,该器件可以制成小尺寸并且执行稳定的控制。

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