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公开(公告)号:JP5260575B2
公开(公告)日:2013-08-14
申请号:JP2010038105
申请日:2010-02-24
Applicant: 株式会社日立ハイテクノロジーズ
CPC classification number: H01J37/26 , H01J37/20 , H01J2237/006 , H01J2237/2003 , H01J2237/206 , H01J2237/2065
Abstract: An object of the present invention is to provide a sample holding unit for an electron beam apparatus which allows observation of a reaction between a sample and gas. In order to solve one of the above-stated problems, the present invention includes: electron beam apparatus sample holding means in which a diaphragm is placed on upper and lower sides of a sample to form a cell for separating a gas atmosphere and a vacuum atmosphere of a sample chamber and sealing an ambient atmosphere of the sample; a gas supply means for supplying gas to an inside of the cell; and exhaust means for exhausting gas. The exhaust means includes a gas exhaust pipe provided in the inside of the cell and an openable/closable exhaust hole provided in a sidewall of the sample holding means so as to pass through the cell. The diaphragm is an amorphous film made of light elements which can transmit an electron beam, such as carbon films, oxide films, and nitride films.
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公开(公告)号:JP5243048B2
公开(公告)日:2013-07-24
申请号:JP2008001669
申请日:2008-01-08
Applicant: 株式会社日立ハイテクノロジーズ
IPC: G01N1/28 , G01N1/04 , H01J37/20 , H01J37/31 , H01J37/317
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公开(公告)号:JP4896096B2
公开(公告)日:2012-03-14
申请号:JP2008200325
申请日:2008-08-04
Applicant: 株式会社日立ハイテクサイエンスシステムズ , 株式会社日立ハイテクノロジーズ
IPC: H01J37/20 , H01J37/317
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公开(公告)号:JP4851804B2
公开(公告)日:2012-01-11
申请号:JP2006035507
申请日:2006-02-13
Applicant: 株式会社日立ハイテクノロジーズ
IPC: H01J37/30 , H01J37/22 , H01J37/317
CPC classification number: H01J37/3056 , H01J37/3005 , H01J2237/2516 , H01J2237/31745
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公开(公告)号:JP4810399B2
公开(公告)日:2011-11-09
申请号:JP2006300426
申请日:2006-11-06
Applicant: 株式会社日立ハイテクノロジーズ
IPC: H01J37/153 , H01J37/20
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公开(公告)号:JP4199996B2
公开(公告)日:2008-12-24
申请号:JP2002366018
申请日:2002-12-18
Applicant: 株式会社日立ハイテクサイエンスシステムズ , 株式会社日立ハイテクノロジーズ
IPC: G01N1/32 , H01J37/20 , G01N1/28 , H01J37/317
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