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    NONAQUEOUS RESIN DISPERSION
    22.
    发明专利
    NONAQUEOUS RESIN DISPERSION 失效

    公开(公告)号：JPS60248715A

    公开(公告)日：1985-12-09

    申请号：JP10445284

    申请日：1984-05-25

    Applicant: RICOH KK

    Inventor： OOGAWARA MAKOTO ,  TSUBUSHI KAZUO

    IPC: C08F2/00 ,  C08F2/04 ,  C08F2/06 ,  C08F18/00 ,  C08F18/02 ,  C08F20/00 ,  C08F20/10 ,  C08F218/02 ,  C08F218/10 ,  C08F220/00 ,  C08F220/10 ,  C08F220/18 ,  C08F222/26 ,  C09D133/04 ,  C09D133/14 ,  G03G9/12

    Abstract: PURPOSE:The titled dispersion useful as a liquid developing agent for electrostatic photography, coating compound, etc., controlling easily its viscosity, having no variability of product, obtained by polymerizing (meth)acrylate with a specific monomer in an aliphatic hydrocarbon solvent. CONSTITUTION:(A) A monomer (e.g., lauryl methacrylate, etc.) shown by the formula I (R is H, or CH3; X is -COOCnH2n+1, or -OCOCnH2n+1; n is 6-20) is polymerized with (B) a monomer (e.g., compound shown by the formula III) shown by the formula II (Z and Z are H, halogen, alkyl, or aryl, and at least one of Z and Z is aryl) in a weight ratio of the monomer A/B of preferably = 50- 99.5/0.5-50 in an aliphatic hydrocarbon solvent (e.g., kerosine, etc.) in the presence of a polymerization initiator, to give the aimed dispersant.

    PRODUCTION OF ACIDIC OLIGOMER
    24.
    发明专利
    PRODUCTION OF ACIDIC OLIGOMER 失效

    公开(公告)号：JPS5610508A

    公开(公告)日：1981-02-03

    申请号：JP8609979

    申请日：1979-07-06

    Applicant: HITACHI CHEMICAL CO LTD

    Inventor： KAGEYAMA AKIRA ,  MAEKAWA IWAO

    IPC: C08F220/04 ,  C08F20/00 ,  C08F20/10 ,  C08F22/00 ,  C08F22/10 ,  C08F32/08 ,  C08F220/00 ,  C08F222/00 ,  C08F222/02 ,  C08F222/06 ,  C08F222/12 ,  C08F222/26

    Abstract: PURPOSE:To obtain in high yields, an oligomer having excellent compatibility with high-molecular materials such as rubber, by polymerizing under heat, di- or monomaleate or fumarate of dihydrodicyclopentadiene with maleic anhydride or a maleate ester. CONSTITUTION:Mono(dihydrodicyclopentadienyl) maleate or fumarate, di(dihydro dicyclopentadienyl) maleate or fumarate and, if necessary, maleic anhydride or a maleic acid derivative are polymerized with heating, at 220-300 deg.C, in the absence of a catalyst. The compounds used in the above reaction are represented respectively by formulas I-IV, wherein R1 and R2 are each H or alkyl. The oligomer thus produced has excellent compatibility and solubility in organic solvents, and is suitable as an additive for high-polar rubber such as nitrile rubber, paints, printing inks, pressure-sensitive adhesives, etc. Polymerization in the absence of a catalyst can offer a composition without gel formation with consequent improved yields.

    HIGH SOLID RESIN COMPOSITION
    25.
    发明专利
    HIGH SOLID RESIN COMPOSITION 失效

    公开(公告)号：JPS5490388A

    公开(公告)日：1979-07-18

    申请号：JP15824077

    申请日：1977-12-28

    Applicant: HITACHI CHEMICAL CO LTD

    Inventor： KAGEYAMA AKIRA ,  TAKAMIZAWA SHIYOUJI ,  MAEKAWA IWAO ,  UCHIGASAKI ISAO

    IPC: C08F22/00 ,  C08F22/10 ,  C08F220/26 ,  C08F222/26 ,  C08F290/00 ,  C08F299/00 ,  C08F299/02 ,  C08F299/04 ,  C08L67/00 ,  C08L67/06

    Abstract: PURPOSE:To prepare a high solid resin composition having excellent curing take-off and giving excellent water resisting property and chemical resistance, by compounding a specific ester oligomer with an unsaturated epoxy ester or an unsaturated polyester and polymerizable monomers. CONSTITUTION:A high solid resin composition comprising (A) an ester oligomer prepared by reacting a monobasic acid expressed by the formula (X is 2-3C alpha,beta- unsaturated hydrocarbon group) with a polyhydric alcohol, (B) (a) an unsaturated epoxy ester prepared by reacting an epoxy resin with an unsaturated carboxylic acid, or (b) an unsaturated polyeser having alpha,beta-unsaturated dibasic acid residual groups in the molecule, (C) one or more polymerizable monomers having one or more polymerizable double bonds in the molecules, e.g. styrene, etc., wherein 0.6

    光学フィルム
    27.
    发明专利
    光学フィルム 审中-公开

    公开(公告)号：JP2021189286A

    公开(公告)日：2021-12-13

    申请号：JP2020093921

    申请日：2020-05-29

    Applicant: 東ソー株式会社

    Inventor： 小峯 拓也 ,  北川 貴裕

    IPC: C08K5/34 ,  C08L35/02 ,  C08F222/26 ,  C08L101/06 ,  C08K5/07 ,  B29C55/04 ,  B32B7/023 ,  B32B27/30 ,  G02B5/30

    Abstract: 【課題】光学部材の薄膜化への適合性の観点から、薄膜で優れた視野角特性と波長分散特性を発現する位相差フィルムが求められている。 【解決手段】負の複屈折を示すエステル系樹脂と正の波長分散を示す波長分散調整剤を含有し、フィルム面内の進相軸方向の屈折率をnx、それと直交するフィルム面内方向の屈折率をny、フィルム面外の垂直方向の屈折率をnzとした場合のそれぞれの関係がnx
    Re=(ny−nx)×d (a) (式中、nxはフィルム面内の進相軸方向の屈折率を示し、nyはフィルム面内の遅相軸方向の屈折率、フィルム面外の垂直方向の屈折率をnz、dはフィルムの厚み示す。) 【選択図】なし

    Fumaric acid diester-based resin and retardation film using the same
    28.
    发明专利
    Fumaric acid diester-based resin and retardation film using the same 审中-公开
    基于乳酸酯的树脂和使用它的延缓膜

    公开(公告)号：JP2014129472A

    公开(公告)日：2014-07-10

    申请号：JP2012287912

    申请日：2012-12-28

    Applicant: Tosoh Corp ,  東ソー株式会社

    Inventor： YAMADA MUTSUHIKO ,  TOYOMASU NOBUYUKI

    IPC: C08F222/26 ,  C08F222/02 ,  C08J5/18 ,  G02B5/30 ,  G02F1/13363

    Abstract: PROBLEM TO BE SOLVED: To provide a material for a retardation film and a retardation film excellent in optical properties such as large refraction index in a thickness direction of the film, negative and large out-of-plane retardation, little wavelength dependence, and large out-of-plane retardation even in a thin film.SOLUTION: There are provided a fumaric acid diester-based resin and a retardation film comprising the same, whose monomer residue unit comprises: a fumaric acid di-tert-butyl residue unit of 30 to 69 mol%; a fumaric acid diethyl residue unit of 30 to 69 mol%; and one or more residue unit selected from a fumaric acid di-n-propyl residue unit, a fumaric acid di-n-butyl residue unit, a fumaric acid di-iso-butyl residue unit, and a fumaric acid di-1-methyl propyl residue unit of 1 to 20 mol% (where the total of the fumaric acid di-tert-butyl residue unit; the fumaric acid diethyl residue unit; and one or more residue unit selected from the fumaric acid di-n-propyl residue unit, the fumaric acid di-n-butyl residue unit, the fumaric acid di-iso-butyl residue unit, and the fumaric acid di-1-methyl propyl residue unit is 100 mol%).

    Abstract translation: 要解决的问题：为了提供一种用于延迟膜的材料和在膜的厚度方向上的诸如大的折射率的光学性能优异的相位差膜，负的和大的面外延迟，很小的波长依赖性和大的 平面延迟甚至在薄膜中。解决方案：提供富马酸二酯基树脂和包含其的延迟膜，其单体残基单元包括：富马酸二叔丁基残基单元30 至69mol％; 富马酸二乙基残基单元为30〜69摩尔％; 和一个或多个残基单元，其选自富马酸二正丙基残基单元，富马酸二正丁基残基单元，富马酸二异丁基残基单元和富马酸二-1-甲基 丙基残基单元为1〜20摩尔％（其中总富马酸二叔丁基残基单元;富马酸二乙基残基单元;和一个或多个残基单元，选自富马酸二正丙基残基单元 ，富马酸二正丁基残基单元，富马酸二异丁基残基单元和富马酸二-1-甲基丙基残基单元为100摩尔％）。

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