SCANNING ELECTRON MICROSCOPE
    61.
    发明专利

    公开(公告)号:JPS61151959A

    公开(公告)日:1986-07-10

    申请号:JP27534584

    申请日:1984-12-25

    Applicant: FUJITSU LTD

    Inventor: UMEO ITSUO

    Abstract: PURPOSE:To make it possible to perform locating procedure in point analysis very easily, by providing a generating device of two electron beams, and conducting the irradiation of scanning image with 1st electron beam, and of fixed point with 2nd electron beam. CONSTITUTION:The electron beam emitted from electron gun 1 is accelerated by anode 2, and ejected into deflexion coil portion 4 through a focusing lens system 3. And then, the beam is radiated on a sample 6 through an objective lens 5. In addition, 2nd electron gun 7 is provided, and also the electron beam emitted from it and accelerated by an anode 8 is radiated on the sample 6 similarly through deflection plates 9. When this electron beam emitted from the 2nd electron gun is used only for point analysis, it is sufficient to provide a deflection function only to correct a slight dislocation. Therefore, the electron gun 7 and focusing and deflecting system 9 can be made only with small and simple structures.

    Scanning electron microscope
    62.
    发明专利
    Scanning electron microscope 失效
    扫描电子显微镜

    公开(公告)号:JPS6193537A

    公开(公告)日:1986-05-12

    申请号:JP21465584

    申请日:1984-10-13

    Applicant: Jeol Ltd

    CPC classification number: H01J37/256

    Abstract: PURPOSE:To improve an operational performance by obtaining an image of high resolving-power with a small spot diameter under scanning image observation, and by enabling setting-up of a spot diameter wide in correspondence to the region to be analyzed, being based on screen observation, under point analysis. CONSTITUTION:Under scanning image observation, electron rays are scanned on a sample 4, and then the transmitting rays are are detected by a detector 9, being displayed on a display 14. A cursor signal generation circuit 15 enables the display 14 to display both vertical cursor Cv and horizontal cursor Ch thereon, and regulation of knobs Dh, Dv, and Dr realizes setting-up of an intersecting point P and a circle A with P centered. Furthermore, under point analysis, with the point P and circle A being set up, electron rays are radiated on a point of the sample 4, corresponding to the point P, together with the spot diameter being corresponded to the circle A, by controlling a deflection coil 5 and focusing lens 2 through a control circuit 12. Therefore, operational performance can be improved for the electron microscope with point analysis function.

    Abstract translation: 目的:通过在扫描图像观察下获得具有小光点直径的高分辨率图像,并且通过根据屏幕对应于要分析的区域设置光斑直径宽,从而提高操作性能 观察,点分析。 构成:在扫描图像观察下,在样品4上扫描电子射线,然后通过检测器9检测发射光线,显示在显示器14上。光标信号发生电路15使显示器14能够显示垂直 光标Cv和水平光标在其上,旋钮Dh,Dv和Dr的调节实现了以P为中心的交点P和圆A的设置。 此外,在点分析下,通过设置点P和圆A,将电子射线照射在与点P对应的样品4的点上,通过控制一个点A将光点直径对应于圆A 偏转线圈5和聚焦透镜2通过控制电路12.因此,对于具有点分析功能的电子显微镜,可以提高操作性能。

    SCANNING ANALYZER
    63.
    发明专利

    公开(公告)号:JPS60254545A

    公开(公告)日:1985-12-16

    申请号:JP10968184

    申请日:1984-05-31

    Inventor: BAN HAJIME

    Abstract: PURPOSE:To improve the efficiency of analysis by providing a means for storing information signals and scanning position signals obtained from the sample and performing scanning in a spiral form from the most important point on the sample surface. CONSTITUTION:An X-ray beam 6 discharged from an excitation source 8 is irradiated upon a sample 1, and then characteristic X-rays 7 discharged from the sample 1 are detected by a detector 9 such as a proportional counter before the result of the detection is supplied to a memory 5. A sample base 2 on which the sample 1 is placed is moved in the X and the Y directions by means of drivers 3 and 4 to move the point, upon which the X-ray beam 6 becomes incident, in a spiral form and the signal indicating the position of the above point is supplied to a memory 5. The signal from the detector 9 is stored in the unit memory element of the memory 5 for storing the position determined by the positional signal (x, y). And, the content of the memory 5 is scanned and displayed by a television 10. Therfore, it is possible to preferentially analyze an arbitrary point on the sample surface and subsequently analyze peripheral points successively. Consequently, operation efficiency can be improved by eliminating useless analysis.

    CHARGED PARTICLE BEAM SCANNING TYPE ANALYZER

    公开(公告)号:JPS59224038A

    公开(公告)日:1984-12-15

    申请号:JP9906383

    申请日:1983-06-02

    Applicant: SHIMADZU CORP

    Abstract: PURPOSE:To facilitate an analysis of a sample surface at particle drifting by branking scanned beams during a retrace period for every scanning of a proper number of scanning lines in the X direction, and correcting a background while sampling an output from a measuring system during a blanking period. CONSTITUTION:A detector D detects radiation emitted from a sample S excited by electron beams E, and a detected output is inputted as a brightness signal to a CRT via a buffer amplifier A1, an amplifier A2, and a differential amplifier A3. A blanking signal is inputted from a scanning circuit C to a buffer circuit B, and to a beam deflecting coil K via a driver circuit Dr. When the blanking signal is inputted to the coil K, beams E do not enter the sample S, and an output from the detector D shows a background level. The blanking signal from the circuit B allows via a waveform forming circuit F a sampling switch Sw to operate, and the background signal is held in a sample and hold circuit H. An output from the circuit h is applied to an inverted terminal of the amplifier A3, enabling a net signal from the detector D to be detected.

    JPS5857862B2 -
    67.
    发明专利

    公开(公告)号:JPS5857862B2

    公开(公告)日:1983-12-22

    申请号:JP14103378

    申请日:1978-11-17

    Applicant: Hitachi Ltd

    Abstract: PURPOSE:To improve the X-ray analyzing performance by moving the focused electron beam across micro region on the surface of specimen including the stopping point thereby reducing the contamination at the position to be irradiated. CONSTITUTION:The electron beam 20 is irradiated while focused on the surface of specimen 9. The amount of irradiated electron beam 20 is normally 10 -10 ampere and the spot size of irradiated electron beam 20 on the surface of specimen 9 is normally 100-300 ampere. When scanning the irradiated electron beam 20 across micro region on the surface of specimen, the contamination of specimen in the analyzing region can be reduced or averaged.

    X-RAY ANALYZER OF ENERGY DISPERSAL TYPE

    公开(公告)号:JPS5846564A

    公开(公告)日:1983-03-18

    申请号:JP14486681

    申请日:1981-09-14

    Abstract: PURPOSE:To very correctly analyze picture information, by scanning a sample with an electron beam, obtaining plural picture informations, simultaneously displaying the plural picture informations in different color and correctly recognizing corresponding relations of these picture informations. CONSTITUTION:Two image data V1, V2, obtained by scanning an electron beam 3, are completely synchronously stored to a prescribed address in an image memory 11 by address data AD, and the stored data are read by a read signal RO from a display device 18, when the two images are displayed, an electron beam image and X-ray analyzed image are completely duplicated with each other in prescribed relation. In this case, the both images are in different color, and the operator can separately identify the both images, further a corresponding relation of the both images can be understood at a glance, and very correct evaluation can be performed while considering the X-ray analyzed image and shape or the like of an actual sample.

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