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    Method for recycling copper or copper alloy waste to which nickel-plating is applied
    23.
    发明专利
    Method for recycling copper or copper alloy waste to which nickel-plating is applied 有权
    回收铜或铜合金废弃物的方法应用于镍镀层

    公开(公告)号：JP2011084756A

    公开(公告)日：2011-04-28

    申请号：JP2009235978

    申请日：2009-10-13

    申请人： Mitsubishi Shindoh Co Ltd ,  三菱伸銅株式会社

    发明人： SAKURAI TAKESHI ,  ISHIKAWA SEIICHI ,  KUBOTA KENJI

    IPC分类号： C22B7/00 ,  B01D61/24 ,  B22F9/24 ,  C22B15/14 ,  C22B23/00 ,  C25C1/08 ,  C25C7/06 ,  C25F5/00 ,  C25F7/02

    CPC分类号： Y02P10/234 ,  Y02P10/236

    摘要： PROBLEM TO BE SOLVED: To use copper or copper alloy waste from which a nickel-plating is peeled as a raw material for producing the copper or the copper alloy by peeling nickel from the copper or the copper alloy waste to which the nickel-plating is applied continuously and with good efficiency without using a peeling solution which is expensive and has short service life nor performing etching after peeling, and to solve the problem of the waste fluid treatment of the peeling solution, and to recover the nickel from the waste fluid.
    SOLUTION: The copper or the copper alloy waste C to the surface of which the nickel-plating is applied is immersed into a first electrolytic cell 2 storing sulfuric acid solution as the peeling solution E, and thus, the nickel-plating is peeled by the chemical reaction of Ni+H
    2 SO
    4 →NiSO
    4 +H
    2 . The used peeling solution containing the peeled nickel is separated into the concentrated nickel sulfate solution M and the concentrated sulfuric acid solution R with a pressure-dialysis device 3, the concentrated sulfuric acid nickel solution M is electrolyzed in a second electrolytic cell 4 to recover the nickel D, and the concentrated sulfuric acid solution R is returned to the first electrolytic cell 2.
    COPYRIGHT: (C)2011,JPO&INPIT

    摘要翻译： 要解决的问题：通过从铜或铜合金废料中剥离镍或铜合金废料，使用从其中剥离镀镍的铜或铜合金废料作为生产铜或铜合金的原料， 在不使用昂贵且使用寿命短且剥离后进行蚀刻的剥离溶液的情况下，连续施加，效率高，并且解决了剥离液的废液处理的问题，并且从镍 废液 解决方案：将铜或铜合金废物C施加到其镀镍表面上，浸入作为剥离溶液E储存硫酸溶液的第一电解槽2中，镀镍是 通过Ni + H 2 4 →NiSO 4 H 2 的化学反应剥离。 将含有剥离的镍的使用过的剥离液用压力透析装置3分离为浓硫酸镍溶液M和浓硫酸溶液R，在第二电解槽4中电解浓硫酸镍溶液M， 镍D，浓硫酸溶液R返回到第一电解槽2.版权所有（C）2011，JPO＆INPIT

    Chloride ion removal device and method
    28.
    发明专利
    Chloride ion removal device and method 有权
    氯离子去除装置和方法

    公开(公告)号：JP2010207665A

    公开(公告)日：2010-09-24

    申请号：JP2009053962

    申请日：2009-03-06

    申请人： Kokyo Sangyo Kk ,  公協産業株式会社

    发明人： TAKASHIMA TOMOHARU ,  SASAKI TAKANORI ,  SANO CHIAKI ,  IWAMOTO GENZO ,  MATSUMOTO SATOSHI

    IPC分类号： C02F1/463 ,  B01D61/24 ,  B01D71/10 ,  C02F1/465

    摘要： PROBLEM TO BE SOLVED: To provide a chloride ion removal device which can obtain treated water usable as water for food production and drinking water at a low cost by removing chloride ions (Cl
    - ) from water to be treated containing the chloride ions (Cl
    - ).
    SOLUTION: The chloride ion removal device includes an inner tank for storing the water to be treated, an outer tank for storing immersion water for immersing the inner tank, electrodes arranged in the immersion water in the outer tank, and a power source for applying a direct-current voltage to the electrodes. At least a part of the wall or bottom of the inner tank is formed with a microporous film, such as a film made of viscose rayon, which allows penetration of the chloride ions (Cl
    - ) but prevents penetration of silver chloride (AgCl), and at least an anode among the electrodes is formed with silver (Ag), whereby the chloride ions (Cl
    - ) moved outside the inner tank through the microporous film form silver chloride (AgCl) on the anode and the formed silver chloride (AgCl) precipitates in the immersion water.
    COPYRIGHT: (C)2010,JPO&INPIT

    摘要翻译： 要解决的问题：提供一种氯离子去除装置，其可以通过从水中除去氯离子（Cl - ）而以低成本获得可用作食物生产用水的饮用水的处理水 待处理含有氯离子（Cl - ）。 解决方案：氯离子去除装置包括用于储存被处理水的内箱，用于储存用于浸入内箱的浸水的外箱，布置在浸入水中的电极到外罐中，以及电源 用于向电极施加直流电压。 内罐的壁或底部的至少一部分形成有微孔膜，例如由粘胶人造丝制成的膜，其允许氯离子（Cl - ）渗透，但防止渗透 的氯化银（AgCl），并且电极中的至少阳极由银（Ag）形成，由此氯离子（Cl -SP）通过微孔膜移动到内罐外部形成氯化银 （AgCl）和形成的氯化银（AgCl）在浸渍水中沉淀。 版权所有（C）2010，JPO＆INPIT